Pattern the Photoresist and Silicon Nitride‐Deposited Si Wafer (SixNy)
2:31
Etching the Si and Eliminating the KOH Etching Residues
3:21
Prepare the Micro‐Patterned SixNy and Eliminate the PR
4:25
Transfer Graphene Oxide (GO) by the Drop‐Casting Method
5:30
Results: Analysis of the Micro‐Patterned Chip with GO Windows
6:35
Conclusion
副本
This protocol is important for regulating the thickness of the picture size at the nano scale to successfully observe proteins and nano materials of different sizes using cryo EM.The Mem's fabrication technique allows for the mass production of th
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A newly developed micro-patterned chip with graphene oxide windows is fabricated by applying microelectromechanical system techniques, enabling efficient and high-throughput cryogenic electron microscopy imaging of various biomolecules and nanomaterials.