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The University of Wisconsin-Madison

2 ARTICLES PUBLISHED IN JoVE

Engineering

Patterning via Optical Saturable Transitions - Fabrication and Characterization

Precious Cantu¹, Trisha L. Andrew², Rajesh Menon¹

¹Department of Electrical and Computer Engineering, The University of Utah, ²Department of Chemistry, The University of Wisconsin-Madison

We report that the diffraction limit of conventional optical lithography can be overcome by exploiting the transitions of organic photochromic derivatives induced by their photoisomerization at low light intensities.^1-3 This paper outlines our fabrication technique and two locking mechanisms, namely: dissolution of one photoisomer and electrochemical oxidation.

Chemistry

Reactive Vapor Deposition of Conjugated Polymer Films on Arbitrary Substrates

Nongyi Cheng^1,2, Trisha L. Andrew^2,3

¹Department of Chemistry, University of Wisconsin-Madison, ²Department of Chemistry, University of Massachusetts Amherst, ³Department of Polymer Science and Engineering, University of Massachusetts Amherst

This paper presents a protocol for reactive vapor deposition of poly(3,4-ethylenedioxythiophene), poly(3,4-propylenedioxythiophene), and poly(thieno[3,2-b]thiophene) films on glass slides and rough substrates, such as textiles and paper.