Substrate Preparation and Oblique Angle Deposition of Germanium
3:23
Oblique Angle Deposition of Ge on Large Substrates
4:50
Results: Ultra-thin Color Films
5:40
Conclusion
副本
The overall goal of this procedure is to fabricate ultra-thin color films by using oblique angle deposition to control the porosity of the highly absorbent deposited film. This method can help answer key questions about color purity and tunability
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We present a detailed method for fabricating ultra-thin color films with improved characteristics for optical coatings. The oblique angle deposition technique using an electron beam evaporator allows improved color tunability and purity. Fabricated films of Ge and Au on Si substrates were analyzed by reflectance measurements and color information conversion.