Name: fabrication of three-dimensional graphene-based polyhedrons via origami-like self-folding
Uploaded: 2018-09-23T14:30:00
Description: Watch this Scientific Journal Video about Fabrication of Three-Dimensional Graphene-Based Polyhedrons via Origami-Like Self-Folding at JoVE.com

这一材料的基础是在明尼苏达大学、双城市和 NSF 职业奖 (CMMI-1454293) 的开办基金的支持下开展的工作。这项工作的一部分是在明尼苏达大学的特征设施中进行的, 这是由 NSF 资助的材料研究设施网络 (通过MRSEC 计划) 的成员。这项工作的一部分是在明尼苏达纳米中心进行的, 这是由国家科学基金会通过国家纳米协调基础设施网络 (NNCI) 的奖励号 ECCS-1542202 支持。c.d. 承认3M 科技奖学金的支持。

注意: 这些合成中使用的几种化学物质是有毒的, 在接触或吸入时可能会引起刺激性和严重的器官损伤。在处理化学品时, 请使用适当的安全设备和佩戴个人防护设备。
1. 在铜牺牲层上制备氧化铝和铬保护层
<ol><li>使用电子束蒸发器, 在硅 (Si) 基板上沉积 10 nm 厚铬 (Cr) 和 300 nm 厚铜层 (牺牲层) (图 2a)。</li>
	<li>自旋涂层光刻胶 (PR)-1 在2500转每分钟然后烘?...

<ol>
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对于用 CVD 石墨烯制备的立方体, 因为给定立方体的每一面都是用一个外层框架设计的, 围绕着 160 x 160 µm2区域的游离石墨烯, 单层石墨烯没有必要的强度来允许多维数据集的并行处理。因此, 石墨烯膜由三层 CVD 石墨烯单层板组成,通过三单独的石墨烯转移, 使用多个 PMMA 涂层/去除步骤生产。另一方面, 对于去膜准备, 我们使用单独的去片在水中, 获得通过改装悍马的方法<sup class...

二维 (2D) 石墨烯片具有非凡的光学、电子和机械性能, 使它们成为新一代电子、光电、电化学、机电和生物医学应用1,2,3,4,5,6。除石墨烯生产的2D 层状结构外, 最近还对各种改性方法进行了研究, 以观察石墨烯的新功能, 寻求新的应用机会。例如, 通过将2D 结构的形状或图案裁剪为一维 (1D) 或零维 (0D) 结构 (如石墨烯), 调制 (或调谐) 其物理特性 (即掺杂水平和/或带隙)nanoribbon 或石墨烯量子点) 已经研究, 以获得新的物理现象, 包括量子约束效应, 局部等离子模式, 局部电子分布, 和自旋极化边缘状态7,8 ,9,10,11,12。此外, 通过皱 (通常称为 kirigami)、分层、屈曲、扭曲或堆叠多层, 或者通过将2D 石墨烯转移到3D 特征 (基底) 上, 改变石墨烯表面形状, 使2D 石墨烯的质地变显示, 以改变石墨烯的润湿性, 机械特性, 和光学性能13,14。
除了改变2D 石墨烯的表面形貌和层状结构外, 2D 石墨烯组装成功能性的、定义良好的三维 (3D) 正多面体最近在石墨烯群落中得到了极大的关注, 以获得新的物理和化学现象15。理论上, 2D 石墨烯基结构的弹性、静电和范德华能量可以用来将2D 石墨烯转化成各种3D 石墨烯-折纸构型16,17。基于这个概念, 理论建模研究已经研究了3D 石墨烯结构设计, 由纳米级的2D 石墨烯膜组成, 在药物传递和一般分子存储16,17的可能用途。然而, 这种方法的实验进展还远未实现这些应用。另一方面,通过模板辅助组装、流定向组装、发酵组装和保形生长方法18、19 , 开发了多种化学合成方法, 实现了3D 结构。,20,21,22. 然而, 这些方法目前是有限的, 因为它们不能产生一个 3D, 空心, 封闭结构, 而不会失去石墨烯片的固有性质。
本文概述了用折纸式自折叠法建立3D、中空、石墨烯基 microcubes (200 µm 的整体尺寸) 的策略;克服了建造自由站立, 空心, 3D, 多面体, 石墨烯基材料的首要挑战。在折纸般的, 免提的自折叠技术, 2D lithographically 花纹平面特征 (即,石墨烯基膜) 是连接的铰链 (即热敏聚合物, 光刻胶) 在不同的关节, 从而当铰链加热到熔化温度23、24、25、26时, 形成2D 网, 折叠起来。以石墨烯为基础的立方体是用由几层化学气相沉积 (CVD) 生长的石墨烯或石墨烯氧化物 (去) 膜组成的窗膜组件实现的;两者都使用高分子框架和铰链。3D 石墨烯基立方体的制备包括: (i) 保护层的制备, (ii) 石墨烯-膜的转移和模式, (iii) 石墨烯膜上的金属表面图案, (iv) 框架和铰链的图案和沉积, (v)自折叠和 (vi) 删除保护层 (图 1)。本文主要研究了3D 石墨烯基立方体的自折叠问题。关于3D 石墨烯基立方体的物理和光学特性的详细信息, 可以在我们最近的出版物27,28中找到。

