Atomically Traceable Nanostructure FabricationJosh B. Ballard 1, Don D. Dick 2, Stephen J. McDonnell 3, Maia Bischof 4, Joseph Fu 5, James H. G. Owen 1, William R. Owen 1, Justin D. Alexander 1, David L. Jaeger 4, Pradeep Namboodiri 5, Ehud Fuchs 1, Yves J. Chabal 3, Robert M. Wallace 3, Richard Reidy 4, Richard M. Silver 5, John N. Randall 1, James Von Ehr 1
1Zyvex Labs, 2Department of Physics, University of Texas at Dallas, 3Department of Materials Science and Engineering, University of Texas at Dallas, 4Materials Science and Engineering, University of North Texas, 5National Institute of Standards and Technology
We report a protocol for combining the atomic metrology of the Scanning Tunneling Microscope for surface patterning with selective Atomic Layer Deposition and Reactive Ion Etching. Using a robust process involving numerous atmospheric exposures and transport, 3D nanostructures with atomic metrology are fabricated.
