Federal University of São Carlos (UFSCAR)

1 ARTICLES PUBLISHED IN JoVE

Chemistry

Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate

Silvia L. Fernandes¹, Lucas J. Affonço², Roberto A. R. Junior², José H. D. da Silva², Elson Longo¹, Carlos F. de O. Graeff²

¹Chemistry Department, Federal University of São Carlos (UFSCAR), ²Physics Department, School of Sciences, São Paulo State University (UNESP)

Here, we present a protocol for niobium oxide films deposition by reactive sputtering with different oxygen flow rates for use as an electron transport layer in perovskite solar cells.