<table border="0" cellpadding="0" cellspacing="0" style="width:1315px;" width="1313">
	<tbody>
		<tr height="21">
			<td height="21" style="height:21px;width:311px;">Acetone</td>
			<td style="width:295px;">Fisher Chemical</td>
			<td style="width:199px;">A18P-4</td>
			<td style="width:511px;">N/A</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:311px;">Aluminium oxide</td>
			<td style="width:295px;">Kurt J. Lesker Company</td>
			<td style="width:199px;">EVMALO-1-2.5</td>
			<td>99.99% Pure</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:311px;">APS Copper Etchant 100</td>
			<td style="width:295px;">Transene Company, Inc.</td>
			<td style="width:199px;">N/A</td>
			<td>N/A</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:311px;">Camera (for 3D image)</td>
			<td style="width:295px;">Nikon</td>
			<td style="width:199px;">D5100</td>
			<td>1080p Full HD, Effective pixels: 16.2 million, Sensorsize: 23.6 mm x 15.6 mm</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:311px;">CE-5 M Chromium Mask Etchant</td>
			<td style="width:295px;">Transene Company, Inc.</td>
			<td style="width:199px;">N/A</td>
			<td>N/A</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:311px;">Chemical deposition growth (CVD) system</td>
			<td style="width:295px;">Customized</td>
			<td style="width:199px;">N/A</td>
			<td>Lindberg/Blue Tube Furnace</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:311px;">Chromium</td>
			<td style="width:295px;">Kurt J. Lesker Company</td>
			<td style="width:199px;">EVMCR35J</td>
			<td>99.95% pure</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:311px;">Chromium Etchant 473</td>
			<td style="width:295px;">Transene Company, Inc.</td>
			<td style="width:199px;">N/A</td>
			<td>N/A</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:311px;">Copper</td>
			<td style="width:295px;">Kurt J. Lesker Company</td>
			<td style="width:199px;">EVMCU40QXQJ</td>
			<td>99.99% pure</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:311px;">Developer-1 (MF319 developer)</td>
			<td style="width:295px;">Microposit</td>
			<td style="width:199px;">10018042</td>
			<td>N/A</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:311px;">Developer-2 (AZ developer)</td>
			<td style="width:295px;">Merck performance Materials Corp.</td>
			<td style="width:199px;">1005422496</td>
			<td>N/A</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:311px;">Developer-3 (SU-8 developer)</td>
			<td>MicroChem</td>
			<td style="width:199px;">NC9901158</td>
			<td>N/A</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:311px;">Digital Hot Plate</td>
			<td style="width:295px;">Thermo Scientific</td>
			<td style="width:199px;">HP131725</td>
			<td>Super-Nuvoa series, maximum temperature: 370 &#176;C</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:311px;">E-Beam Evaporator System</td>
			<td style="width:295px;">Rocky Mountain Vacuum Tech.</td>
			<td style="width:199px;">N/A</td>
			<td>RME-2000</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:311px;">Graphene oxide</td>
			<td style="width:295px;">Goographene</td>
			<td style="width:199px;">N/A</td>
			<td>Purity: ~ 99%; Single layer ratio: ~99%;&#160; 0.7-1.2 nm in thickness.</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:311px;">Isopropyl Alcohol</td>
			<td style="width:295px;">Fisher Chemical</td>
			<td style="width:199px;">A416-4</td>
			<td>N/A</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:311px;">Mask Aligner</td>
			<td style="width:295px;">Midas</td>
			<td style="width:199px;">MDA-400LJ</td>
			<td>N/A</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:311px;">Microscope</td>
			<td style="width:295px;">Omax</td>
			<td style="width:199px;">NJF-120A</td>
			<td>N/A</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:311px;">multiple polymethyl methacrylate (PMMA)</td>
			<td style="width:295px;">MicroChem</td>
			<td style="width:199px;">950 PMMA A9</td>
			<td>N/A</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:311px;">Oxygen plasma&#160;</td>
			<td style="width:295px;">Technics Inc.</td>
			<td style="width:199px;">SERIES 800</td>
			<td>Microscale reactive ion etching (RIE)</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:311px;">Photoresist-1 (S1813 Photoresist)</td>
			<td style="width:295px;">Microposit</td>
			<td style="width:199px;">10018348</td>
			<td>N/A</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:311px;">Photoresist-2 (SPR220 Photoresist)</td>
			<td style="width:295px;">MicroChem</td>
			<td style="width:199px;">SPR00220-7G</td>
			<td>N/A</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:311px;">Photoresist-3 (SU-8 Photoresist)</td>
			<td>MicroChem</td>
			<td style="width:199px;">SU-8-2010</td>
			<td>N/A</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:311px;">Profilometer</td>
			<td style="width:295px;">Tencor Instruments</td>
			<td style="width:199px;">N/A</td>
			<td>Alpha-Step 200</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:311px;">Raman</td>
			<td style="width:295px;">WITec Instruments Corp.</td>
			<td style="width:199px;">Alpha300R</td>
			<td>Confocal Raman Microscope</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:311px;">Silicon Wafer</td>
			<td style="width:295px;">Siltronic AG</td>
			<td style="width:199px;">N/A</td>
			<td>100mm diameter, N-type, one-side polish, resitivity: 560-840 &#937;&#8226;cm</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:311px;">Spinner</td>
			<td style="width:295px;">Best Tools</td>
			<td style="width:199px;">S0114031123</td>
			<td>SMART COATER 100</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:311px;">Titanium</td>
			<td style="width:295px;">Kurt J. Lesker Company</td>
			<td>EVMTI45QXQA</td>
			<td>99.99% Pure</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;width:311px;">Ultrasonic Cleaner</td>
			<td style="width:295px;">Crest Ultrasonics</td>
			<td style="width:199px;">N/A</td>
			<td>Powersonic series</td>
		</tr>
	</tbody>
</table>

