Name: fabrication of surface acoustic wave devices on lithium niobate
Uploaded: 2020-06-18T13:00:00
Description: Watch this Scientific Journal Video about Fabrication of Surface Acoustic Wave Devices on Lithium Niobate at JoVE.com

作者感谢加州大学和圣地亚哥分校的NANO3设施为支持这项工作提供资金和设施。这项工作部分在UCSD的圣地亚哥纳米技术基础设施（SDNI）进行，这是国家纳米技术协调基础设施的成员，由国家科学基金会（授予ECCS-1542148）支持。这里介绍的工作得到了W.M.Keck基金会的研究资助。作者还感谢海军研究办公室（通过格兰特12368098）对这项工作的支持。

1. 通过升降方法进行 SAW 设备制造
<ol><li>将4英寸（101.6毫米）LN晶圆浸入丙酮中，然后异丙醇（IPA），然后去离子水（DI水），在100类洁净室设施中进行晶圆溶剂清洗，每次在声波浴中5分钟。 拿起晶圆，用氮气（N2）气体流吹出表面干燥，从晶圆中取出剩余的DI水。 注意：在烟头中执行丙酮和 IPA 浸入式。避免吸入和皮肤接触 IPA。避免用丙酮接触皮肤和眼睛。不要吞咽。 注：不要让?...

<ol>
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由这两种方法制造的SAW器件能够在水面上产生有用的移动波，这些方法支持更复杂的过程来产生其他设计。由于沉积在上面的金属的质量载荷效应，谐振频率通常略低于设计值。然而，仍有一些要点值得讨论，以避免问题。
升空方法 光刻胶的选择很重要。有可能使用正光电阻进行制造，尽管如此，这将更加困难。由于未暴露的光刻剂溶解，基板上留下的部分?...

依靠众所周知的逆压电效应，原子偶极子产生与电场应用相对应的应变，压电晶体如锂牛锂锂锂（LN）、锂钛锂锂锂TaO3 3（LT），可用作机电传感器，用于微尺度应用1、2、3、4、5、6。2,3,4,5,61通过在 10 - 1000 MHz 下产生高达 1 nm 的位移， SAW 驱动的振动克服了传统超声的典型障碍：小加速度、长和大器件尺寸。操纵流体和悬浮粒子的研究最近加速，最近大量和可获取的评论77，8，9，10。8,9,10
制造SAW集成微流体器件需要制造压电基板上的电极（数字传感器（IDT）11，以产生11SAW。当连接到交流的电气输入时，梳形手指在基板上产生压缩和张力。SAW设备的制造已经出现在许多出版物中，无论是使用升降紫外线光刻与金属溅射或湿蚀刻工艺10。然而，缺乏制造这些设备的知识和技能是许多研究团体进入同流体学的主要障碍，即使在今天也是如此。对于升空技术12、13、14，在表面上创建具有反图案的牺牲层（光阻），当目标材料（金属）沉积在整个晶圆上时，它可以到达所需区域的基板，然后采用"升空"步骤去除剩余的光阻。12,13,14相比之下，在湿蚀刻工艺15、16、17、1816,17,18中，金属首先沉积在晶圆上，然后用直接图案在金属上产生光刻，以保护所需的区域免受金属蚀刻的"蚀刻"。15
在最常用的设计中，直 IDT、SAW 器件谐振频率的波长由手指对的周期性定义，其中手指宽度和手指之间的间距均为 <img align="center" alt="Equation" src="/files/ftp_upload/61013/61013eq2.jpg"> /419。为了平衡电流传输效率和基板的质量载荷效应，压电材料上沉积的金属厚度被优化为SAW波长20的1%左右。如果沉积的金属不足，可能导致手指过早衰竭。另一方面，由于质量加载效应，过厚的金属薄膜会导致 IDT 谐振频率降低，并可能从 IDT 产生无意的声学腔，从而隔离它们从周围基板产生的声波。因此，选择的光阻和紫外线照射参数在升空技术中有所不同，具体取决于 SAW 器件的不同设计，尤其是频率。在这里，我们详细介绍了在双面抛光 0.5 mm 厚的 128° Y 旋转切割 LN 晶圆上生产 100 MHz SAW 生成装置的升降过程，以及制造相同设计的 100 MHz 器件的湿蚀刻工艺。我们的方法提供微流体系统，能够调查各种物理问题和生物应用。

