Name: soft lithographic functionalization and patterning oxide-free silicon and germanium
Uploaded: 2011-12-16T12:00:00
Duration: 12 min 38 s
Description: Watch this Scientific Journal Video about Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium at JoVE.com

Мы признаем, финансовой поддержке NSF награду CMMI-1000724.

<ol>
	<li>Kumar, A., Abbott, N. L., Kim, E., Biebuyck, H. A., Whitesides, G. M. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Patterned+Self-Assembled+Monolayers+and+Mesoscale+Phenomena.">Patterned Self-Assembled Monolayers and Mesoscale Phenomena.</a> Accounts. Chem. Res. 28 (5), 219-226 (1995).</li><li>Kumar, A., Biebuyck, H. A., Whitesides, G. M. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Patterning+Self-Assembled+Monolayers:+Applications+in+Materials+Science.">Patterning Self-Assembled Monolayers: Applications in Materials Science.</a> Langmuir. 10 (5), 1498-1511 (1994).</li><li>Kumar, A., Whitesides, G. M. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Features+of+gold+having+micrometer+to+centimeter+dimensions+can+be+formed+through+a+combination+of+stamping+with+an+elastomeric+stamp+and+an+alkanethiol+"ink"+followed+by+chemical+etching.">Features of gold having micrometer to centimeter dimensions can be formed through a combination of stamping with an elastomeric stamp and an alkanethiol "ink" followed by chemical etching.</a> Applied Physics Letters. 63 (14), 2002-2004 (1993).</li><li>Wilbur, J. L., Kumar, A., Biebuyck, H. A., Kim, E., Whitesides, G. M. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Microcontact+printing+of+self-assembled+monolayers:+applications+in+microfabrication.">Microcontact printing of self-assembled monolayers: applications in microfabrication.</a> Nanotechnology. 7 (4), 452-457 (1996).</li><li>Wilbur, J. L., Kumar, A., Kim, E., Whitesides, G. M. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Microfabrication+by+microcontact+printing+of+self-assembled+monolayers.">Microfabrication by microcontact printing of self-assembled monolayers.</a> Advanced Materials (Weinheim, Germany). 6 (7/8), 600-604 (1994).</li><li>Ruiz, S. A., Chen, C. S. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Microcontact+printing:+a+tool+to+pattern.">Microcontact printing: a tool to pattern.</a> Soft Matter. 3 (2), 168-177 (2007).</li><li>Perl, A., Reinhoudt, D. N., Huskens, J. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Microcontact+Printing:+Limitations+and+Achievements.">Microcontact Printing: Limitations and Achievements.</a> Advanced Materials (Weinheim, Germany). 21 (22), 2257-2268 (2009).</li><li>Kumar, A., Biebuyck, H. A., Abbott, N. L., Whitesides, G. M. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=The+use+of+self-assembled+monolayers+and+a+selective+etch+to+generate+patterned+gold+features.">The use of self-assembled monolayers and a selective etch to generate patterned gold features.</a> J. Am. Chem. Soc. 114 (23), 9188-9191 (1992).</li><li>Ravoo, B. J. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Microcontact+chemistry:+surface+reactions+in+nanoscale+confinement.">Microcontact chemistry: surface reactions in nanoscale confinement.</a> Journal of Materials Chemistry. 19 (47), 8902-8906 (2009).</li><li>Biebuyck, H. A., Larsen, N. B., Delamarche, E., Michel, B. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Lithography+beyond+light:+Microcontact+printing+with+monolayer+resists.">Lithography beyond light: Microcontact printing with monolayer resists.</a> Ibm. J. Res. Dev. 41 (1-2), 159-170 (1997).</li><li>Delamarche, E., Schmid, H., Bietsch, A., Larsen, N. B., Rothuizen, H., Michel, B., Biebuyck, H. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Transport+Mechanisms+of+Alkanethiols+during+Microcontact+Printing+on+Gold.">Transport Mechanisms of Alkanethiols during Microcontact Printing on Gold.