fabrication of three-dimensional graphene-based polyhedrons via origami-like self-folding

将二维 (2D) 石墨烯组装成三维 (3D) 多面体结构, 同时保持石墨烯的优良固有特性, 对新型器件应用的发展有着极大的兴趣。在这里, 制作 3D, 微型, 空心正多面体 (立方体) 由几层2D 石墨烯或石墨烯氧化物片通过折纸样的自折叠过程描述。这种方法包括使用聚合物框架和铰链, 和铝氧化物/铬保护层, 以减少拉伸, 空间和表面张力应力的石墨烯基膜时, 2D 网转化为3D 立方体。该过程提供了对结构的大小和形状以及并行生产的控制。此外, 这种方法允许在3D 立方体的每个表面上通过金属图案来创建曲面修改。拉曼光谱研究表明, 该方法能保持石墨烯基膜的固有性质, 证明了本方法的鲁棒性。

图 2显示了2D 石墨烯和转网结构和随后的自折叠过程的光刻过程的光学图像。通过高分辨率显微镜实时监测自折叠过程。两种类型的3D 石墨烯基立方体折叠在80摄氏度。图 3列出了视频捕获序列, 显示了以并行方式自动折叠3D 石墨烯为基础的立方体。在一个优化的过程中, 这种方法显示出的最高收益率为90%。
<p class="jove_c...