<table border="1" fo:keep-together.within-page="1" fo:keep-with-next.within-page="always">
	<tbody>
		<tr>
			<td>Absorber</td>
			<td>Dragon Skin, Smooth-On, Inc., Macungie, PA, USA</td>
			<td>Dragon Skin 10 MEDIUM</td>
			<td></td>
		</tr>
		<tr>
			<td>Amplifier</td>
			<td>Mini-Circuits, Brooklyn, NY, USA</td>
			<td>ZHL&#8211;1&#8211;2W&#8211;S+</td>
			<td></td>
		</tr>
		<tr>
			<td>Camera</td>
			<td>Nikon, Minato, Tokyo, Japan</td>
			<td>D5300</td>
			<td></td>
		</tr>
		<tr>
			<td>Chromium etchant</td>
			<td>Transene Company, INC, Danvers, MA, USA</td>
			<td>1020</td>
			<td></td>
		</tr>
		<tr>
			<td>Developer</td>
			<td>Futurrex, NJ, USA</td>
			<td>RD6</td>
			<td></td>
		</tr>
		<tr>
			<td>Developer</td>
			<td>EMD Performance Materials Corp., Philidaphia, PA, USA</td>
			<td>AZ300MIF</td>
			<td></td>
		</tr>
		<tr>
			<td>Dicing saw</td>
			<td>Disco, Tokyo, Japan</td>
			<td>Disco Automatic Dicing Saw 3220</td>
			<td></td>
		</tr>
		<tr>
			<td>Gold etchant</td>
			<td>Transene Company, INC, Danvers, MA, USA</td>
			<td>Type TFA</td>
			<td></td>
		</tr>
		<tr>
			<td>Hole driller</td>
			<td>Dremel, Mount Prospect, Illinois</td>
			<td>Model #4000</td>
			<td>4000 High Performance Variable Speed Rotary</td>
		</tr>
		<tr>
			<td>Inverted microscope</td>
			<td>Amscope, Irvine, CA, USA</td>
			<td>IN480TC-FL-MF603</td>
			<td></td>
		</tr>
		<tr>
			<td>Laser Doppler vibrometer (LDV)</td>
			<td>Polytec, Waldbronn, Germany</td>
			<td>UHF-120</td>
			<td>4&#8221; double-side polished 0.5 mm thick 128&#176;Y-rotated cut lithium niobate</td>
		</tr>
		<tr>
			<td>Lithium niobate substrate</td>
			<td>PMOptics, Burlington, MA, USA</td>
			<td>PWLN-431232</td>
			<td></td>
		</tr>
		<tr>
			<td>Mask aligner</td>
			<td>Heidelberg Instruments, Heidelberg, Germany</td>
			<td>MLA150</td>
			<td>Fabrication process is performed in it.</td>
		</tr>
		<tr>
			<td>Nano3 cleanroom facility</td>
			<td>UCSD, La Jolla, CA, USA</td>
			<td></td>
			<td></td>
		</tr>
		<tr>
			<td>Negative photoresist</td>
			<td>Futurrex, NJ, USA</td>
			<td>NR9-1500PY</td>
			<td></td>
		</tr>
		<tr>
			<td>Oscilloscope</td>
			<td>Keysight Technologies, Santa Rosa, CA, USA</td>
			<td>InfiniiVision 2000 X-Series</td>
			<td></td>
		</tr>
		<tr>
			<td>Positive photoresist</td>
			<td></td>
			<td>AZ1512</td>
			<td>Denton Discovery 18 Sputter System</td>
		</tr>
		<tr>
			<td>Signal generator</td>
			<td>NF Corporation, Yokohama, Japan</td>
			<td>WF1967 multifunction generator</td>
			<td>Wafer Dipper 4&#34;</td>
		</tr>
		<tr>
			<td>Sputter deposition</td>
			<td>Denton Vacuum, NJ, USA</td>
			<td>Denton 18</td>
			<td></td>
		</tr>
		<tr>
			<td>Teflon wafer dipper</td>
			<td>ShapeMaster, Ogden, IL, USA</td>
			<td>SM4WD1</td>
			<td></td>
		</tr>
	</tbody>
</table>

fabrication of surface acoustic wave devices on lithium niobate

通过小规模的声学驱动操作流体和颗粒有助于芯片实验室应用的快速增长。兆赫阶表面声波（SAW）器件在其表面产生巨大的加速度，高达108 m/s2，进而导致许多观测到的观测效果来定义同源学：声流和声辐射力。这些效应已用于微尺度的粒子、细胞和流体处理，甚至在纳米尺度上也是如此。在本文中，我们明确演示了硅线锂氮化装置的两种主要制造方法：逐步描述升空和湿蚀技术的细节。详细显示了沉积在基板上的电极模式的代表性结果以及表面生成的SAW性能。还介绍了制造技巧和故障排除。此程序为未来微流体应用的高频 SAW 器件制造和集成提供了实用协议。

要测量的 IDT 设计为在 100 MHz 时具有谐振频率，因为手指宽度和它们之间的间距为 10 μm，产生 40 μm 的波长。图 1显示了使用此方法制造的 SAW 设备和 IDT。
使用与 IDT 谐振频率匹配的振荡电信号，可以在整个压电材料表面生成 SAW。LDV 通过表面的多普勒效应测量振动，并通过信号处理，可以使用该软件获取和显示振幅、速度、加速度和相位等信息。我们演示了频率?...

