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Plasma Sources and Applications Centre,
National Institute of Education,
Plasma Sources and Applications Centre, National Institute of Education
Shiyong Huang has not added Biography.
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Homogeneous nanocrystalline cubic silicon carbide films prepared by inductively coupled plasma chemical vapor deposition.
Nanotechnology Nov, 2007 | Pubmed ID: 21730481
Nanyang Technological University
Jian W. M. Lim1,
Igor Levchenko1,2,
Muhammad W. A. B. Rohaizat1,
Shiyong Huang1,
Luxiang Xu1,
Yu Fei Sun1,
George C. Potrivitu1,
Jen S. Yee1,
Roysmond Z. W. Sim1,
Youmei Wang3,
Svitlana Levchenko1,
Kateryna Bazaka2,1,
Shuyan Xu1
1Plasma Sources and Applications Centre, National Institute of Education, Nanyang Technological University,
2School of Chemistry, Physics, Mechanical Engineering, Queensland University of Technology,
3Department of Physics, School of Science, Hangzhou Dianzi University
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