Watch this Scientific Journal Video about Fabrication of Three-Dimensional Graphene-Based Polyhedrons via Origami-Like Self-Folding at JoVE.com

Fabrication of Three-Dimensional Graphene-Based Polyhedrons via Origami-Like Self-Folding

基于折纸式自折叠的三维石墨烯正多面体的制备

在这里, 我们提出了一个协议, 以制造3D 石墨烯为基础的正多面体通过折纸般的自折叠。

The assembly of two-dimensional (2D) graphene into three-dimensional (3D) polyhedral structures while preserving the graphene's excellent inherent ...

该协议使用折纸式自折叠方法创建基于 3D 石墨烯的聚花龙。二维石墨烯板具有非凡的光学、电子和机械性能。通过定制二维石墨烯的形状，可以调整其物理、化学和光学特性，从而引入新的材料行为，从而获得新的应用机会。在这方面，将2D石墨烯集成到功能化、定义明确、三维聚面体的结构中，最近引起了石墨烯界的关注。3D 石墨烯聚花龙可能有利于许多应用。示例包括气体和水保护容器、分子存储、输送系统、液体材料封装、电子显微镜、功能光电子器件和物质材料中的易于观察。引进了一些生产3D石墨烯结构的化学途径。然而，这些方法通常需要强烈的化学反应，这些反应会影响石墨烯的内在特性，并在建造自立、空心、3D 石墨烯聚面体方面带来挑战。为了克服这些限制，本研究展示了一种使用折纸式自折叠实现具有2D石墨烯和氧化石墨烯的多面三维显子的方法。为了帮助为基于 3D 石墨烯的立方体的整体制造过程提供上下文，现在将在详细协议之前介绍一个简化的六步概述。首先，准备保护层。然后，在图案中将石墨烯膜转移到保护层。然后，在石墨烯膜上创建金属表面图案。接下来，定义聚合物框架和铰链。然后，通过自折叠将 2D 网络转换为 3D 立方体。最后，删除保护层。使用电子束蒸发器，在硅基板上沉积10纳米厚的铬和300纳米厚的铜层。在 2500 RPM 转速下旋转涂层光印，随后在 115 摄氏度下烘烤 60 秒。将设计的 2D 网络区域暴露在接触掩膜对对挡器上的 UV 光上 15 秒，然后在开发人员中开发 60 秒。用去气化水冲洗样品，用气枪吹干。沉积10纳米厚的铬层，并提起丙酮中剩余的光光。用去气化水冲洗样品，用气枪吹干。要在网上涂上六方形氧化铝和铬保护层的 2D 网，请以 2，500 RPM 转速旋转涂层光质，然后在 115 摄氏度下烘烤 60 秒。将设计的六方形保护层暴露在接触面遮光器上的紫外线下 15 秒，并在开发人员中开发 60 秒。用去维水冲洗样品，用气枪吹干。将100纳米厚的氧化铝层沉积在10纳米厚的铬层中。取出丙酮中剩余的光光印剂。用去维水冲洗样品，用气枪吹干。从粘在铜箔上的 15 毫米方形石墨烯开始，在石墨烯表面以 3000 RPM 的速度旋转薄 PMMA 层。在180摄氏度下烘烤10分钟。将PMMA石墨烯放在铜箔层板中，将铜侧漂浮在铜蚀中24小时，以蚀刻铜箔。铜箔完全溶解后，将PMMA留在石墨烯中，使用显微镜滑动玻璃将漂浮的PMMA涂层石墨烯转移到除离子水池的表面，以去除任何铜蚀刻残留物。多次重复将 PMMA 涂层石墨烯转移到新的去维化水池中，以充分冲洗。将浮动PMMA涂层石墨烯转移到铜箔上的另一块石墨烯上，以获得双层石墨烯膜。在100摄氏度的热板上热处理铜箔上的双层石墨烯10分钟。在丙酮浴中去除铜箔上双层石墨烯顶部的 PMMA，留下石墨烯、石墨烯和铜箔层，然后转移到去维化水。重复石墨烯转移一次，得到三层堆积的石墨烯膜。