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DOI :
10.3791/59415-v
May 11th, 2019
Chapters
0:00
Title
0:57
MgO Substrate Preparation
1:50
Operation of VG V80 MBE
2:13
Substrate Loading
4:04
Metal Flux Measurements
5:59
Nitrogen Plasma
6:51
In-situ Laser Light Scattering
8:35
Growth Rate Determination
9:13
Results
10:46
Conclusion
本稿では、窒素源および光学成長モニタリングとしてN2ガスを用いる血漿支援分子ビームエピタキシーによるMgO基板上のMg3N2及びZn3N2のエピタキシャルフィルムの増殖について述べた。
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