Name: micropunching lithography for generating micro- and submicron-patterns on polymer substrates
Uploaded: 2012-07-02T08:00:00
Description: Watch this Scientific Journal Video about Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates at JoVE.com

इस काम में भाग NSF के NSFDMI - 0508454 / LEQSF (2006) Pfund-53-NSF CMMI 0,811,888 और 0,900,595 अनुदान-NSF CMMI के माध्यम से समर्थित किया गया था.

MPL की ए Schematics macropunching विधि &quot;काटने&quot; और &quot;ड्राइंग&quot; आपरेशन भी शामिल है. &quot;काटने&quot; आपरेशन तेज धार उत्तल संरचनाओं के molds को गोद ले और तीन बुनियादी कदम (1 छवि (A1-A3)) शामिल हैं. सबसे पहले, एक कठोर सब्सट?...

<ol>
	<li>Menon, R. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Conducting+polymers:+Nobel+Prize+in+Chemistry,+2000.">Conducting polymers: Nobel Prize in Chemistry, 2000.</a> Current Science. 79, 1632 (2000).</li><li>Inzelt, G., Pineri, M., Schultze, J. W., Vorotyntsev, M. A. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Electron+and+proton+conducting+polymers:+recent+developments+and+prospects.">Electron and proton conducting polymers: recent developments and prospects.</a> Electrochimica Acta. 45, 2403 (2000).</li><li>Adhikari, B., Majumdar, S. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Polymers+in+sensor+applications.">Polymers in sensor applications.</a> Progress in Polymer Science. 29, 699 (2004).</li><li>Chakraborty, A., Liu, X., Parthasarathi, G., Luo, C. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=An+intermediate-layer+lithography+method+for+generating+multiple+microstructures+made+of+different+conducting+polymers.">An intermediate-layer lithography method for generating multiple microstructures made of different conducting polymers.</a> Microsystem Technologies. 13 (8), 1175 (2007).</li><li>Madou, M. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=.">.</a> Fundamentals of Microfabrication. , (1995).</li><li>Bustillo, J. M., Howe, R. T., Muller, R. S. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Surface+micromachining+for+microelectromechanical+systems.">Surface micromachining for microelectromechanical systems.</a> Proceedings of the IEEE. 86, 1552 (1998).</li><li>Liu, X., Luo, C. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Intermediate-layer+lithography+for+producing+metal+micropatterns.">Intermediate-layer lithography for producing metal micropatterns.</a> Journal of Vacuum Science and Technology B. 25, 677 (2007).</li><li>Chakraborty, A., Luo, C. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Multiple+conducting+polymer+microwire+sensors.">Multiple conducting polymer microwire sensors.</a> Microsystem Technologies. 15, 1737 (2009).</li><li>Chakraborty, A., Liu, X., Luo, C., Mason, E. C., Weber, A. P. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=.">.</a> Polypyrrole: A new patterning approach and applications. Polypyrrole: Properties, Performance and Applications. , (2011).</li><li>Poddar, R., Luo, C. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=A+novel+approach+to+fabricate+a+PPy/p-type+Si+heterojunction.">A novel approach to fabricate a PPy/p-type Si heterojunction.</a> Solid-State Electronics. 50, 1687 (2006).</li><li>Liu, X., Chakraborty, A., Luo, C., Martingale, J. P. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=.">.</a> Generation of all-polymeric diodes and capacitors using an innovative intermediate-layer lithography. Progress in Solid State Electronics Research. , 127-139 (2008).</li><li>Liu, X., Luo, C. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Fabrication+of+Au+sidewall+micropatterns+using+a+Si-reinforced+PDMS+mold.">Fabrication of Au sidewall micropatterns using a Si-reinforced PDMS mold.</a> Sensors and Actuators A. 152, 96 (2009).</li><li>Liu, X., Chakraborty, A., Luo, C. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Fabrication+of+micropatterns+on+the+sidewalls+of+a+thermal+shape+memory+polystyreme+block.">Fabrication of micropatterns on the sidewalls of a thermal shape memory polystyreme block.</a> Journal of Micromechanics and Microengineering. 20, 095025 (2010).</li><li>Chakraborty, A., Liu, X., Luo, C. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Fabrication+of+micropatterns+on+channel+sidewalls+using+strain-recovery+property+of+a+shape-memory+polymer.">Fabrication of micropatterns on channel sidewalls using strain-recovery property of a shape-memory polymer.</a> Sensors and Actuators A. , (2011).</li><li>Liu, X., Luo, C. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Fabrication+of+supe-hydrophobic+channels.">Fabrication of supe-hydrophobic channels.</a> Journal of Micromechanics and Microengineering. 20, 25029 (2010).</li><li>Luo, C., Meng, F., Liu, X., Guo, Y. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Reinforcement+of+PDMS+master+using+an+oxide-coated+silicon+plate.">Reinforcement of PDMS master using an oxide-coated silicon plate.</a> Microelectronics Journal. 37, 5 (2006).</li><li>Luo, C., Garra, J., Schneider, T., White, R., Currie, J., Paranjape, M. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Thermal+ablation+of+PMMA+for+water+release+using+a+microheater.">Thermal ablation of PMMA for water release using a microheater.</a> Sensors and Actuators A. 114, 123 (2004).</li></ol>

