Name: high-resolution thermal micro-imaging using europium chelate luminescent coatings
Uploaded: 2017-04-16T13:00:00
Description: Watch this Scientific Journal Video about High-resolution Thermal Micro-imaging Using Europium Chelate Luminescent Coatings at JoVE.com

Work at Argonne National Laboratory was funded by the Department of Energy, Office of Basic Energy Sciences, under Contract No. DE-AC02-06CH11357, which also funds Argonne's Center for Nanoscale Materials (CNM) where the patterning of the BSCCO mesa was performed. We thank R. Divan and L. Ocola for their help with sample fabrication.

1.样品用于涂料的制备注：如果可能，从样品的表面去除所有有机物污染以热成像。任何这样的污染可能与沉积的EuTFC膜反应并改变其发光响应，在所得到的热图像引起依赖于位置的伪像。这是与用Au的表面电极，其倾向于吸引从大气中有机污染物的样品特别重要的。除去同时坐在样品表面上的任何颗粒或灰尘，因为这些可能会导致伪像也。笔者建议采用以下步骤： <ol><li>使...

<ol>
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A. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Remote+thermal+imaging+with+0.7-&#181;m+spatial+resolution+using+temperature-dependent+fluorescent+thin+films.">Remote thermal imaging with 0.7-&#181;m spatial resolution using temperature-dependent fluorescent thin films.</a> Appl. Phys. Lett. 42, 117-119 (1983).</li><li>Hampel, G. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=High+power+failure+of+superconducting+microwave+filters:+Investigation+by+means+of+thermal+imaging.">High power failure of superconducting microwave filters: Investigation by means of thermal imaging.</a> Appl. Phys. Lett. 69, 571-573 (1996).</li><li>Hadjichristov, G. B., Stanimirov, S. S., Stefanov, I. L., Petkov, I. 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这表现在我们的研究结果，在本文中描述的技术产生的微器件的高分辨率热图像，具有良好的灵敏度，并且仅使用简单的光学显微镜设备。这相对于替代方法的技术（下面将要讨论的）的优点是最强的在大约250 K和下面，这意味着它的最重要的应用可用于研究，其被设计成在低温浴温度下操作的设备的自加热。这些包括超导电流磁带（其中骤冷成核是关键工程感兴趣的），用于光学检测窄带隙半?...

许多电子装置经历强烈的自我加热时电偏置到它们的正常操作条件。这通常是由于低导热性（例如，在半导体）和高功率消耗密度的组合。此外，在具有半导电状电阻器件（ 即具有∂ρ/∂Ť&lt;0）人们早已知道，存在局部的热失控的在一定的偏置条件1,2的可能性，其中，所述偏置电流流过不是均匀地通过该装置，而是在其与高度局部化的自加热有关，通常在微米的尺度窄的细丝。 了解这种自热物理学可能在某些情况下是必不可少的用于优化特定装置的设计，这意味着用于成像技术的温度上微米尺度是很有用。已经有最近的从技术发展的两个领域中这种技术的兴趣死灰复燃。其中第一项是用于在高温超导带成像淬火工艺，其中热显微成像允许淬火成核位点进行识别和研究3,4。所述第二应用程序是用于在叠层固有的约瑟夫逊结太赫兹光源，这是从的Bi 2的Sr 2 CaCu 2 O 8制成理解自加热。这些具有低的热导率和沿着电流流动的方向相关的半导体状的导电性（ 即，它们的晶体C轴）的组合，如上所述。它们不仅显示出实验复杂不均匀的自加热行为5，6，7，8 </sup&gt;，9，10，11就已经理论上预言，这可能是太赫兹功率发射12，13是有益的。 许多技术存在用于在微观长度尺度的样品的温度成像。最初采用这里所描述的热致技术用于半导体器件接近室温14，15，16但最近在低温浴温度下大于3，4，10，11中所述的超导条带和太赫兹源得到了应用。在CCD相机的分辨率和信号与噪声的性能提升已经使相当大的性能改进这一技术在过去的几十年。欧盟配位络合物铕thenoyltrifluoroacetonate（EuTFC）具有旋光发光是强烈依赖于温度的。在这个复杂的有机配体有效地吸收在宽带围绕345nm处的UV光。该能量通过分子内激发转移辐射较少的铕离子，其通过发光光子的在612纳米发射的复杂返回到其基态。强温度依赖性源于能量转移过程 17为使涂有该材料的物体的敏感的热探针。当涂层是激发近紫外源 - 诸如汞短弧灯 - 具有较低发光强度的区域对应于更高的局部温度。将得到的图像通过光学显微镜的分辨率和LUM的波长在空间分辨率限制inescence（在实践中，围绕1微米）。取决于所要求的信噪比，时间分辨率仅由照相机的快门速度由发光（不超过500微秒）15的衰减时间限制，并且更根本。这些特性使该技术器件温度的非常快的探测器，其产生直接的温度测量，使用相对简单和经济的设备。 这种技术被其它基团发表在过去的变化已采用小的浓度溶解在聚合物膜和旋涂到该样品表面3,4铕螯合物。这导致了涂层，该涂层是高度均匀的局部，但其具有在样品形貌的步骤显著厚度变化 - 如通常发生在微型 - 导致在发光响应WH强的空间变化ICH可以给图像伪影。我们在此描述的技术的变化采用热升华在真空中。这不仅避免了宏观膜厚度变化的问题，但每单位面积实现的更高浓度EuTFC提高显著的灵敏度并且降低了图像采集时间。一个相关技术采用SiC的涂层颗粒的表面，而不是EuTFC 7，8，9上。碳化硅提供温度灵敏度可比这里描述的EuTFC涂料，但该颗粒的尺寸限制了产生的图像的平滑度和分辨率。 几个其它技术存在，这提供的优点和缺点的不同组合。从样品的黑体辐射的直接红外成像是简单并具有几微米的空间分辨率，但是当样品是显著是唯一有效的LY高于室温。扫描探针显微镜热技术（例如扫描显微镜热电偶或开尔文探针显微镜）提供极好的灵敏度和空间分辨率，但是具有缓慢图像采集时间，必然由尖端的扫描速度，以及需要高度复杂的设备的限制。扫描激光或电子束扫描热显微镜措施时，一个调制光束跨过的电流偏置装置6，7，18的表面光栅化的电压扰动。这提供了优异的灵敏度，并且是比扫描探针技术稍快，但再次需要高度复杂的设备，并且还给出了样品的温度的间接，定性地图。

