辐照砷化镓样品由伊利诺伊州芝加哥大学的杨翠。这项工作是支持合同号DE-，AC02-06CH11357之间UChicago阿贡，有限责任公司和美国能源部和美国航空航天局，通过拨款NNH08AH761的和NNH08ZDA001N，和美国能源部汽车技术办公室根据合同DE-AC02 06CH11357。完成在电子显微镜，电子显微镜材料研究中心，美国能源部阿贡国家实验室的的办公室能源科学实验室，合同项下的DE-AC02-06CH11357 UChicago阿贡，LLC经营。

1。通用的硬件对齐WLI扫描通过WLI获得定量的信息，下面的步骤可以作为一个指导方针。假设操作者具有干涉仪操作的基本知识。无论是常见的特定仪器的指引。一些调查，标本将会持平。对于其他人，试样可以是弯曲的。 <ol><li>将样品放置在舞台上的功能（离子，离子束溅射火山口/烧蚀点，或磨痕）的直线上升。使用低倍率的目标，并集中在仪器上。为了获得最佳分辨率获得的图像中的感兴趣的对象在很大程度上填满屏幕，请参阅图2的一个例子的一球。 </li><li>调整试样的垂直位置，使干涉条纹的附近出现所感兴趣的特征。对于平坦的表面上，它是优选的试样倾斜时，使得平面perpendicul的的ar到光轴， 即条纹间隔将是大的。对于弯曲的表面（ 如一个球），试样应被定向使得条纹位于周围的功能，如在图3中。 </li><li>获取扫描，根据仪表指示。这可能是必要的调整的照明或扫描，以便获得最好的地形图的高度。填写任何错误或丢失的数据使用插值函数，然后保存的地形图。 </li></ol> 2。量分析，使用通用软件在摩擦学，试验机通常采用非共形接触测试的几何形状，如一个球或一个圆柱体，滑动或旋转对平的或另一气缸。通常情况下，材料丢失的滑动接触点，虽然有时材料从一个表面转移到另一个，“传输层”将测得的盈余材料上E的接触标本。由于是三维的磨痕和不规则性，光学轮廓可能是唯一的方法获得准确的磨损量测量 - 近似是无效的。我们的目标是测量非常少量的材料，可能会丢失（或增加），在接触区域，在一个测试完成。 测量的基本原理，是定义一个数学平面在原状表面水平：表面分析软件假定存在一个“固体表面”（零电平），无论在此水平之上是“空”。措施除去集成的平面之下的“固体表面”体积的分析功能，将被称为“空隙体积”。测量集成的音量的“固体表面”（ 例如碎片的积聚）的平面上方的函数，该函数将被称为“材料体积”。 真正的不受干扰的表面ARË很少完全光滑平整。最准确的测量小的特点，它是很好的做法来定义一个区域（AOI）的利益以外的区域，其中排除在分析之外。 AOI用于限制测量区域，因为在表面不提供额外量的计算，并不是真正意义上的不安。 3。平面 - 机械磨损分析<ol><li>一个平面上的沟槽疤痕或抑郁症的音量分析，无论是所产生的机械磨损，离子束溅射，激光消融，很容易执行。获取的图像，例如图4左侧示出了机械抛光钢表面的疤痕。选择一个AOI，排除了抑郁症，然后使用任何倾斜和/或曲率去除功能是可以不受干扰的表面，以最大的平整度水平。然后使用软件来设置表面的平均高度为Z =0。 图4是一个伪鉴于这些步骤之后在一个平面上的疤痕。在该视图中排除的“无效卷”带有红色。在这个配色方案，深褐色表示低的地区，而橙色表示高的地区。 </li><li>删除的AOI。如果该软件具有自动体积测量功能，测量的区域的疤痕。在这个软件中，测量功能将符合“无效的和物质的量”显示在图5的蓝色色调。总穿的是“物质的量”减去“空体积以上的飞机。”这是扰动的表面的体积变化。 （软件不具备此功能，但它有一个直方图，或清楚地可视化哪些方面上文提到的表面或在表面之下，跳到步骤3.2和步骤3.3）。 </li></ol>下面的三个步骤描述测量磨损量的另一种方法。 <ol start="3"><li>反转AOI从步骤3.1，使待分析的瘢痕区域（现在包括疤痕）。 </li><li>生成的数据的直方图。直方图是一个曲线图的横坐标与纵坐标上的发生频度的垂直高度上。将光标在Z = 0的位置（ 图6左）。这可能不会在高峰期的直方图。在此图中的游标已成立选择性地分析平面下方唯一缺少的材料。该软件集成了两个光标之间的总体积。红色的有色区域显示省略。橙色未着色的区域在图6是在表面之下。直方图函数应生成一个“空隙体积”的数目与位置如图所示，测量从表面的材料损失的游标。 </li><li>使用相同的直方图，将另一个光标这次在Z = 0的高度位置（ 图7的左侧），并在相对 ​​端的其他。