</a> J. Phys. Chem. B. 102 (18), 3324-3334 (1998).</li><li>Larsen, N. B., Biebuyck, H., Delamarche, E., Michel, B. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Order+in+microcontact+printed+self-assembled+monolayers.">Order in microcontact printed self-assembled monolayers.</a> J Am Chem Soc. 119 (13), 3017-3026 (1997).</li><li>Michel, B., Bernard, A., Bietsch, A., Delamarche, E., Geissler, M., Juncker, D., Kind, H., Renault, J. P., Rothuizen, H., Schmid, H., Schmidt-Winkel, P., Stutz, R., Wolf, H. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Printing+meets+lithography:+Soft+approaches+to+high-resolution+printing.">Printing meets lithography: Soft approaches to high-resolution printing.</a> IBM Journal of Research and Development. 45 (5), 697-719 (2001).</li><li>Libioulle, L., Bietsch, A., Schmid, H., Michel, B., Delamarche, E. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Contact-Inking+Stamps+for+Microcontact+Printing+of+Alkanethiols+on+Gold.">Contact-Inking Stamps for Microcontact Printing of Alkanethiols on Gold.</a> Langmuir. 15 (2), 300-304 (1999).</li><li>Sharpe, R. B. A., Burdinski, D., Huskens, J., Zandvliet, H. J. W., Reinhoudt, D. N., Poelsema, B. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Spreading+of+16-Mercaptohexadecanoic+Acid+in+Microcontact+Printing.">Spreading of 16-Mercaptohexadecanoic Acid in Microcontact Printing.</a> Langmuir. 20 (20), 8646-8651 (2004).</li><li>Workman, R. K., Manne, S. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Molecular+Transfer+and+Transport+in+Noncovalent+Microcontact+Printing.">Molecular Transfer and Transport in Noncovalent Microcontact Printing.</a> Langmuir. 20 (3), 805-815 (2004).</li><li>Li, X. -. M., Peter, M., Huskens, J., Reinhoudt, D. N. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Catalytic+Microcontact+Printing+without+Ink.">Catalytic Microcontact Printing without Ink.</a> Nano Lett. 3 (10), 1449-1453 (2003).</li><li>Shestopalov, A. A., Clark, R. L., Toone, E. J. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Inkless+Microcontact+Printing+on+Self-Assembled+Monolayers+of+Fmoc-Protected+Aminothiols.">Inkless Microcontact Printing on Self-Assembled Monolayers of Fmoc-Protected Aminothiols.</a> J. Am. Chem. Soc. 129 (145), 13818-13819 (2007).</li><li>Shestopalov, A. A., Clark, R. L., Toone, E. J. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Catalytic+Microcontact+Printing+on+Chemically+Functionalized+H-Terminated+Silicon.">Catalytic Microcontact Printing on Chemically Functionalized H-Terminated Silicon.</a> Langmuir. 26 (3), 1449-1451 (2010).</li><li>Shestopalov, A. A., Clark, R. L., Toone, E. J. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Inkless+Microcontact+Printing+on+SAMs+of+Boc-+and+TBS-Protected+Thiols.">Inkless Microcontact Printing on SAMs of Boc- and TBS-Protected Thiols.</a> Nano Lett. 10 (1), 43-46 (2010).</li><li>Snyder, P. W., Johannes, M. S., Vogen, B. N., Clark, R. L., Toone, E. J. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Biocatalytic+Microcontact+Printing.">Biocatalytic Microcontact Printing.</a> J. Org. Chem. 72 (19), 7459-7461 (2007).</li><li>Morris, C. J., Shestopalov, A. A., Gold, B. H., Clark, R. L., Toone, E. J. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Patterning+NHS-Terminated+SAMs+on+Germanium.">Patterning NHS-Terminated SAMs on Germanium.</a> Langmuir. 27 (10), 6486-6489 (2011).</li><li>Shestopalov, A. A., Morris, C. J., Vogen, B. N., Hoertz, A., Clark, R. L., Toone, E. J. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Soft-Lithographic+Approach+to+Functionalization+and+Nanopatterning+Oxide-Free+Silicon.">Soft-Lithographic Approach to Functionalization and Nanopatterning Oxide-Free Silicon.</a> Langmuir. 27 (10), 6478-6485 (2011).</li></ol>

