Preparation of PDMS Templates and Gel Film Deposition on SOI Substrates by Dip-Coating
2:55
Surface Micro/Nanostructuration by Soft Imprint Lithography and Gel Film Crystallization by Thermal Treatment
4:00
Preparing and Patterning of the Quartz Samples for the Cantilever Microfabrication Process
8:49
Results: Qualitative Analysis of the Progressive Epitaxial Nanostructured α-Quartz Film Thickness Developed on Silicon
10:20
Conclusion
Transcript
Nowadays, quartz-based sensors are limited by the miniaturization process and the monolithic integration of this material on silicon. These bottlenecks are now overcome with the first chemical integration of epitaxial requirements in the form of h
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Questo lavoro presenta un protocollo dettagliato per la microfabbricazione di sbalzi di α quarzo nanostrutturati su un substrato tecnologico SILICON-On-Insulator (SOI) a partire dalla crescita epitassiale del film di quarzo con il metodo di rivestimento a tuffo e quindi nanostrutturazione del film sottile tramite litografia nanoimprint.