橘黄色的未着色的地区<strONG&gt;图7右边是露出水面。的直方图函数应生成一个“材料体积”的数目， 即多余的材料提出了上面的平坦表面。总穿的是“物质的量”减去“空体积，”在步骤3.2相同。的直方图的方法应在步骤3.2中得到相同的磨损体积，但它提供的升高和降低的材料的分布的额外详细信息，和示出了这个区域的分布的地图。 </li></ol>在上面的例子中，有不净物质损失的磨痕，取而代之的是物质利益。这是不寻常的，但有时发生时材料转移到另一个从一个测试对立面。 同样的“平坦的表面特性”的方法，有利于获得离子溅射和激光烧蚀，考虑下面的例子，在实验中删除​​的卷。 4。平面 - 火山口和离子束临文件测量估计溅射产额，执行时间深入校准作为一种替代已知的和广泛使用的方法，估计溅射产质量损失的方法，直接称重或石英微晶天平，8，9，我们发现，WLI方法是有用的，可直接可视化的基础上溅射离子束点/环形山静态溅射/光栅扫描的离子束。 图8通过以下方式获得比较对他们的陨石坑一个常入射静止5 keV和150 eV的Ar +离子束的光斑（绿色固体和蓝色的虚线）的纵向截面（橄榄开放圆圈和青色空心菱形）通过以下方式获得100×100像素的数字相同的离子束光栅扫描的表面上的Cu（110）单晶。静态束重叠对应的曲线的一个边缘的火山口来演示如何的离子束光栅扫描过程中生成的弹坑溅射ðEPTH分析。 5。超快激光烧蚀特性的平面 - 超快激光烧蚀是用于除去从固体材料，同时最大限度地减少热影响区的方法确认为10，此过程使高速率具有高纵横比的和最小的损伤（催化裂化，氧化）的其它材料的微细加工，并且开辟了可能性。高效消融的透明材料。11最近，兴趣已开发使用超快消融作为一种分析工具12-15的消融过程中的高非线性，还提供了一种减少烧蚀斑点尺寸显着低于照射光斑大小（通常定义的按1 / e 2），并，甚至低于衍射极限，已被证明。16深度分辨率，同时不具有竞争力的最佳的离子束方法，可以是&lt;20纳米。可以很容易地增加去除速率通过增加激光能量密度的非线性，所以，非常快速的剖析通过微米的材料是可能的。理想的情况下，表征材料的超快消融去除，需要一种技术，是快速定量和校准，履行WLI的所有特性。 图9示出了伪彩色图像的两个相邻陨石坑重复消融的GaAs形成具有超快（60 fs的，800nm）的激光束聚焦到光点大小≈8微米，并具有相应的0.4〜1.0焦耳/厘米2的能量密度。 6。曲面 - 机械磨损分析量分析的弯曲定期表面（球或柱）是类似的扁平的，但需要曲率除去。以下协议分析的圆形钢球磨痕。为了找到从球的体积损失，有必要做数学处理来转换球带平坦区域到一个平坦的平面有一个​​缺口，然后在第3节中所做的那样在平坦的表面测量的压痕的体积。将测得的一个球上的磨痕，首先使用简单的自动化技术，然后用柱状图技术。 <ol><li> 图10左侧示出的球上的磨痕的等距视图。选择一个AOI，排除磨痕，然后选择曲线拟合的软件工具，将改变表面，这是一个破旧的抑郁症在中间的一个不受干扰的平面面积。由于曲率去除可以是一个迭代技术，它可能是要运行的拟合几次以便不受干扰的区域是平坦的，以纳米级准确度。任何明显的非均匀性的磨痕的外部表示一个问题，并计算将是不正确的。设置的平均高度以外的疤痕Z = 0的图10右侧示出了伪彩色视图曲率去除和设置后瘢痕Z = 0，与一个AOI正确掩盖了磨损区域。 </li><li>如果可用的话，使用的测量工具，分析的磨损，如在图11中示出。总磨损量是“物质的量”，从“空体积中扣除。” </li></ol>下面的步骤描述了一个替代的方法，测量磨损量。 <ol start="3"><li>作为步骤3.3中相同的方式，反转的AOI，使磨痕是包括在内。生成的数据的直方图。将一个光标在Z = 0的位置（ 图12左）。橙色未着色的区域在图12是在表面之下。直方图功能应该产生一个“无效卷”号。 </li><li>使用相同的直方图，将另一个光标这个时候在Z = 0的高度位置（ 图13左），和其他的相对端处。右边是橙色的未着色的区域在图13的表面上方。直方图函数生成一个“物质的量”号。总磨损量是“材料体积”减去“空隙体积”，在步骤3.2中相同的平面之上。的直方图的方法应在步骤6.2，计算出相同的磨损体积，但它提供的升高和降低的材料的分布的额外详细信息，和示出了这个区域的分布的地图。 </li></ol>