Нам нечего раскрывать

Представлен протокол формы или бескраскового печати микроконтактной, которые могут быть универсально применяться к любой подложке способна поддерживать простой и упорядоченной монослоев. В этом методе, штамп-иммобилизованных катализаторов переводов шаблон для опорной поверхности соответствующих функциональных групп. Поскольку процесс не зависит от чернил переход от штампа к поверхности диффузионного ограничения разрешение традиционных и реактивной μCP отпадает, что позволяет рутинного производства наноразмерных объектов. Включение первичной высоко упорядоченных молекулярных система обеспечивает полную защиту основного полупроводникового от окисления повреждения. В то же время, поддерживает метод иммобилизации громоздких реактивных групп за счет использования вторичных реактивных overlayer, вместе система обеспечивает как защиту, так и функционализации. Техники начинается с формирования устойчивых углерод-поверхность облигаций позволяет химически инертный primarу монослоя, который служит эффективным барьером для образования оксидов. Формирование вторичного реактивного overlayer обеспечивает терминал NHS функциональные группы, которые служат точками крепления для различных химических и биологических остатков. Это устойчивое двухслойных молекулярной системы, впоследствии узорной используя наш подход каталитического μCP. Подход, представленный в данном исследовании, предлагает общий метод для подложек структурирование полупроводника с широким спектром органических и биологических материалов. Возможность создавать узорные органических полупроводниковых интерфейсы без дорогостоящих, сложных приборов предлагает многочисленные возможности в таких областях, как электроника, нанотехнологии, биохимия и биофизика.

<table border="1"><tbody><tr><th> Название реагента </th><th> Компания / модель </th></tr><tr><td> XPS-спектрометра </td><td> Кратос оси Ультра </td></tr><tr><td> Атомно-силового микроскопа </td><td> Veeco D3100 </td></tr><tr><td> SEM-FEG микроскопом </td><td> FEI XL30 </td></tr><tr><td> Флуоресцентный микроскоп </td><td> Zeiss Axio Imager </td></tr><tr><td> Heatblock </td><td> VWR </td></tr><tr><td> Вакуум-насос </td><td> Бок Эдвардс </td></tr><tr><td> Система для очистки воды </td><td> Millipore </td></tr><tr><td> TESP кремниевых зондов </td><td> Veeco </td></tr><tr><td> Кремний </td><td></td></tr><tr><td> Давление Флаконы </td><td> Chemglass </td></tr><tr><td> Вакуумный коллектор </td><td> Chemglass </td></tr><tr><td> УФ-лампы </td><td> UVP </td></tr><tr><td> Материал Stamp </td><td> См. ссылки 20 и 18 </td></tr><tr><td> Фильтры PFTE шприц </td><td> VWR </td></tr><tr><td> Nano Газа </td><td> Cyantek </td></tr><tr><td> HCl </td><td> Сигма </td></tr><tr><td> Этанол </td><td> Сигма </td></tr><tr><td> Ацетон </td><td> Сигма </td></tr><tr><td> HF </td><td> Сигма </td></tr><tr><td> Хлорбензол </td><td> Сигма </td></tr><tr><td> PCl5 </td><td> Сигма </td></tr><tr><td> Пропенил хлорид магния </td><td> Сигма </td></tr><tr><td> Октил Хлорид магния </td><td> Сигма </td></tr><tr><td> Тетрахлорметана </td><td> Сигма </td></tr><tr><td> Бок защищены этилендиамин </td><td> Сигма </td></tr><tr><td> TFA </td><td> Сигма </td></tr><tr><td> Натрия 2-mercaptoethanesulfonate </td><td> Сигма </td></tr><tr><td> 4N HCl раствор в диоксане </td><td> Сигма </td></tr><tr><td> Лизин-N, N-diacetic кислоты </td><td> Сигма </td></tr><tr><td> Et 3 N </td><td> Сигма </td></tr><tr><td> DMF </td><td> Сигма </td></tr><tr><td> NiSO 4 </td><td> Сигма </td></tr><tr><td> NaP </td><td> Сигма </td></tr><tr><td> NaCl </td><td> Сигма </td></tr><tr><td> имидазол </td><td> Сигма </td></tr><tr><td> PBS </TD&gt; <td> Сигма </td></tr></tbody></table>

