1:34
Substrate Preparation
2:09
Amorphous Silicon (a-Si) Layer Plasma-Enhanced Chemical Vapor Deposition (PECVD) and Oxygen Plasma Treatment
2:49
DNA Origami Deposition
3:44
Silicon Dioxide (SiO2) Mask Growth
4:38
Reactive Ion Etching (RIE)
5:25
Physical Vapor Deposition (PVD)
6:35
Hydrofluoric Acid (HF) Liftoff
7:38
Results: Representative Bowtie DNA Origami Imaging and Functional Analyses