没有利益冲突的声明。

例1 WLI不被广泛用于表面特性在摩擦的工作，但它实际上是一个功能强大的方法很多接触的几何形状进行定量测量的磨损量。 ，WLI产生的全3D表示的表面，可以使用一些可视化软件套件中的任何分析。这些产品的启用要执行的多种类型的测量。对于更大的横向分辨率，图像可以被“缝合”在一起，以产生广域信息（数mm），与μm的分辨率。 对于非摩擦学工?...

固体材料的表面，确定很大程度上为这些材料的性质的利益：电子，结构，和化学性质。在许多领域的研究中，另外的材料（例如，薄膜沉积由脉冲激光器/磁控溅射沉积，物理/化学气相沉积），去除材料（反应性离子蚀刻，离子溅射法，激光烧蚀法等），或一些其他进程，需要的特点。此外，通过互动与精力充沛的光脉冲或带电粒子的表面修饰有大量的应用和根本利益。摩擦学，摩擦和磨损的研究，是另一个值得注意的领域。在台式规模，大量存在的摩擦磨损试验的几何形状。非共形接触的几何形状可被使用，并且一个球或气缸可滑动或针对一个平坦的表面上，另一个球，或圆筒旋转，一个时间长度，和除去的材料的量，是我消化率。由于是三维的磨痕和不规则性，光学轮廓可能是唯一适合获得准确的磨损量测量技术。常见的分析任务还包括表面粗糙度参数，台阶高度，材料的体积损失，沟槽深度，等等，所有的人都可以得到额外简单的二维和三维地形可视化。 光学轮廓是指任何的光学方法，该方法被用来重建表面的档案。轮廓仪的方法包括激光，白光干涉，或聚焦方法。一些光学轮廓仪通过传统的有限衍射显微镜目标的基础上的方法获取信息。例如，一个激光扫描可以被集成用显微镜，得到表面的地形和真正的颜色信息。第二种方法是使用一种技术，它利用非常小的深度常规目标的重点，组建一个严重ES焦点“形象片”的表面，以获得三维地形图。 在这项工作中，我们展示了如何的白色光干涉显微镜/轮廓使机械磨损过程期间丢失的材料的量的测量，或在材料的蚀刻工艺，如离子溅射陨石坑或激光烧蚀。最受关注的是方法这种方法来说明它的装机容量大，使得它广泛使用和有吸引力的各种应用。大多数类型的WLI中采用的的Mirau技术，它使用一个反射镜的内部的显微镜物镜，使参考光信号和从样品表面反射的光之间的干扰。 Mirau干涉的选择是出于方便简单，因为整个Mirau干涉仪可以适合的显微镜物镜内，并耦合到常规的光学显微镜（ 图1）。一系列的二维间的ferograms中获取与视频摄像机，和软件组装一个三维的地形图。白色光源提供广泛的照明，这有助于克服“边缘令”模糊固有的单色光源。一个单色光源，可用于浅的地形特征，以获得更精确​​的测量。横向分辨率是从根本上限制于λ/ 2（数值孔径，NA = 1），但在大多数情况下，是较大的，被确定的目标，而这又是连接到倍率/场的视图尺寸的NA。 表1中参考。 1所有上述参数的直接比较。深度分辨率方法≈1 nm的，是一个函数的干涉的性质的技术。的文献，，Mirau WLI可以发现更多信息。 2，3。白光干涉的介绍中可以找到参考。 4。 表面分析方法原子强迫显微术（AFM），扫描电子显微镜（SEM），和触针轮廓。 WLI技术相比，毫不逊色这些方法都有自己的优点和缺点是由于光学性质的方法。 原子力显微镜是能够获得三维图像，并因此相应的横截面，但原子力显微镜在横向（&lt;100微米）和深度（&lt;10微米）的轴有一个有限的扫描能力。反观那些的WLI，主要的优势是灵活的字段的视角（FOV）高达几个毫米，同时真正的3D成像能力。此外，正如我们将证明它具有宽的垂直的扫描范围内的能力，允许一个解决了各种表面改性根本问题。研究人员曾与AFM的样品时，测量了长时间的低垂直梯度功能与平面定位的问题。一般情况下，人们可能会认为WLI / OP“快速”超过AFM技术。当然，也有横向功能来解决一些领域，只有原子力显微镜是合适的：当特征尺寸小于WLI横向分辨率的情况下，数据WLI是含糊不清的方式，由于未知的或复杂的光学性质的样品影响测量的精确度（将在后面讨论），等 SEM是一种强有力的方式，表面看，较大的对焦深度的视场大小，比任何传统的光学显微镜可以提供非常灵活的。在同一时间，通过SEM的三维成像是麻烦的，特别是因为它需要考虑的立体像对的图像，然后被转换成3D图像的补色的方法，或通过与光学观众观察，或用于直接计算的深度之间的不同点，有兴趣的样本。5相比之下，WLI / OP轮廓提供了易于使用的三维重建，同时灵活的FOV。 WLI通过全面扫描所需的高度范围内的特定的样品（从纳米到几百微米）。 WLI不受影响的样品材料的导电性，这可能是一个问题，用SEM。 WLI显然并不需要一个真空。另一方面，也有一些SEM提供优质的信息：横向的功能，可以解决以下特征尺寸的横向分辨率的WLI或案件的不同部分的样本地形区分，只有当二次电子发射系数有所不同。 多一个表面检测的技术，它被广泛用于在二次离子质谱6和在领域的微机电系统表征7是触笔轮廓。这种技术很受欢迎，因为它的简单性和鲁棒性。它是基于直接的机械接触的触针尖端在样品表面的扫描。这是一个粗糙的接触式刀具，这是能够扫描沿一个单一的在一个时间线。这使得三维表面，光栅扫描成像非常耗时。触针技术的另一个缺点是高纵横比，其特征针尖大小（亚微米至几微米的典型）暗示的尖端半径和尖端顶角大小与测量表面特征的难度。触针轮廓的一个优点是它的不敏感，在不同的样品的光学性质，它可以影响WLI / OP测量（将在后面讨论）的准确性。 使用常规Mirau型WLI中（ 图1），得到本制品的表面地图。如ZYGO，KLA-Tencor公司，纳米科学，Zemetrics，Nanovea，FRT，基恩士，布鲁克，和泰勒霍布森的许多公司生产的商用台式OP工具。所收购的地图进行了重建，并使用商业软件的类型，通常用于WLI，O，扫描电子处理R探头显微镜。该软件有能力执行数学运算的表面，横截面轮廓分析，无效的和物质的量的计算，以及平面校正。其他软件包可以自动执行这些功能。