Watch this Scientific Journal Video about Fabrication of Surface Acoustic Wave Devices on Lithium Niobate at JoVE.com

Fabrication of Surface Acoustic Wave Devices on Lithium Niobate

在压电基板上生产数字电极传感器（镍氢锂）时，介绍了两种制造技术，即升降和湿蚀刻，这种传感器广泛用于产生表面声波，现在在微到纳米级流体中具有广泛的效用。作为生产的电极被显示，以有效地诱导兆赫顺序雷利表面声波。

锂氮化锂表面声波设备的制造

Manipulation of fluids and particles by acoustic actuation at small scale is aiding the rapid growth of lab-on-a-chip applications. Megahertz-order ...

我们的协议展示了在压电基材上制造典型表面声波器件的细节，对于寻求进入这一新兴领域的人尤其有价值。在清洁过程中，使任何碎屑远离表面至关重要。要预先分解晶圆，请将晶圆放在100摄氏度的加热板上3分钟。然后将晶圆移动到铝箔。将晶圆放在旋转涂布器上。使用滴管，将负光光处理片放在覆盖约 75% 晶圆表面面积的晶圆上。要产生约 1.3 微米的光光处理层厚度，请以 5 秒的加速速度在转速为 3，000 rpm/秒的自旋涂装机：500 rpm 上执行以下程序，然后执行 3，500 rpm 的加速度，加速 3，000 rpm/秒。"将晶圆放在100摄氏度的加热板上，将其烘烤。将加热板温度升高至 150 摄氏度，并保持该温度一分钟。然后将晶圆从热板中移出，让晶圆在空气中冷却至室温。请勿在 150 摄氏度下将晶圆直接放在加热板上。加热后让水在空气中冷却。要使光抗剂暴露在紫外能量下，请将晶圆转移到掩码对齐器上。将面罩对齐器设置为在 375 纳米下提供光，使光处理仪暴露在每平方厘米 400 毫焦耳的能量剂量下。要烘烤晶圆，请将晶圆放在100摄氏度的加热板上。三分钟后，将晶圆转移到铝箔上，冷却至室温。将晶圆放入装满纯 RD6 开发人员的烧杯中。让晶圆浸入 15 秒钟，同时轻轻摇动烧杯。从开发者那里取出晶圆，并将其浸入去化水中一分钟。然后在去化水流下冲洗晶圆。最后，使用干氮流从晶圆中去除剩余的水。在100摄氏度下再次烘烤水。三分钟后，将晶圆转移到铝箔上，冷却至室温。将晶圆放入溅射沉积系统中，将晶室排入负6毫托雷的5倍至10毫tor的压力。接下来，在2.5毫托雷方向流动。然后溅出具有200瓦功率的铬，用于五纳米的粘附层。为了形成导电电极，将铝沉积在400纳米和300瓦的功率水平。将晶圆转移到烧杯中，将其浸入丙酮中。以中等强度对烧杯进行声波化五分钟。用去压水冲洗晶圆，然后用氮液干燥晶圆。将晶圆在 100 摄氏度的加热板上放置三分钟。然后将其转移到一块铝箔上，等待其冷却到室温。将晶圆放入溅射沉积系统中，将晶室排入负6毫托雷的5倍至10毫tor的压力。在2.5毫托雷时流气，然后用200瓦的功率溅出铬，用于5纳米的粘附层。接下来，在功率水平为 300 瓦时溅出 400 纳米的金子，形成导电电极。将晶圆放在旋转涂布器上。使用滴管将正光光处理物沉积到晶圆表面面积约 75% 的晶圆上。要产生约 1.2 微米的光处理层厚度，请以 3，000 rpm/秒的加速速度在旋转涂布器：500 rpm 上执行以下程序，持续 10 秒，然后是 4，000 rpm，加速度为 3，000 rpm/秒。时间为 30 秒。然后在100摄氏度的加热板上放置晶圆。一分钟后，将晶圆转移到铝箔上，冷却至室温。将晶圆转移到掩码对齐器。将面罩对齐器设置为在 375 纳米下提供光，使光处理仪暴露在每平方厘米 150 毫焦耳的能量剂量下。将晶圆放入装满纯 AZ300MIF 的烧杯中。将晶圆留在烧杯中 300 秒，轻轻摇动烧杯。从开发者那里取出晶圆，并将其浸入水中一分钟。然后在去化流下冲洗晶圆。最后，使用干氮流从晶圆中去除剩余的水。接下来，将晶圆浸入金蚀中90秒，轻轻摇动烧杯。在去压水流下冲洗晶圆后，使用干氮流从晶圆中去除剩余的去化水。除了丙酮、光光剂和开发剂之外，最危险的试剂是需要更高保护的金属动作，如氯丁橡胶手套和围裙。最后，将晶圆浸入铬等中20秒，轻轻摇动烧杯。在去压水流下冲洗晶圆。再次，使用干氮流去除剩余的水。IT 是使用所述方法制造的。手指和手指本身之间的间距都是10微米的宽度，导致波长为40微米。将正弦信号应用于 IDT，并采用激光多普勒振动计测量产生的表面声波的振幅和频率。共振频率为96.5844兆赫，略低于100兆赫的设计频率。基板表面的振动图显示了从 IT 传播的表面声波。根据最大振幅与最小振幅之间的比值，常波比计算为2.06。演示了 SAW 装置激活的塞西液滴运动。0.2微升的水滴被移在离 IDT 约一毫米远的锂硝酸锂上。当锯传播并遇到液滴时，它会在雷利角度泄漏到液体中。喷射角度确认是否存在表面声波。这些技术可用于制造兆赫或表面声波设备。如果需要更高的频率声波执行器，需要调整该过程。该协议提供了两种可靠的方法，用于制备用于微到纳米级荧光研究的高频表面声波器件。

