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DOI :
10.3791/59066-v
June 7th, 2019
Chapters
0:04
Title
0:52
Deposition of Hydrogenated Amorphous Silicon (a-Si:H) on a Fused Silica Substrate by Plasma-enhanced Chemical Vapor Deposition (PECVD)
1:35
Formation of the Chromium Etching Mask
6:53
Etching Process of Hydrogenated Amorphous Silicon
7:41
Results: The Fabricated Metasurface and its Polarization-independent
8:31
Conclusion
유전체 메타표면의 제조 및 광학 특성화를 위한 프로토콜이 제시된다. 이 방법은 빔 스플리터뿐만 아니라 렌즈, 홀로그램 및 광학 망토와 같은 일반적인 유전체 메타 표면의 제작에도 적용 될 수 있습니다.
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