<table border="1"><tbody><tr><td>的Si单晶基板，砷化镓（GaAs）和铜</td><td></td><td></td><td>溅射和射频消融</td></tr><tr><td>纯金属合金</td><td></td><td></td><td>摩擦学的例子</td></tr></tbody></table>

characterization of surface modifications by white light interferometry: applications in ion sputtering, laser ablation, and tribology experiments

在材料科学与工程，它往往是必要的以获得定量测量的表面形貌与微米横向分辨率。从被测物体表面，可随后分析三维地形图，使用各种软件包中提取所需要的信息。 在这篇文章中，我们介绍了如何白光干涉仪，光学轮廓（OP）在一般情况下，与一般的表面分析软件相结合，可用于材料科学和工程任务。在这篇文章中，都表现出了一些应用程序的白光干涉调查的表面质量法的修改，在摩擦学和润滑和磨损现象。我们半导体和金属之间的相互作用与高能离子（溅射），激光照射（烧蚀），以及易地测量摩擦试样的磨损特征的产品。 </p&gt; 具体来说，我们将讨论： <ol class="lroman"><li>传统的离子溅射基于质谱，如的溅射速率/ Si和Cu的产量测量和随后的时间深转换方面。 </li><li>结果定量表征飞秒激光照射半导体表面的相互作用。这些结果是重要的应用程序，如烧蚀质谱，其中蒸发的材料的数量，可以研究和通过控制脉冲持续时间和每脉冲能量。因此，通过确定的火山口的几何形状，可以定义与实验设置条件的深度和横向分辨率。 </li><li>的表面粗糙度参数的测量在两个维度中，定量测定发生的作为结果的摩擦和磨损测试的表面磨损。 </li></ol>一些固有的缺点，可能出现的文物，以及不确定性评估的白光干涉测量的方法将讨论和解释。

<html><img alt="图1" src="/files/ftp_upload/50260/50260fig1.jpg" /> 图1。照片，一个简单的轮廓，在本研究中使用的：多目标炮塔在图片中看到。两个目标是标准的（10倍和50倍），另外两个是的Mirau目标（10倍和50倍）。这种显微镜有的中间放大功能，使逐步放大乘数为0.62，1.00，1.25，或2.00被选中。 <a href="https://www.jove.com/files/ftp_upload/50260/50260fig1large.jpg" target="_blank">...

