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DOI :
10.3791/63739-v
April 21st, 2022
Chapters
0:04
Introduction
0:55
Pattern the Photoresist and Silicon Nitride‐Deposited Si Wafer (SixNy)
2:31
Etching the Si and Eliminating the KOH Etching Residues
3:21
Prepare the Micro‐Patterned SixNy and Eliminate the PR
4:25
Transfer Graphene Oxide (GO) by the Drop‐Casting Method
5:30
Results: Analysis of the Micro‐Patterned Chip with GO Windows
6:35
Conclusion
酸化グラフェン窓を備えたマイクロパターンチップを新たに開発し、マイクロエレクトロメカニカルシステム技術を適用して製造し、さまざまな生体分子やナノ材料の効率的で高スループットな極低温電子顕微鏡イメージングを可能にします。
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