Charles T. Black

Liquids on topologically nanopatterned surfaces.

Polymer self-assembly as a novel extension to optical lithography.

Phthalocyanine blends improve bulk heterojunction solar cells.

Morphology of air nanobubbles trapped at hydrophobic nanopatterned surfaces.

Nanoimprint-induced molecular orientation in semiconducting polymer nanostructures.

Improved power conversion efficiency in bulk heterojunction organic solar cells with radial electron contacts.

One-volt operation of high-current vertical channel polymer semiconductor field-effect transistors.

Chemically enhancing block copolymers for block-selective synthesis of self-assembled metal oxide nanostructures.

Controlling Morphology and Molecular Packing of Alkane Substituted Phthalocyanine Blend Bulk Heterojunction Solar Cells.

Robust superhydrophobicity in large-area nanostructured surfaces defined by block-copolymer self assembly.

Nanostructured surfaces frustrate polymer semiconductor molecular orientation.

Self-assembled phases of block copolymer blend thin films.

Quantifying bulk and surface recombination processes in nanostructured water splitting photocatalysts via in situ ultrafast spectroscopy.

Sub-50-nm self-assembled nanotextures for enhanced broadband antireflection in silicon solar cells.

Characterization of plasmonic hole arrays as transparent electrical contacts for organic photovoltaics using high-brightness Fourier transform methods.

Arbitrary lattice symmetries via block copolymer nanomeshes.

Molecular helices as electron acceptors in high-performance bulk heterojunction solar cells.

Elastic Properties of Protein Functionalized Nanoporous Polymer Films.

Wettability of partially suspended graphene.

Patterning at the 10 nanometer length scale using a strongly segregating block copolymer thin film and vapor phase infiltration of inorganic precursors.

Non-native three-dimensional block copolymer morphologies.

Antifogging abilities of model nanotextures.

Probing Synaptic Biomechanics Using Micropillar Arrays.

Thickness-dependence of block copolymer coarsening kinetics.

Aberration-Corrected Electron Beam Lithography at the One Nanometer Length Scale.