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In This Article

  • Summary
  • Abstract
  • Introduction
  • Protocol
  • Representative Results
  • Discussion
  • Acknowledgements
  • Materials
  • References
  • Reprints and Permissions

Summary

This study presents a feasible procedure for synthesizing gold dendritic nanoforests on titanium nitride/silicon substrates. The thickness of gold dendritic nanoforests increases linearly within 15 min of a synthesis reaction.

Abstract

In this study, a high-power impulse magnetron sputtering system is used to coat a flat and firm titanium nitride (TiN) film on silicon (Si) wafers, and a fluoride-assisted galvanic replacement reaction (FAGRR) is employed for the rapid and easy deposition of gold dendritic nanoforests (Au DNFs) on the TiN/Si substrates. Scanning electron microscopy (SEM) images and energy-dispersive X-ray spectroscopy patterns of TiN/Si and Au DNFs/TiN/Si samples validate that the synthesis process is accurately controlled. Under the reaction conditions in this study, the thickness of the Au DNFs increases linearly to 5.10 ± 0.20 µm within 15 min of the reaction. Therefore, the employed synthesis procedure is a simple and rapid approach for preparing Au DNFs/TiN/Si composites.

Introduction

Gold nanoparticles have characteristic optical properties and localized surface plasmon resonances (LSPRs), depending on the size and shape of the nanoparticles1,2,3,4. Moreover, gold nanoparticles can significantly enhance plasmonic photocatalytic reactions5. Dendritic nanoforests stacked using gold nanoparticles have received considerable attention because of their noteworthy specific surface areas and robust LSPR enhancement6,7,....

Protocol

1. Sample preparation

  1. TiN substrate preparation using a high-power impulse magnetron sputtering system
    1. Cut a 4 inch n-type silicon wafer into 2 cm x 2 cm samples.
    2. Wash the samples using acetone, isopropanol, and deionized water.
    3. Dry them using an N2 spray for 5 min.
    4. Place the washed Si samples in a sample holder and place the sample holder into a high-power impulse magnetron sputtering (HiPIMS) chamber.
    5. Place a titanium t.......

Representative Results

Figure 1 depicts images of the Au DNFs/TiN/Si sample preparations. The silicon wafer was silvery white (Figure 1a). TiN/Si was golden yellow and had a homogeneous surface (Figure 1b), which indicated the uniform TiN coating on the silicon wafer. Au DNFs/TiN/Si was yellowish brown and less homogeneous on the surface (Figure 1c) because of the random distribution of Au DNF.......

Discussion

In this study, Au DNFs with multiple branch sizes were decorated on the surface of TiN/Si by using FAGRR. The deposition of the Au DNFs could be directly identified by a significant change in color. The thickness of the Au DNFs on TiN/Si increased to 5.10 ± 0.20 µm within 15 min, and this increase in thickness can be expressed using the following linear equation: y = 0.296t + 0.649, where the time varied from 1 to 15 min.

In FAGRR, the metal deposition is affected b.......

Acknowledgements

This work was supported by the Ministry of Science and Technology, Taiwan, under contract numbers MOST 105-2221-E-492-003-MY2 and MOST 107-2622-E-239-002-CC3.

....

Materials

NameCompanyCatalog NumberComments
AcetoneDinhaw Enterprise Co. Ltd.,Taipei, Taiwan
IsopropanolEcho Chemical Co. Ltd., Miaoli, TaiwanTG-078-000000-75NL
Buffered Oxide EtchUni-onward Corp., Hsinchu, Taiwan UR-BOE-1EA
Chloroauric AcidAlfa Aesar., Heysham, United Kingdom36400.03
N-Type Silicon WaferSummit-Tech Company, Hsinchu, Taiwan
High-Power Impulse Magnetron Sputtering System (HiPIMS)Melec GmbH, GermanySPIK2000A 
Scanning Electron Microscope (SEM)JEOL, JapanJSM-7800F
Ion Sputter CoaterHitachi, JapanE-1030
X-Ray Diffractometer (XRD)PANalytical, The NetherlandsX'Pert PRO MRD

References

  1. Nehl, C. L., Hafner, J. H. Shape-dependent plasmon resonances of gold nanoparticles. Journal of Materials Chemistry. 18 (21), 2415-2419 (2008).
  2. Auguié, B., Barnes, W. L. Collective resonances in gold nanoparticle arrays.

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