ترسيب طبقة الذرية ثاني أكسيد الفاناديوم ونموذج بصرية تعتمد على درجة الحرارة

0:56

Atomic Layer Deposition (ALD) of Amorphous Vanadium Dioxide (VO₂ ) on Sapphire Substrates

3:06

Annealing Amorphous VO₂ Thin Films

4:45

Characterization of VO₂ Films by Raman Spectroscopy

5:43

Characterization of VO₂ Films by X-Ray Photoelectron Spectroscopy (XPS)

7:31

Morphological Characterization by Atomic Force Microscopy (AFM)

9:06

Results: Characterization of Amorphousand Crystalline VO₂ Films

10:49

Conclusion