JoVE Logo
Faculty Resource Center

Sign In

Fokusert ion Beam litografi å etse nano-arkitekturer i Microelectrodes

DOI :

10.3791/60004-v

January 19th, 2020

January 19th, 2020

6,517 Views

1Department of Electrical Engineering and Computer Science, University of Michigan, 2Veteran Affairs Ann Arbor Healthcare System, 3Department of Neurology, School of Medicine, University of Michigan, 4Department of Biomedical Engineering, University of Michigan, 5Michigan Center for Materials Characterization, University of Michigan, 6Carl Zeiss SMT, Inc.

Vi har vist at den etsing av nano-arkitektur i intracortical microelectrode enheter kan redusere inflammatorisk respons og har potensial til å forbedre elektrofysiologisk innspillinger. Metodene beskrevet her skissere en tilnærming til etch nano-arkitekturer inn i overflaten av ikke-funksjonell og funksjonell enkelt skaft silisium intracortical microelectrodes.

Tags

Bioteknologi

-- Views

Related Videos

JoVE Logo

Privacy

Terms of Use

Policies

Research

Education

ABOUT JoVE

Copyright © 2024 MyJoVE Corporation. All rights reserved