Name: radio frequency magnetron sputtering of gdba2cu3o7&#8722;&#948;/ la0.67sr0.33mno3 quasi-bilayer films on srtio3 (sto) single-crystal substrates
Uploaded: 2019-04-12T12:30:00
Description: Watch this Scientific Journal Video about Radio Frequency Magnetron Sputtering of GdBa2Cu3O7Ã¢Ë†'ÃŽÂ´/ La0.67Sr0.33MnO3 Quasi-bilayer Films on SrTiO3 STO Single-crystal Substrates at JoVE.com

这项工作得到了国家自然科学基金的支持 (51502168 号;No.1 1504227) 和上海市自然科学基金 (16zr1413600)。作者感谢上海交通大学仪器分析中心和马泰分析实验室提供的专业技术援助。

1. 基板和目标准备
注: 本节介绍溅射沉积室和单晶 SrTiO (sto)基板的制备。
<ol><li>在射频磁控溅射过程中使用 10 mm x 10 Mm stio 3 (sto) 单晶基板。</li>
	<li>在超声波浴中, 在室温下依次清洁异丙醇和去离子水中的基材10分钟。然后用氮气干燥基材, 这是为了均匀覆盖基板和良好的薄膜粘附。</li>
	<li>用银粉导电胶将 (001) STO 基板安装在基板支架上。将这些装入真空室?...

<ol>
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在这里, 我们已经证明了该方法可以用于制备 LSMO 铁磁纳米粒子的均匀分布在 SrTiO 3 ( sto) 单晶基板上。(Gd) BCO 薄膜也可以沉积在裸露和 LSMO 装饰的 STO 基板上。通过适当调整沉积参数, 如生长温度和靶基板距离, 这种方法应有助于沉积不同种类的磁性和非磁性颗粒或层, 例如 CeO 2、ysz((四氧化钛)24和 ito (氧化锡).
该协议的一个关键步骤是 ...

孔掺杂锰铁矿 La0.67s0.33 mno 3 (lsmo)具有独特的特性, 如宽带间隙、半金属铁磁性和纠缠电子状态, 为潜在的可能性提供了非凡的机会.自旋语音应用1,2,3,4。目前, 许多研究人员正在努力利用 lsmo 的独特特性, 居住在高温超导薄膜的涡旋运动中, 如 (re) ba2cu3o7薄膜 (rebco, re = 稀土元素)5,6,7, 8,9,10, 11,12。具有铁磁纳米粒子的基板表面的纳米装饰将为诱导预期密度为 13,14的磁固定中心提供明确的位置。然而, 在高纹理表面 (如单晶基板和高纹理金属基板上) 控制纳米粒子的密度和几何形状的能力非常困难。最常见的是, 纳米粒子是合成和涂层在表面上使用金属有机分解方法15和脉冲激光沉积方法16, 17.脉冲激光沉积方法虽然可以提供在各种基材上涂覆的纳米粒子, 但很难实现大面积均匀纳米粒子的沉积。对于金属有机分解方法, 它们适用于纳米粒子的大面积沉积。然而, 纳米颗粒往往是不均匀的, 很容易被小的物理应力损坏。
在这些技术中, rf-磁控溅射具有许多优点。飞溅具有沉积速率高、成本低、缺乏有毒气体排放等问题。另外, 它很容易扩展到大面积基板18,19。该方法提供了 La0.67sr0.67mno 3 (lsmo) 纳米粒子的单步形成, 纳米颗粒易于沉积在单晶基板上.射频磁控溅射可在不同的基材上均匀地产生大面积纳米粒子, 而不考虑表面纹理和表面粗糙度20。通过调整溅射时间可以实现颗粒控制。通过调整靶基板的距离, 可以实现均匀性。Rf-磁控溅射的缺点是其对某些氧化物21的生长速率较低。在这种方法中, 目标原子 (或分子) 被氩离子从目标中溅射出来, 然后纳米粒子在气相22沉积在基板上。纳米粒子的形成发生在基板上的一个步骤23。该方法理论上适用于任何材料, 包括超导薄膜、电阻膜、半导体薄膜、铁磁薄膜等。纳米粒子是非常稀缺的。
在这里, 我们演示了 gdba 2 cu 3o7在srtio3 (sto) 单晶基板上的沉积方法。在这一过程中使用了两种目标材料,gdba2cu 3o7 和 la0.67sr 0.67 mno3目标.Srtio 3 (sto) 单晶基板涂覆了 gdba 2 cu 3o7薄膜和 gdba2cu3o7 0.33MnO3准双层薄膜。
在该协议中, gdba2 cu3o 7la 0.67 s0.33 mno 3 准双层薄膜沉积在 sto (001) 基板上的射频磁控溅射.目标直径为60毫米, 目标与基板之间的距离约为10厘米。加热器是位于基板上方1厘米处的灯泡。该系统中的最高温度 850°C.该系统有5种不同的基板。射频磁控溅射 gdba2cu 3o7 la 0.67 s0.33 mno 3 准双层薄膜由两个步骤组成, 即制备基板和射频磁控管溅射过程。溅射系统的图片如图 s1所示。