समस्या निवारण जानकारी: पॉलिमर और धातु &quot;काटने&quot; आपरेशन का उपयोग करने के लिए एकल और बहु - परत micropatterns की पीढ़ी के बारे में गंभीर अंक: (1) embossing के तापमान मध्यवर्ती PMMA परत जो इष्टतम परिणाम उत्पन्न की तरलता ?...

<table border="1"><tbody><tr><td> अभिकर्मक का नाम </td><td> कंपनी </td><td> सूचीपत्र संख्या </td><td> टिप्पणियाँ </td></tr><tr><td> PMMA </td><td> सिग्मा Aldrich कंपनी </td><td> 495C9 </td><td> विलायक cholorobenzene है. पर्याप्त वेंटीलेशन के साथ एक धूआं हुड के नीचे संभाल PMMA के समाधान. भाप साँस नहीं ले. सुरक्षित हैंडलिंग निर्देश के लिए MSDS का संदर्भ लें. </td></tr><tr><td> PPy </td><td> सिग्मा Aldrich कंपनी </td><td> - </td><td> पानी में वजन द्वारा 5%. खेतों में प्रयुक्त किए गए के रूप में प्राप्त है. </td></tr><tr><td> PEDOT - पी एस एस </td><td> कोर्ट Starck कंपनी </td><td> Baytron पी कोर्ट V4 </td><td> विलायक मालिकाना. खेतों में प्रयुक्त किए गए के रूप में प्राप्त है. </td></tr><tr><td> SPANI </td><td> सिग्मा Aldrich कंपनी </td><td> - </td><td> जल में घुलनशील रूप में. खेतों में प्रयुक्त किए गए के रूप में प्राप्त है. </td></tr><tr><td> गर्म embossing मशीन </td><td> JenoptikMikrotechnik कं </td><td> 0 हेक्स1/LT </td><td></td></tr><tr><td> मशीन धूम </td><td> Cressington कं </td><td> 208HR </td><td></td></tr><tr><td> FIB मशीन </td><td> Zeiss कं </td><td> FIB क्रॉसबीम 1540 XB </td><td></td></tr><tr><td> स्पिन coater </td><td> प्रगति reseach कं </td><td> PWM32-PS-R790 स्पिनर प्रणाली </td><td></td></tr><tr><td> आर.आई.ई. मशीन </td><td> टेकनीक MicroRIE कं </td><td> - </td><td></td></tr><tr><td> Photoresist </td><td> Shipley कं </td><td> S1813 </td><td></td></tr><tr><td> PDMS </td><td> डॉव Corning </td><td> Sylgard 184 सिलिकॉन इलास्टोमेर किट </td><td></td></tr><tr><td> एचडीपीई चादर </td><td> अमेरिकी प्लास्टिक शामिल </td><td> - </td><td></td></tr><tr><td> PMMA शीट </td><td> Cyro कं </td><td> - </td><td></td></tr><tr><td> डबल पक्षीय adhesivई टेप </td><td> स्कॉच कं </td><td> - </td><td></td></tr><tr><td> एक तरफा टेप </td><td> Delphon कं </td><td> 1310 # Ultratape </td><td></td></tr><tr><td> ग्लास micropipettes </td><td> FHC कं </td><td> 30-30-1 </td><td></td></tr><tr><td> क्लिप </td><td> कार्यालय डिपो कं </td><td> कुत्त क्लिप </td><td></td></tr><tr><td> Humidifier </td><td> विक्स कंपनी </td><td> फिल्टर मुक्त humidifier </td><td></td></tr></tbody></table>

