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Fabrication of Schottky Diodes on Zn-polar BeMgZnO/ZnO Heterostructure Grown by Plasma-assisted Molecular Beam Epitaxy

DOI :

10.3791/58113-v

14:16 min

October 23rd, 2018

October 23rd, 2018

7,208 Views

1Department of Electrical and Computer Engineering, Virginia Commonwealth University

Attainment of high-quality Schottky contacts is imperative for achieving efficient gate modulation in heterostructure field effect transistors (HFETs). We present the fabrication methodology and characteristics of Schottky diodes on Zn-polar BeMgZnO/ZnO heterostructures with high-density two dimensional electron gas (2DEG), grown by plasma-assisted molecular beam epitaxy on GaN templates.

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Keywords Schottky Diodes

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