Watch this Scientific Journal Video about Characterization of Surface Modifications by White Light Interferometry: Applications in Ion Sputtering, Laser Ablation, and Tribology Experiments at JoVE.com

Characterization of Surface Modifications by White Light Interferometry: Applications in Ion Sputtering, Laser Ablation, and Tribology Experiments

白色光镜干涉是一个光学，非接触式和快速的方法，用于测量的表面的地形。它示出如何使用该方法可以应用于朝向机械磨损分析，其中穿疤痕对摩擦磨损试验样品进行了分析，以及在材料科学中，以确定离子束溅射或激光烧蚀的体积和深度。

白光干涉表面改性中的应用离子溅射，激光烧蚀，与摩擦学实验表征

In materials science and engineering it is often necessary to obtain quantitative measurements of surface topography with micrometer lateral resolution. ...

characterization-surface-modifications-white-light-interferometry

Research

JoVE Journal

Engineering

15.5K 次观看.  Argonne National Laboratory. 白色光镜干涉是一个光学，非接触式和快速的方法，用于测量的表面的地形。它示出如何使用该方法可以应用于朝向机械磨损分析，其中穿疤痕对摩擦磨损试验样品进行了分析，以及在材料科学中，以确定离子束溅射或激光烧蚀的体积和深度。

视频: Characterization of Surface Modifications by White Light Interferometry: Applications in Ion Sputtering, Laser Ablation, and Tribology Experiments

Fabrication And Characterization Of Photonic Crystal Slow Light Waveguides And Cavities

Slow light has been one of the hot topics in the photonics community in the past decade, generating great interest both from a fundamental point of view and for its considerable potential for practical applications. Slow light photonic crystal waveguides, in particular, have played a major part and have been successfully employed for delaying optical signals1-4 and the enhancement of both linear5-7 and nonlinear devices.8-11
Photonic crystal cavities achieve similar effects to that of slow light waveguides, but over a reduced band-width. These cavities offer high Q-factor/volume ratio, for the realization of optically12 and electrically13 pumped ultra-low threshold lasers and the enhancement of nonlinear effects.14-16 Furthermore, passive filters17 and modulators18-19 have been demonstrated, exhibiting ultra-narrow line-width, high free-spectral range and record values of low energy consumption.
To attain these exciting results, a robust repeatable fabrication protocol must be developed. In this paper we take an in-depth look at our fabrication protocol which employs electron-beam lithography for the definition of photonic crystal patterns and uses wet and dry etching techniques. Our optimised fabrication recipe results in photonic crystals that do not suffer from vertical asymmetry and exhibit very good edge-wall roughness. We discuss the results of varying the etching parameters and the detrimental effects that they can have on a device, leading to a diagnostic route that can be taken to identify and eliminate similar issues.
The key to evaluating slow light waveguides is the passive characterization of transmission and group index spectra. Various methods have been reported, most notably resolving the Fabry-Perot fringes of the transmission spectrum20-21 and interferometric techniques.22-25 Here, we describe a direct, broadband measurement technique combining spectral interferometry with Fourier transform analysis.26 Our method stands out for its simplicity and power, as we can characterise a bare photonic crystal with access waveguides, without need for on-chip interference components, and the setup only consists of a Mach-Zehnder interferometer, with no need for moving parts and delay scans.
When characterising photonic crystal cavities, techniques involving internal sources21 or external waveguides directly coupled to the cavity27 impact on the performance of the cavity itself, thereby distorting the measurement. Here, we describe a novel and non-intrusive technique that makes use of a cross-polarised probe beam and is known as resonant scattering (RS), where the probe is coupled out-of plane into the cavity through an objective. The technique was first demonstrated by McCutcheon et al.28 and further developed by Galli et al.29

Use of photonic crystal slow light waveguides and cavities has been widely adopted by the photonics community in many differing applications. Therefore fabrication and characterization of these devices are of great interest. This paper outlines our fabrication technique and two optical characterization methods, namely: interferometric (waveguides) and resonant scattering (cavities).

光子晶体慢光波导和腔体的制备与表征

Slow light has been one of the hot topics in the photonics community in the past decade, generating great interest both from a fundamental point of view ...

