Photolithography-based Fabrication of an Embedded Metal-mesh Transparent Electrode (EMTE)
10:05
Conclusion
8:33
Results: EMTE Fabrication by the Lithography, Electroplating, and Imprint Transfer (LEIT) Method
5:14
Electron-beam Lithography-based Fabrication of a Sub-micron EMTE
7:44
EMTE Characterization
Transcript
The overall goal of this procedure is to use a solution-based fabrication process that combines lithography, electric deposition, and imprint transfer to produce a high performance, flexible, transparent conductive film with a self-anchored, fully
Sign in or start your free trial to access this content