Research
Education
Sign In
EN
EN - English
CN - 中文
DE - Deutsch
ES - Español
KR - 한국어
IT - Italiano
FR - Français
PT - Português
Please note that all translations are automatically generated. Click here for the English version.
DOI :
10.3791/63739-v
April 21st, 2022
Chapters
0:04
Introduction
0:55
Pattern the Photoresist and Silicon Nitride‐Deposited Si Wafer (SixNy)
2:31
Etching the Si and Eliminating the KOH Etching Residues
3:21
Prepare the Micro‐Patterned SixNy and Eliminate the PR
4:25
Transfer Graphene Oxide (GO) by the Drop‐Casting Method
5:30
Results: Analysis of the Micro‐Patterned Chip with GO Windows
6:35
Conclusion
산화 그래핀 윈도우를 갖춘 새로 개발된 마이크로 패턴 칩은 미세 전자 기계 시스템 기술을 적용하여 제작되어 다양한 생체 분자 및 나노 물질의 효율적이고 높은 처리량의 극저온 전자 현미경 이미징을 가능하게합니다.
Tags
-- Views
Related Videos
Privacy
Terms of Use
Policies
Contact Us
Recommend to library
JoVE NEWSLETTERS
JoVE Journal
Methods Collections
JoVE Encyclopedia of Experiments
Archive
JoVE Core
JoVE Business
JoVE Science Education
JoVE Lab Manual
Faculty Resource Center
Authors
Librarians
Access
ABOUT JoVE
Copyright © 2024 MyJoVE Corporation. All rights reserved