科研

工程学

Characterization of Electrode Materials for Lithium Ion and Sodium Ion Batteries Using Synchrotron Radiation Techniques

Intercalation compounds such as transition metal oxides or phosphates are the most commonly used electrode materials in Li-ion and Na-ion batteries. During insertion or removal of alkali metal ions, the redox states of transition metals in the compounds change and structural transformations such as phase transitions and/or lattice parameter increases or decreases occur. These behaviors in turn determine important characteristics of the batteries such as the potential profiles, rate capabilities, and cycle lives. The extremely bright and tunable x-rays produced by synchrotron radiation allow rapid acquisition of high-resolution data that provide information about these processes. Transformations in the bulk materials, such as phase transitions, can be directly observed using X-ray diffraction (XRD), while X-ray absorption spectroscopy (XAS) gives information about the local electronic and geometric structures (e.g.&#160;changes in redox states and bond lengths). In situ experiments carried out on operating cells are particularly useful because they allow direct correlation between the electrochemical and structural properties of the materials. These experiments are time-consuming and can be challenging to design due to the reactivity and air-sensitivity of the alkali metal anodes used in the half-cell configurations, and/or the possibility of signal interference from other cell components and hardware. For these reasons, it is appropriate to carry out ex situ experiments (e.g.&#160;on electrodes harvested from partially charged or cycled cells) in some cases. Here, we present detailed protocols for the preparation of both ex situ and in situ samples for experiments involving synchrotron radiation and demonstrate how these experiments are done.

We describe the use of synchrotron X-ray absorption spectroscopy (XAS) and X-ray diffraction (XRD) techniques to probe details of intercalation/deintercalation processes in electrode materials for Li-ion and Na-ion batteries. Both in situ and ex situ experiments are used to understand structural behavior relevant to the operation of devices

正极材料的同步辐射技术锂离子和钠离子电池表征

Intercalation compounds such as transition metal oxides or phosphates are the most commonly used electrode materials in Li-ion and Na-ion batteries. ...

Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment

The wettability of silicon (Si) is one of the important parameters in the technology of surface functionalization of this material and fabrication of biosensing devices. We report on a protocol of using KrF and ArF lasers irradiating Si (001) samples immersed in a liquid environment with low number of pulses and operating at moderately low pulse fluences to induce Si wettability modification. Wafers immersed for up to 4 hr in a 0.01% H2O2/H2O solution did not show measurable change in their initial contact angle (CA) ~75&#176;. However, the 500-pulse KrF and ArF lasers irradiation of such wafers in a microchamber filled with 0.01% H2O2/H2O solution at 250 and 65 mJ/cm2, respectively, has decreased the CA to near 15&#176;, indicating the formation of a superhydrophilic surface. The formation of OH-terminated Si (001), with no measurable change of the wafer&#8217;s surface morphology, has been confirmed by X-ray photoelectron spectroscopy and atomic force microscopy measurements. The selective area irradiated samples were then immersed in a biotin-conjugated fluorescein-stained nanospheres solution for 2 hr, resulting in a successful immobilization of the nanospheres in the non-irradiated area. This illustrates the potential of&#160;the method for selective area biofunctionalization and fabrication of advanced Si-based biosensing architectures. We also describe a similar protocol of irradiation of wafers immersed in methanol (CH3OH) using ArF laser operating at pulse fluence of 65 mJ/cm2 and in situ formation of a strongly hydrophobic surface of Si (001) with the CA of 103&#176;. The XPS results indicate ArF laser induced formation of Si&#8211;(OCH3)x compounds responsible for the observed hydrophobicity. However, no such compounds were found by XPS on the Si surface irradiated by KrF laser in methanol, demonstrating the inability of the KrF laser to photodissociate methanol and create -OCH3 radicals.

We report on a process of in situ alteration of HF treated Si (001) surface into a hydrophilic or hydrophobic state by irradiating samples in microfluidic chambers filled with&#160;H2O2/H2O solution (0.01%-0.5%) or methanol solutions using pulsed UV laser of a relative low pulse fluence.

硅表面润湿性的选择区域改性脉冲紫外激光照射在液体环境

The wettability of silicon (Si) is one of the important parameters in the technology of surface functionalization of this material and fabrication of ...

Compact Lens-less Digital Holographic Microscope for MEMS Inspection and Characterization

A micro-electro-mechanical-system (MEMS) is a widely used component in many industries, including energy, biotechnology, medical, communications, and automotive. However, effective inspection and characterization metrology systems are needed to ensure the functional reliability of MEMS. This study presents a system based on digital holography as a tool for MEMS metrology. Digital holography has gained increasing attention in the past 20 years. With the fast development and decreasing cost of sensor arrays, resolution of such systems has increased broadening potential applications. Thus, it has attracted attention from both research and industry sides as a potential reliable tool for industrial metrology. Indeed, by recording the interference pattern between an object beam (which contains sample height information) and a reference beam on a CCD camera, one can retrieve the quantitative phase information of an object. However, most of digital holographic systems are bulky and thus not easy to implement on industry production lines. The novelty of the system presented is that it is lens-less and thus very compact. In this study, it is shown that the Compact Digital Holographic Microscope (CDHM) can be used to evaluate several characteristics typically consider as criteria in MEMS inspections. The surface profiles of MEMS in both static and dynamic conditions are presented. Comparison with AFM is investigated to validate the accuracy of the CDHM.

