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JoVE Journal

Bioengineering

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Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes

6.6K Views

13:49 min

January 19th, 2020

January 19th, 2020

6,590 Views

0:04

Title

0:51

Aligning the Focus Ion Beam (FIB) to the Silicon Probes

9:46

Writing an Automated Process for Etching

11:28

Results: FIB Etched Nano-architecture on the Surfaces of Intracortical Probes and Microelectrodes Affects Neuron Density and Electrophysiology

13:08

Conclusion

Transcript

The use of focused ion beam lithography, or FIB, allows researchers to improve the cell surface interaction by designing material surfaces that have increased biocompatibility and integration with the native tissue. With FIB, features can be etche

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We have shown that the etching of nano-architecture into intracortical microelectrode devices may reduce the inflammatory response and has the potential to improve electrophysiological recordings. The methods described herein outline an approach to etch nano-architectures into the surface of non-functional and functional single shank silicon intracortical microelectrodes.

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