<table>
	<tbody>
		<tr>
			<td>Sputter Deposition System</td>
			<td>Shenyang scientific instruments Limited by Share Ltd</td>
			<td>Bespoke</td>
			<td></td>
		</tr>
		<tr>
			<td>SrTiO3 Single Crystal Substrate</td>
			<td>Hefei Ke crystal material technology Co., Ltd</td>
			<td>Single-sided epi-polished</td>
			<td>(001) orientation</td>
		</tr>
		<tr>
			<td>La0.67Sr0.33MnO3 sputtering target</td>
			<td>Hefei Ke crystal material technology Co., Ltd</td>
			<td>Bespoke</td>
			<td>60 mm diameter</td>
		</tr>
		<tr>
			<td>GdBa2Cu3O7&#8722;&#948; sputtering target</td>
			<td>Hefei Ke crystal material technology Co., Ltd</td>
			<td>Bespoke</td>
			<td>60 mm diameter</td>
		</tr>
		<tr>
			<td>Atomic Force Microscope</td>
			<td>Br&#252;ker</td>
			<td>Dimension Icon</td>
			<td></td>
		</tr>
		<tr>
			<td>X-ray Diffractometer</td>
			<td>Br&#252;ker</td>
			<td>D8 Discover</td>
			<td></td>
		</tr>
		<tr>
			<td>Physical Property Measurement System</td>
			<td>Quantum Design</td>
			<td>PPMS 9</td>
			<td></td>
		</tr>
	</tbody>
</table>

radio frequency magnetron sputtering of gdba2cu3o7&#8722;&#948;/ la0.67sr0.33mno3 quasi-bilayer films on srtio3 (sto) single-crystal substrates

在这里, 我们展示了一种方法, 涂层铁磁 la0.67 s0.33 mno 3 (lsmo) 纳米粒子上 (001) srtio3 (sto) 单晶基板射频 (rf) 磁控溅射.LSMO 纳米颗粒沉积的直径在10至20纳米之间, 高度在20至50纳米之间。同时, 利用射频磁控溅射在未经修饰和 lsmo纳米颗粒修饰的 sto 基板上制备了 (gd) ba 2 cu 3o 7 (gd) 薄膜.本报告还描述了 gdba2cu 3 o7的性质. , 化学成分);还对磁化、磁迁移和超导传输特性进行了评价。

裸层和 LSMO 装饰的 STO 基板上的 (Gd) bco 薄膜厚度均为 500nm, 用表面轮廓仪进行了测量。薄膜厚度受溅射时间的控制。图 1a, b显示了 LSMO 纳米粒子 (溅射时间为 10秒) 在 1.0 cm x 1.0 cm 单晶 sto 基板上的 afm 图像, 证明了在 sto 基板上均匀生长的 LSMO 纳米粒子。用原子力显微镜 (AFM) 对薄膜的表面和测量粗糙度进行了表征。这些 LSMO 纳米粒子的直径...