We present a compact reflection digital holographic system (CDHM) for inspection and characterization of MEMS devices. A lens-less design using a diverging input wave providing natural geometrical magnification is demonstrated. Both static and dynamic studies are presented.

紧凑的镜头少数字全息显微镜的MEMS检测与表征

A micro-electro-mechanical-system (MEMS) is a widely used component in many industries, including energy, biotechnology, medical, communications, and ...

Printing Fabrication of Bulk Heterojunction Solar Cells and In Situ Morphology Characterization

Polymer-based materials hold promise as low-cost, flexible efficient photovoltaic devices. Most laboratory efforts to achieve high performance devices have used devices prepared by spin coating, a process that is not amenable to large-scale fabrication. This mismatch in device fabrication makes it difficult to translate quantitative results obtained in the laboratory to the commercial level, making optimization difficult. Using a mini-slot die coater, this mismatch can be resolved by translating the commercial process to the laboratory and characterizing the structure formation in the active layer of the device in real time and in situ as films are coated onto a substrate. The evolution of the morphology was characterized under different conditions, allowing us to propose a mechanism by which the structures form and grow. This mini-slot die coater offers a simple, convenient, material efficient route by which the morphology in the active layer can be optimized under industrially relevant conditions. The goal of this protocol is to show experimental details of how a solar cell device is fabricated using a mini-slot die coater and technical details of running in situ structure characterization using the mini-slot die coater.

Printing Fabrication of Bulk Heterojunction Solar Cells and In Situ Morphology Characterization

Here, we present a protocol to fabricate organic thin film solar cells using a mini-slot die coater and related in-line structure characterizations using synchrotron scattering techniques.

散装异质结太阳能电池的印刷和制作<em&gt;原位</em&gt;形态特征

Polymer-based materials hold promise as low-cost, flexible efficient photovoltaic devices. Most laboratory efforts to achieve high performance devices ...

Fabrication of White Light-emitting Electrochemical Cells with Stable Emission from Exciplexes

The authors present an approach for fabricating stable white light emission from polymer light-emitting electrochemical cells (PLECs) having an active layer which consists of blue-fluorescent poly(9,9-di-n-dodecylfluorenyl-2,7-diyl) (PFD) and &#960;-conjugated triphenylamine molecules. This white light emission originates from exciplexes formed between PFD and amines in electronically excited states. A device containing PFD, 4,4&#39;,4&#39;&#39;-tris[2-naphthyl(phenyl)amino]triphenylamine (2-TNATA), Poly(ethylene oxide) and K2CF3SO3 showed white light emission with Commission internationale de l&#39;&#233;clairage (CIE) coordinates of (0.33, 0.43) and a Color Rendering Index (CRI) of Ra = 73 at an applied voltage of 3.5 V. Constant voltage measurements showed that the CIE coordinates of (0.27, 0.37), Ra of 67, and the emission color observed immediately after application of a voltage of 5 V were nearly unchanged and stable after 300 sec.

The authors present a method for fabricating stable white-light-emitting electrochemical cells utilizing emission from exciplexes formed between a blue-emitting fluorene polymer and aromatic amines.

白的制造发光电化学细胞与来自激发络合物稳定的发射

The authors present an approach for fabricating stable white light emission from polymer light-emitting electrochemical cells (PLECs) having an active ...

Fabrication of Polymer Microspheres for Optical Resonator and Laser Applications

This paper describes three methods of preparing fluorescent microspheres comprising &#960;-conjugated or non-conjugated polymers: vapor diffusion, interface precipitation, and mini-emulsion. In all methods, well-defined, micrometer-sized spheres are obtained from a self-assembling process in solution. The vapor diffusion method can result in spheres with the highest sphericity and surface smoothness, yet the types of the polymers able to form these spheres are limited. On the other hand, in the mini-emulsion method, microspheres can be made from various types of polymers, even from highly crystalline polymers with coplanar, &#960;-conjugated backbones. The photoluminescent (PL) properties from single isolated microspheres are unusual: the PL is confined inside the spheres, propagates at the circumference of the spheres via the total internal reflection at the polymer/air interface, and self-interferes to show sharp and periodic resonant PL lines. These resonating modes are so-called "whispering gallery modes" (WGMs). This work demonstrates how to measure WGM PL from single isolated spheres using the micro-photoluminescence (&#181;-PL) technique. In this technique, a focused laser beam irradiates a single microsphere, and the luminescence is detected by a spectrometer. A micromanipulation technique is then used to connect the microspheres one by one and to demonstrate the intersphere PL propagation and color conversion from coupled microspheres upon excitation at the perimeter of one sphere and detection of PL from the other microsphere. These techniques, &#181;-PL and micromanipulation, are useful for experiments on micro-optic application using polymer materials.

