6.2K Views
•
09:33 min
•
June 7th, 2019
DOI :
June 7th, 2019
•Chapters in this video
0:04
Title
0:52
Deposition of Hydrogenated Amorphous Silicon (a-Si:H) on a Fused Silica Substrate by Plasma-enhanced Chemical Vapor Deposition (PECVD)
1:35
Formation of the Chromium Etching Mask
6:53
Etching Process of Hydrogenated Amorphous Silicon
7:41
Results: The Fabricated Metasurface and its Polarization-independent
8:31
Conclusion
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