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DOI :
10.3791/50603-v
•
12:20 min
October 5th, 2013
Chapters
0:05
Title
2:02
Substrate and Target Preparation
4:13
Epilayer Deposition
6:13
Post-growth Epilayer Characterization
9:46
Analysis of Iron Rhodium Epilayer
11:47
Conclusion
スパッタ法により規則合金のエピタキシャル層を調製する方法が記載されている。それは化学的順序および合金の正確な組成の程度に敏感に依存するメタ磁性転移を表示するようB2-順序付けFeRh化合物を、実施例として使用される。
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