<table border="1" fo:keep-together.within-page="1" fo:keep-with-next.within-page="always">
	<tbody>
		<tr>
			<td>Europium thenoyltrifluoroacetonate powder</td>
			<td>Sigma-Aldrich</td>
			<td>176494-1G</td>
			<td>Also known as Europium tris[3-(trifluoromethylhydroxymethylene)-(+)-camphorate]</td>
		</tr>
		<tr>
			<td>Mercury short-arc lamp with flexible light guide</td>
			<td>Lumen Dynamics</td>
			<td>X-Cite Exacte</td>
			<td>Light source includes internal iris and photosensor for output intensity feedback.</td>
		</tr>
		<tr>
			<td>Peltier-cooled CCD camera</td>
			<td>Princeton Instruments</td>
			<td>PIXIS 1024</td>
			<td>1024 x 1024 pixels, 16-bit resolution</td>
		</tr>
		<tr>
			<td>610 nm band-pass filter</td>
			<td>Edmund Optics</td>
			<td>65-164</td>
			<td>Passband has CWL 610 nm, FWHM 10 nm</td>
		</tr>
		<tr>
			<td>500 nm short-pass filter</td>
			<td>Edmund Optics</td>
			<td>84-706</td>
			<td>OD4 in stopband</td>
		</tr>
		<tr>
			<td>Helium flow cryostat with optical window</td>
			<td>Oxford Instruments</td>
			<td>MicrostatHe2</td>
			<td></td>
		</tr>
		<tr>
			<td>high vacuum grease</td>
			<td>Dow Corning</td>
			<td></td>
			<td></td>
		</tr>
		<tr>
			<td>Digital Current source</td>
			<td>Keithley</td>
			<td>Model 2400</td>
			<td>Computer-controllable current &#38; voltage source</td>
		</tr>
		<tr>
			<td>Digital Voltmeter</td>
			<td>Hewlett-Packard&#160;</td>
			<td>Model 34420A</td>
			<td>Digital Nanovoltmeter now available as Agilent Model 34420A</td>
		</tr>
	</tbody>
</table>

high-resolution thermal micro-imaging using europium chelate luminescent coatings

当偏置到它们的典型的操作条件微型电子设备通常经历显著自加热。本文介绍了一种方便的光学显微成像技术，其可被用于映射和量化这种行为。铕thenoyltrifluoroacetonate（EuTFC）具有612纳米的发光线，其活化效率随着温度的升高强烈下降，由于T中的Eu 3+离子和有机螯合化合物之间依赖性相互作用。这种材料可以通过在真空中升华热可以容易地涂布到样品表面。当涂层被激发紫外线（337纳米）的纳米612发光响应的光学显微图像可直接被转换成地图上的样品表面温度。这种技术提供（约1微米）的仅由光学显微镜有限的空间分辨率和时间分辨率由所采用的照相机的速度的限制。它提供的只是额外的好处需要相对简单的和非专用设备，并给样品温度的定量探测器。

用于进行该实验在低温浴温度下典型的测量配置的示例被示出在图1a中 ，而612纳米的发光响应强度与温度的典型曲线图1b绘制。 图2示出了的Bi 2的Sr 2 CaCu 2 O 8的THz源，其由堆叠的“固有”约瑟夫逊结的“台面”的尺寸为300×60×0.83微米的自加热的典型的热图...

Watch this Scientific Journal Video about High-resolution Thermal Micro-imaging Using Europium Chelate Luminescent Coatings at JoVE.com

High-resolution Thermal Micro-imaging Using Europium Chelate Luminescent Coatings

铕thenoyltrifluoroacetonate（EuTFC）具有在612纳米，其激活效率随温度强烈降低的光致发光线。如果涂有这种材料的薄膜的样品是微成像时，612纳米的发光响应强度可以被转换成样品表面温度的直接映射。

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