micropunching lithography for generating micro- and submicron-patterns on polymer substrates

Conducting polymers have attracted great attention since the discovery of high conductivity in doped polyacetylene in 19771. They offer the advantages of low weight, easy tailoring of properties and a wide spectrum of applications2,3. Due to sensitivity of conducting polymers to environmental conditions (e.g., air, oxygen, moisture, high temperature and chemical solutions), lithographic techniques present significant technical challenges when working with these materials4. For example, current photolithographic methods, such as ultra-violet (UV), are unsuitable for patterning the conducting polymers due to the involvement of wet and/or dry etching processes in these methods. In addition, current micro/nanosystems mainly have a planar form5,6. One layer of structures is built on the top surfaces of another layer of fabricated features. Multiple layers of these structures are stacked together to form numerous devices on a common substrate. The sidewall surfaces of the microstructures have not been used in constructing devices. On the other hand, sidewall patterns could be used, for example, to build 3-D circuits, modify fluidic channels and direct horizontal growth of nanowires and nanotubes.
A macropunching method has been applied in the manufacturing industry to create macropatterns in a sheet metal for over a hundred years. Motivated by this approach, we have developed a micropunching lithography method (MPL) to overcome the obstacles of patterning conducting polymers and generating sidewall patterns. Like the macropunching method, the MPL also includes two operations (Fig. 1): (i) cutting; and (ii) drawing. The "cutting" operation was applied to pattern three conducting polymers4, polypyrrole (PPy), Poly(3,4-ethylenedioxythiophen)-poly(4-styrenesulphonate) (PEDOT) and polyaniline (PANI). It was also employed to create Al microstructures7. The fabricated microstructures of conducting polymers have been used as humidity8, chemical8, and glucose sensors9. Combined microstructures of Al and conducting polymers have been employed to fabricate capacitors and various heterojunctions9,10,11. The "cutting" operation was also applied to generate submicron-patterns, such as 100- and 500-nm-wide PPy lines as well as 100-nm-wide Au wires. The "drawing" operation was employed for two applications: (i) produce Au sidewall patterns on high density polyethylene (HDPE) channels which could be used for building 3D microsystems12,13,14, and (ii) fabricate polydimethylsiloxane (PDMS) micropillars on HDPE substrates to increase the contact angle of the channel15.

Watch this Scientific Journal Video about Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates at JoVE.com

Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates

एक micropunching लिथोग्राफी दृष्टिकोण सूक्ष्म और शीर्ष, sidewall और बहुलक substrates के नीचे सतहों पर submicron पैटर्न उत्पन्न करने के लिए विकसित की है. यह patterning के पॉलिमर का आयोजन और sidewall के पैटर्न पैदा करने की बाधाओं पर काबू. यह विधि कई सुविधाओं का तेजी से निर्माण की अनुमति देता है और आक्रामक रसायन शास्त्र से मुक्त है.

बहुलक substrates पर माइक्रो और submicron पैटर्न उत्पन्न करने के लिए लिथोग्राफी Micropunching

Conducting polymers have attracted great attention since the discovery of high conductivity in doped polyacetylene in 19771. They offer the advantages of ...

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