The University of Wisconsin-Madison
2 ARTICLES PUBLISHED IN JoVE
Engineering
Patterning via Optical Saturable Transitions - Fabrication and Characterization
Precious Cantu 1, Trisha L. Andrew 2, Rajesh Menon 1
1Department of Electrical and Computer Engineering, The University of Utah, 2Department of Chemistry, The University of Wisconsin-Madison
We report that the diffraction limit of conventional optical lithography can be overcome by exploiting the transitions of organic photochromic derivatives induced by their photoisomerization at low light intensities.1-3 This paper outlines our fabrication technique and two locking mechanisms, namely: dissolution of one photoisomer and electrochemical oxidation.
Chemistry
Reactive Vapor Deposition of Conjugated Polymer Films on Arbitrary Substrates
Nongyi Cheng 1,2, Trisha L. Andrew 2,3
1Department of Chemistry, University of Wisconsin-Madison, 2Department of Chemistry, University of Massachusetts Amherst, 3Department of Polymer Science and Engineering, University of Massachusetts Amherst
This paper presents a protocol for reactive vapor deposition of poly(3,4-ethylenedioxythiophene), poly(3,4-propylenedioxythiophene), and poly(thieno[3,2-b]thiophene) films on glass slides and rough substrates, such as textiles and paper.
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