Watch this Scientific Journal Video about Radio Frequency Magnetron Sputtering of GdBa2Cu3O7Ã¢Ë†'ÃŽÂ´/ La0.67Sr0.33MnO3 Quasi-bilayer Films on SrTiO3 STO Single-crystal Substrates at JoVE.com

Radio Frequency Magnetron Sputtering of GdBa2Cu3O7ÃƒÆ’Ã‚Â¢Ãƒâ€¹Ã¢â‚¬Â 'ÃƒÆ’Ã…Â½Ãƒâ€šÃ‚Â´/ La0.67Sr0.33MnO3 Quasi-bilayer Films on SrTiO3 STO Single-crystal Substrates

Gdba2cu 3 o7 的射频磁控管散射-/la0.67sr 0.67 mno 3 准双层薄膜上的 srtio 3 (sto) 单晶基板上

在这里, 我们提出了一个协议, 以增长 LSMO 纳米粒子和 (Gd) bco 薄膜上 (001) SrTiO3 (sto) 单晶基板的射频 (rf) 溅射。

Here, we demonstrate a method of coating ferromagnetic La0.67Sr0.33MnO3 (LSMO) nanoparticles on (001) SrTiO3 (STO) single-crystal substrates by radio ...

该方法可以在STO单晶基板上均匀地产生LSMO纳米粒子。此外，GBCO 薄膜可以通过同一真空室中的相同方法获得。该技术的主要优点是，具有均匀尺寸和高质量超导GBCO薄膜的LSMO纳米粒子可以沉积在同一真空室中。该方法可对薄膜沉积区、纳米粒子生长区等进行深入分析。还可用于金属膜沉积、金属纳米颗粒沉积等。这种方法将使研究人员熟悉真空设备，并更多地了解薄膜生长技术。首先，在超声波浴的室温下，按顺序清洁异丙醇和去离子水中的氧化钛单晶基底，每次清洁10分钟。然后，用氮气干燥基材。这促进基材的均匀覆盖和良好的薄膜粘附性。使用银粉导电胶将 001 面向 001 的 STO 基板安装在基板支架中。将支架装入真空室。将 LSMO 目标安装在磁控喷枪中，然后重新组装喷枪。使用欧姆表测试电阻，以避免磁控管和周围屏蔽之间出现短路。然后，关闭真空室，然后泵下。一旦真空低于10倍至负4帕斯卡，使用每分钟15摄氏度的加热速率将基板加热至850摄氏度。将目标基板距离设置为 8 厘米。接下来，将质量流量控制器设置为每分钟 10 个标准立方厘米的氧气和每分钟 5 个标准立方厘米的 argon 作为工作气体流量。在沉积之前，在 30 瓦下预先溅出 LSMO 目标 20 分钟。要获得25帕斯卡的腔室压力，请调整分子泵夹板阀。如果即时值大于 25 个 pascal，则逆时针旋转。如果它变得小于 25 帕斯卡，请顺时针旋转它。之后，检查基板温度是否保持 850 摄氏度且是否稳定。将磁控管的功率从 30 瓦增强至 80 瓦。稳定等离子体后，打开快门，将 LSMO 沉积在加热基板上。沉积完成后，关闭快门并关闭磁控管的电源。然后，关闭气体阀，并关闭加热器电源。将样品冷却至室温后，用干氮排出腔室。然后，打开腔室，取出样品。将铜氧目标安装在磁控喷枪中，然后重新组装喷枪。如先前所述，使用类似的条件，除溅射时间外，应为30分钟。接下来，将样品温度降至 500 摄氏度。然后，打开氧气气体阀，使腔室压力达到75，000帕斯卡，并在该温度下将样品保持一小时。将样品冷却至室温后，用干氮排出腔室。然后，打开腔室，取出样品。STO 基板上 LSMO 纳米粒子的 AFM 图像显示均匀增长。此处显示了在未装饰和 LSMO 纳米粒子装饰 STO 基材上制造的硅化铜氧薄膜的 XRD 图案。超导过渡温度接近90.5开尔文的金铜氧膜和90.3开尔文的LSMO薄膜，这表明纳米粒子不损害薄膜的超导特性。相比之下，磁化滞后循环区域要大得多，从零到六特斯拉，在 30、50 和 77 开尔文上，用于在 LSMO 装饰基板上制造的薄膜。沉积在 LSMO 装饰基板上的金子铜氧膜具有更高的临界电流密度，从 1.3 到 6 特斯拉在 30 开尔文和从零到六特斯拉在 77 开尔文。在 30 开尔文时，装饰样品具有高于 1.3 特斯拉的较大固定力密度。在 77 开尔文时，装饰样品的密度移动到更高的 H 值。LSMO 装饰薄膜的临界电流密度在 3 特斯拉和 77 开尔文的角依赖性显示沿 c 轴增加，表明它在与 c 轴方向平行的磁场方向上更有效。此方法涉及许多步骤和详细信息，因此可视化演示对于理解和掌握此方法至关重要。该方法开发后，可以沉积氧化膜和纳米颗粒，以及金属薄膜和纳米粒子。该方法开发后，可以沉积氧化膜和纳米颗粒，以及金属薄膜和纳米粒子。

