Atmospheric-Pressure Chemical Vapor Deposition (APCVD) Growth of Graphene on Nano-Patterned SapphireSubstrate (NPSS) and Nitrogen (N2)-Plasma Treatment
2:03
Metal-Organic Chemical Vapor Deposition (MOCVD) Growth of Aluminum Nitrogen (AlN) on Graphene-NPSS and of Aluminum-Gallium-Nitrogen (AlGaN) Multiple Quantum Wells (MQW)
3:08
AlGaN-Based Deep Ultraviolet Light-Emitting Diode (DUV-LED) Fabrication
6:02
Results: Representative AIN Characterization
6:32
Conclusion
Um protocolo para o crescimento assistido por grafeno de filmes de AlN de alta qualidade em substrato de safira nano-padronizado é apresentado.