将PMMA、石墨烯、石墨烯和铜箔层板放置，将铜侧向下放置，在铜蚀中放置24小时，以蚀刻铜箔。将 PMMA 涂层的三层石墨烯膜转移到预制氧化铝和铬保护层上。转移石墨烯后，用丙酮去除PMMA。然后，将样品浸入去化水中，在空气中干燥。在100摄氏度的热板上热处理基板上的多层石墨烯一小时。在 2500 RPM 转速下旋转涂层光印，在 115 摄氏度下烘烤 60 秒。UV 使用接触遮罩对齐器将光面光膜直接位于方形保护层区域正上方 15 秒钟。然后发展60秒。通过氧气等离子体处理去除新发现的不需要的石墨烯区域 15 秒。取出丙酮中剩余的光光印剂。用去维水冲洗样品，在空气中干燥。在先前制造的氧化铝和铬保护层上旋转涂层光膜，以 1700 RPM 的速度旋转 60 秒，以获得 10 微米厚的层。在 115 摄氏度下烘烤光光师 60 秒，然后等待 3 小时。与用于对氧化铝和铬层进行图案相同的蒙版中，UV 将样品暴露在接触面蒙版对齐器上 80 秒，并开发 90 秒。用去气化水冲洗样品，用气枪吹干。在不带面罩的情况下对整个样品进行紫外线泛光照射 80 秒。以 1000 RPM 的速度在样品上旋转制备的氧化石墨烯和水混合物 60 秒。总共执行三次旋转涂层。将样品浸入开发器中，以释放不需要的氧化石墨烯。显微镜下的升空过程在镜头加速时显示。用去气化水冲洗样品，然后用气枪小心地吹干样品。在100摄氏度的热板上热处理样品一小时。在基于石墨烯的图案膜上创建 20 纳米厚的钛图案。在100摄氏度的热板上热处理样品一小时。在具有钛表面图案的石墨烯基膜顶部，以 2500 RPM 旋转涂层光质，持续 60 秒，形成 5 微米厚的层，在 90 摄氏度下烘烤两分钟。紫外线照射样品20秒，在90摄氏度下烘烤3分钟，发育90秒。用去电化水和异丙醇冲洗样品，然后用气枪小心地吹干样品。在200摄氏度下烘烤样品15分钟，以提高框架的机械刚度。要制作铰链图案，请以 1000 RPM 转速旋转涂层光片 60 秒，在预制基材顶部形成 10 微米厚的薄膜。在 115 摄氏度下烘烤 60 秒，等待 3 小时。UV-将样品暴露在接触掩膜对对器上 80 秒，并开发 90 秒。用去气化水冲洗样品，然后用气枪小心地吹干样品。要释放二维结构，请将铜蚀刻中的二维网下铜牺牲层溶解。使用移液器小心地将释放的结构转移到去离子水浴中，并冲洗几次以去除残留的铜蚀中的铜。将 2D 结构放在去电化水中，加热至聚合物铰链的熔点上方。通过光学显微镜实时监控自折叠，并在成功组装成封闭立方体后从热源中取出。自折叠后，用铬蚀中的氧化铝和铬保护层去除。轻轻地将立方体转移到去化水浴中，并仔细冲洗。光学图像显示了二D石墨烯和氧化石墨烯网结构的光图工艺以及随后的自折叠过程。通过高分辨率显微镜实时监控自折叠过程。两种基于3D石墨烯的立方体均在80摄氏度左右的温度下折叠。这些数字显示了视频捕获的序列，以平行的方式显示基于 3D 石墨烯的立方体的自我折叠。在优化的工艺下，此方法的最高产量约为 90%。图显示了具有和没有表面图案的3D组装石墨烯和氧化石墨烯立方体的光学图像。自折叠立方体的总尺寸为200微米宽，长200微米，高200微米。20 纳米厚的钛图案特征和 UMN 字母在基于 3D 石墨烯的立方体的每个面上定义。这些数据包括基于2D石墨烯的网和基于3D石墨烯的立方体的拉曼光谱。结果表明，自折叠后，石墨烯和氧化石墨烯膜的拉曼峰位置和强度均无明显变化。但是，当未使用保护层时，观察到相对峰值强度的明显变化，表明自折叠过程中石墨烯的特性发生变化或损坏。此方法允许开发生物医学、电子和光学器件，包括传感器和电路，使用 3D 配置的众多优势。此外，由于该工艺仅使用早期图像来使用石墨烯材料，因此此方法可应用于其他二维材料，如 tren-ja-men-a ai chai-hus 刀和黑色护照，从而允许这一机会用于开发下一代 2D 材料的 3D 配置。