Research

JoVE Journal

Engineering

Radio Frequency Magnetron Sputtering of GdBa2Cu3O7&#8722;&#948;/ La0.67Sr0.33MnO3 Quasi-bilayer Films on SrTiO3 (STO) Single-crystal Substrates

Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates

Micropunching为微型和亚微米模式聚合物基板上生成的光刻

Conducting polymers have attracted great attention since the discovery of high conductivity in doped polyacetylene in 19771. They offer the advantages of ...

科研

工程学

Characterization of Surface Modifications by White Light Interferometry: Applications in Ion Sputtering, Laser Ablation, and Tribology Experiments

白光干涉表面改性中的应用离子溅射，激光烧蚀，与摩擦学实验表征

In materials science and engineering it is often necessary to obtain quantitative measurements of surface topography with micrometer lateral resolution. ...

Ultrahigh Density Array of Vertically Aligned Small-molecular Organic Nanowires on Arbitrary Substrates

超高密度垂直对齐的任意基质的小分子有机纳米线阵列

In  recent years &pi;-conjugated  organic semiconductors have emerged as the active material in a number of  diverse applications including large-area, ...

Effect of Bending on the Electrical Characteristics of Flexible Organic Single Crystal-based Field-effect Transistors

弯曲对基于晶体的柔性有机单场效应晶体管的电气特性的影响

The charge transport in an organic semiconductor depends highly on the molecular packing in the crystal, which influences the electronic coupling ...

Growth and Electrostatic/chemical Properties of Metal/LaAlO3/SrTiO3 Heterostructures

Growth and Electrostatic/chemical Properties of Metal/LaAlO3/SrTiO3 Heterostructures

金属/LaAlO 的生长和静电/化学性质3/SrTiO3异

The quasi 2D electron system (q2DES) that forms at the interface between LaAlO3 (LAO) and SrTiO3 (STO) has attracted much attention from the oxide ...

Generation and Coherent Control of Pulsed Quantum Frequency Combs

脉冲量子频率梳的产生与相干控制

We present a method for the generation and coherent manipulation of pulsed quantum frequency combs. Until now, methods of preparing high-dimensional ...

Film Control to Study Contributions of Waves to Droplet Impact Dynamics on Thin Flowing Liquid Films

薄膜控制研究波浪对液滴冲击动力学的影响薄流动液体薄膜

Droplet impact is a very common phenomenon in nature and attracts attention due to its aesthetic fascination and wide-ranging applications. Previous ...

Plasma-Assisted Molecular Beam Epitaxy Growth of Mg3N2 and Zn3N2 Thin Films

Plasma-Assisted Molecular Beam Epitaxy Growth of Mg3N2 and Zn3N2 Thin Films

Mg3N2和 Zn3N2薄膜的等离子辅助分子束外延生长

This article describes a procedure for growing Mg3N2 and Zn3N2 films by plasma-assisted molecular beam epitaxy (MBE). The films are grown on 100 oriented ...

Procedure for the Transfer of Polymer Films Onto Porous Substrates with Minimized Defects

聚合物薄膜在多孔基板上的转移程序,具有最小化的缺陷

The fabrication of devices containing thin film composite membranes necessitates the transfer of these films onto the surfaces of arbitrary support ...

Calibration of Vector Network Analyzer for Measurements in Radio Frequency Propagation Channels

射频传播通道测量矢量网络分析仪的校准

In situ measurements of radio frequency (RF) spectrum activity provide insight into the physics of radio frequency wave propagation and validate existing ...