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Unit 1

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SCIENTISTS IN ACTION

Fabrication, Operation and Flow Visualization in Surface-acoustic-wave-driven Acoustic-counterflow Microfluidics

制造，操作和表面声波驱动声逆流微流体流动可视化

Surface acoustic waves (SAWs) can be used to drive liquids in portable microfluidic chips via the acoustic counterflow phenomenon. In this video we ...

科研

工程学

Fabrication of Gate-tunable Graphene Devices for Scanning Tunneling Microscopy Studies with Coulomb Impurities

对于扫描隧道显微学与库仑杂质制造门可调谐石墨烯器件

Owing to its relativistic low-energy charge carriers, the interaction between graphene and various impurities leads to a wealth of new physics and degrees ...

Fabrication and Operation of Acoustofluidic Devices Supporting Bulk Acoustic Standing Waves for Sheathless Focusing of Particles

制造和Acoustofluidic设备的运营支撑体声波驻波的聚焦鞘颗粒

Acoustophoresis refers to the displacement of suspended objects in response to directional forces from sound energy. Given that the suspended objects must ...

Fabrication of Fully Solution Processed Inorganic Nanocrystal Photovoltaic Devices

全面解决方案处理的无机纳米晶体光伏器件的制造

We demonstrate a method for the preparation of fully solution processed inorganic solar cells from a spin and spray coating deposition of nanocrystal ...

Solvent Bonding for Fabrication of PMMA and COP Microfluidic Devices

溶剂粘接的PMMA的制备和COP微流体装置

Thermoplastic microfluidic devices offer many advantages over those made from silicone elastomers, but bonding procedures must be developed for each ...

Experimental Implementation of a New Composite Fabrication Method: Exposing Bare Fibers on the Composite Surface by the Soft Layer Method

一种新的复合制备方法的实验实现: 用软层法对复合材料表面裸露纤维进行曝光

The bipolar plate is a key component in proton exchange membrane fuel cells (PEMFCs) and vanadium redox flow batteries (VRFBs). It is a multi-functional ...

Focused Ion Beam Fabrication of LiPON-based Solid-state Lithium-ion Nanobatteries for In Situ Testing

Focused Ion Beam Fabrication of LiPON-based Solid-state Lithium-ion Nanobatteries for In Situ Testing

基于 LiPON 的固态锂离子 Nanobatteries 的聚焦离子束制备方法在原位测试中的研究

Solid-state electrolytes are a promising replacement for current organic liquid electrolytes, enabling higher energy densities and improved safety of ...

Flow-assisted Dielectrophoresis: A Low Cost Method for the Fabrication of High Performance Solution-processable Nanowire Devices

流动辅助介: 一种低成本的制备高性能溶液可纳米线器件的方法

Flow-assisted dielectrophoresis (DEP) is an efficient self-assembly method for the controllable and reproducible positioning, alignment, and selection of ...

Atmospheric Pressure Fabrication of Large-Sized Single-Layer Rectangular SnSe Flakes

大型单层矩形 SnSe 片的常压制备

Tin selenide (SnSe) belongs to the family of layered metal chalcogenide materials with a buckled structure like phosphorene, and has shown potential for ...

Fabrication of Flexible Image Sensor Based on Lateral NIPIN Phototransistors

基于侧向 NIPIN Phototransistors 的柔性图像传感器的研制

Flexible photodetectors have been intensely studied for the use of curved image sensors, which are a crucial component in bio-inspired imaging systems, ...