soft lithographic functionalization and patterning oxide-free silicon and germanium

The development of hybrid electronic devices relies in large part on the integration of (bio)organic materials and inorganic semiconductors through a stable interface that permits efficient electron transport and protects underlying substrates from oxidative degradation. Group IV semiconductors can be effectively protected with highly-ordered self-assembled monolayers (SAMs) composed of simple alkyl chains that act as impervious barriers to both organic and aqueous solutions. Simple alkyl SAMs, however, are inert and not amenable to traditional patterning techniques. The motivation for immobilizing organic molecular systems on semiconductors is to impart new functionality to the surface that can provide optical, electronic, and mechanical function, as well as chemical and biological activity. 
Microcontact printing (&mu;CP) is a soft-lithographic technique for patterning SAMs on myriad surfaces.1-9 Despite its simplicity and versatility, the approach has been largely limited to noble metal surfaces and has not been well developed for pattern transfer to technologically important substrates such as oxide-free silicon and germanium. Furthermore, because this technique relies on the ink diffusion to transfer pattern from the elastomer to substrate, the resolution of such traditional printing is essentially limited to near 1 &mu;m.10-16
In contrast to traditional printing, inkless &mu;CP patterning relies on a specific reaction between a surface-immobilized substrate and a stamp-bound catalyst. Because the technique does not rely on diffusive SAM formation, it significantly expands the diversity of patternable surfaces. In addition, the inkless technique obviates the feature size limitations imposed by molecular diffusion, facilitating replication of very small (&lt;200 nm) features.17-23 However, up till now, inkless &mu;CP has been mainly used for patterning relatively disordered molecular systems, which do not protect underlying surfaces from degradation.
Here, we report a simple, reliable high-throughput method for patterning passivated silicon and germanium with reactive organic monolayers and demonstrate selective functionalization of the patterned substrates with both small molecules and proteins. The technique utilizes a preformed NHS-reactive bilayered system on oxide-free silicon and germanium. The NHS moiety is hydrolyzed in a pattern-specific manner with a sulfonic acid-modified acrylate stamp to produce chemically distinct patterns of NHS-activated and free carboxylic acids. A significant limitation to the resolution of many &mu;CP techniques is the use of PDMS material which lacks the mechanical rigidity necessary for high fidelity transfer. To alleviate this limitation we utilized a polyurethane acrylate polymer, a relatively rigid material that can be easily functionalized with different organic moieties. Our patterning approach completely protects both silicon and germanium from chemical oxidation, provides precise control over the shape and size of the patterned features, and gives ready access to chemically discriminated patterns that can be further functionalized with both organic and biological molecules. The approach is general and applicable to other technologically-relevant surfaces.

Watch this Scientific Journal Video about Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium at JoVE.com

Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium

Здесь мы опишем простой способ структурирования свободного оксида кремния и германия с реактивными органического монослоя и продемонстрировать функционализации узорной подложках с малых молекул и белков. Подход полностью защищает поверхности от химического окисления, обеспечивает точный контроль над особенность морфологии, а также предоставляет доступ к химическому дискриминации моделей.

Мягкие Литографские Функционализация и структурирование оксида свободного кремния и германия

The development of hybrid electronic devices relies in large part on the integration of (bio)organic materials and inorganic semiconductors through a ...

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