Protocols for the synthesis of microspheres from polymers, the manipulation of microspheres, and micro-photoluminescence measurements are presented.

用于光学谐振器和激光应用的聚合物微球的制造

This paper describes three methods of preparing fluorescent microspheres comprising &#960;-conjugated or non-conjugated polymers: vapor diffusion, ...

Experimental Methods for Trapping Ions Using Microfabricated Surface Ion Traps

Ions trapped in a quadrupole Paul trap have been considered one of the strong physical candidates to implement quantum information processing. This is due to their long coherence time and their capability to manipulate and detect individual quantum bits (qubits). In more recent years, microfabricated surface ion traps have received more attention for large-scale integrated qubit platforms. This paper presents a microfabrication methodology for ion traps using micro-electro-mechanical system (MEMS) technology, including the fabrication method for a 14 &#181;m-thick dielectric layer and metal overhang structures atop the dielectric layer. In addition, an experimental procedure for trapping ytterbium (Yb) ions of isotope 174 (174Yb+) using 369.5 nm, 399 nm, and 935 nm diode lasers is described. These methodologies and procedures involve many scientific and engineering disciplines, and this paper first presents the detailed experimental procedures. The methods discussed in this paper can easily be extended to the trapping of Yb ions of isotope 171 (171Yb+) and to the manipulation of qubits.

This paper presents a microfabrication methodology for surface ion traps, as well as a detailed experimental procedure for trapping ytterbium ions in a room-temperature environment.

利用 Microfabricated 表面离子阱捕获离子的实验方法

Ions trapped in a quadrupole Paul trap have been considered one of the strong physical candidates to implement quantum information processing. This is due ...

Production and Characterization of Vacuum Deposited Organic Light Emitting Diodes

A method for producing simple and efficient thermally-activated delayed fluorescence organic light-emitting diodes (OLEDs) based on guest-host or exciplex donor-acceptor emitters is presented. With a step-by-step procedure, readers will be able to repeat and produce OLED devices based on simple organic emitters. A patterning procedure allowing the creation of personalized indium tin oxide (ITO) shape is shown. This is followed by the evaporation of all layers, encapsulation and characterization of each individual device. The end goal is to present a procedure that will give the opportunity to repeat the information presented in cited publication but also using different compounds and structures in order to prepare efficient OLEDs.

A protocol for the production of simple structured organic light-emitting diodes (OLEDs) is presented.

真空沉积有机发光二极管的生产与表征

A method for producing simple and efficient thermally-activated delayed fluorescence organic light-emitting diodes (OLEDs) based on guest-host or exciplex ...

Shaping the Amplitude and Phase of Laser Beams by Using a Phase-only Spatial Light Modulator

The aim of this article is to visually demonstrate the utilization of an interferometric method for encoding complex fields associated with coherent laser radiation. The method is based on the coherent sum of two uniform waves, previously encoded into a phase-only spatial light modulator (SLM) by spatial multiplexing of their phases. Here, the interference process is carried out by spatial filtering of light frequencies at the Fourier plane of certain imaging system. The correct implementation of this method allows arbitrary phase and amplitude information to be retrieved at the output of the optical system.
It is an on-axis, rather than off-axis encoding technique, with a direct processing algorithm (not an iterative loop), and free from coherent noise (speckle). The complex field can be exactly retrieved at the output of the optical system, except for some loss of resolution due to the frequency filtering process. The main limitation of the method might come from the inability to operate at frequency rates higher than the refresh rate of the SLM. Applications include, but are not limited to, linear and non-linear microscopy, beam shaping, or laser micro-processing of material surfaces.

We show how to encode the complex field of laser beams by using a single phase element. A common-path interferometer is employed to mix the phase information displayed into a phase-only spatial light modulator to finally retrieve the desired complex field pattern at the output of an optical imaging system.

利用相位空间光调制器建立激光光束的振幅和相位

The aim of this article is to visually demonstrate the utilization of an interferometric method for encoding complex fields associated with coherent laser ...