Research

JoVE Journal

Engineering

Fabrication of Three-Dimensional Graphene-Based Polyhedrons via Origami-Like Self-Folding

High-resolution, High-speed, Three-dimensional Video Imaging with Digital Fringe Projection Techniques

Digital fringe projection (DFP) techniques provide dense 3D measurements of dynamically changing surfaces.&#160;Like the human eyes and brain, DFP uses ...

科研

工程学

Process of Making Three-dimensional Microstructures using Vaporization of a Sacrificial Component

制作三维微结构，用牺牲部分汽化过程

Vascular structures in natural systems are able to provide high mass transport through high surface areas and optimized structure. Few synthetic material ...

Fabrication of Spatially Confined Complex Oxides

空间密闭的复合氧化物制备

Complex materials such as high Tc superconductors, multiferroics, and colossal magnetoresistors have electronic and magnetic properties that arise from ...

Fabrication of Uniform Nanoscale Cavities via Silicon Direct Wafer Bonding

通过硅直接晶圆粘接制造均匀纳米级腔

Measurements of the heat capacity and superfluid fraction of confined 4He have been performed near the lambda transition using lithographically patterned ...

Fabrication and Testing of Microfluidic Optomechanical Oscillators

制造和微流控光机振荡器测试

Cavity optomechanics experiments that parametrically couple the phonon modes and photon modes have been investigated in various optical systems including ...

Patterning via Optical Saturable Transitions - Fabrication and Characterization

通过光学吸收跃迁图案 - 制备与表征

This protocol describes the fabrication and characterization of nanostructures using a novel nanolithographic technique called Patterning via Optical ...

Atomically Traceable Nanostructure Fabrication

原子纳米结构可追溯制造

Reducing the scale of etched nanostructures below the 10 nm range eventually will require an atomic scale understanding of the entire fabrication process ...

Using Synchrotron Radiation Microtomography to Investigate Multi-scale Three-dimensional Microelectronic Packages

利用同步辐射微断层调查的多尺度三维微电子封装

Synchrotron radiation micro-tomography (SR&#181;T) is a non-destructive three-dimensional (3D) imaging technique that offers high flux for fast data ...

Three-dimensional Particle Tracking Velocimetry for Turbulence Applications: Case of a Jet Flow

湍流应用三维粒子跟踪测速：一喷流病例

3D-PTV is a quantitative flow measurement technique that aims to track the Lagrangian paths of a set of particles in three dimensions using stereoscopic ...

Three-Dimensional Ultrasonic Needle Tip Tracking with a Fiber-Optic Ultrasound Receiver

基于光纤超声接收机的三维超声针尖跟踪

Ultrasound is frequently used for guiding minimally invasive procedures, but visualizing medical devices is often challenging with this imaging modality. ...