This work performed under the auspices of the U.S. Department of Energy by Lawrence Livermore National Laboratory under Contract DE-AC52-07NA27344 within the LDRD program.

1.准备抛光和研磨液的首先准备收敛抛光系统（特别是称为C onvergent， 我 nitial表面独立，S英格尔迭代，R ogue无颗粒抛光或CISR（发音为&#39;剪刀&#39;））7,17通过安装垫和隔，调节垫，稀释＆化学稳定浆料，并结合过滤系统内的浆液。 <ol><li>在CISR抛光，坚持聚氨酯垫到花岗岩一圈基地。一个边缘的第一附着垫和在方向施加压力朝向相对边缘，以尽量减少空气间隙。修剪悬垂垫，然后使用剃刀刀片和滚筒刺穿并在必要时除去气泡。 </li><li>第一次使用时，每100〜h时抛光，金刚石条件使用CMP金刚石修整垫R（直径50mm; 0.6磅施加的压力; 5分钟停留在为25mm的间距增量每个径向圈位置;旋转一圈25转）用流动的去离子水。 </li><li>用流动的去离子水，抛光迭代之间，从垫采用原位超声波清洗机（圈旋转5转〜2分钟停留在每个径向位置）清除残留的泥浆，玻璃制品。 </li><li>上的形状独特的隔膜的重量，附着双面泡棉胶带，然后将隔膜材料（ 例如 ，预先切割的玻璃或其它非穿着材料）。修剪任何悬垂泡沫带相匹配的隔膜材料和重量的形状。注意隔膜设计（包括形状和重量）改变为不同尺寸的工件和研具7,17的。 </li><li>制备抛光浆料以波美4浓度（具体地按体积混合〜1份氧化铈抛光浆料和〜9份去离子（DI）水的11部总cket）。检查波美用波美浮动。加〜5毫升KOH（10μM）的pH调节至9.5，并添加〜专有表面19120毫升（1体积％）。调整pH和波美抛光的每24个小时。 </li><li>用准备好的泥浆进入​​过滤系统安装水桶。然后安装所需的CMP颗粒物过滤器进入过滤系统。让过滤系统内的淤浆再循环数小时。 </li><li>浆料的测量的粒度分布（ 例如 ，使用单粒子光学传感技术），以确保尾端分布是充分流氓无颗粒9,20。 </li></ol> 2.准备工件（蚀刻和方块） 前抛光，化学蚀刻作为接收的细地工件，以减少所需的除去亚表面研磨损伤21的材料去除量。然后，方框工件（如果纵横比（ 即长度/厚度）为&gt; 10）使用一种新的音调按钮阻塞（PBB）技术，以防止工件从阻断和抛光22中弯曲。 <ol><li>蚀刻精细地工件（具体为265 X 265×8 mm 3的熔凝石英玻璃平板）的一个填充有高频罐：NH 4 F（6：1的缓冲氧化物蚀刻（BOE）3倍稀释用DI水）6小时除去10玻璃从工件表面微米。注意！京东方是非常危险的;穿戴适当的个人防护装备（PPE）。从蚀刻罐中取出工件，积极冲洗工件与去离子水，并允许工件风干垂直。 </li><li>在使用明亮的光检查在黑暗的房间磨削过程中检查工件深的伤害。如果没有发现深的伤害，继续下一步，否则工件发回重磨。 </li><li>升温阻挡间距在胶枪〜95ºC和地点沥青水滴（也称为按钮）（〜0.06克）上的脸堵板9×9阵列（81按键与26毫米间距）。对于不同尺寸的工件，请参考设计的理想数量，大小规则，和音调按钮22的间隔。放置阻挡板与所施加的按钮正视在预热烘箱中在70 ºC。 </li><li>适用胶带到未待抛光工件的表面上。避免产生气泡或过度伸展的胶带。 </li><li>放置工件用胶带面朝下到上的遮挡板在烤箱的按钮。覆盖工件键块，以尽量减少对流。 1.5小时后，将炉冷却至10℃/小时至室温。冷却后，就被阻止的工件的节距厚度应为〜1毫米。 </li></ol> 3.收敛抛光<ol><li>打开湿度系统在CISR抛光机的环境室中，以防止在抛光期间由干燥浆料，并尽量减少流氓颗粒划伤工件。 </li><li>插件身高和挂载专门设计并准备入隔抛光。安装PBB工件放入CISR抛光和下部支臂保持工件。 </li><li>在CISR波兰工件4小时以25转75毫米〜径向行程，并与从1加仑/分钟过滤系统泥浆流匹配一圈工件旋转速度。 注：阻挡板兼作工件上的负荷重量相应于0.6 psi的施加压力。 </li><li>关闭一圈工件旋转和泥浆流。从CISR抛光去除PBB工件和沉没入DI装满水的浴缸。擦拭工件表面无尘布，而淹没。从浴中取出PBB工件和喷淋漂洗用去离子水。 </li><li>分块工件通过插入垫片在工件块接口。从工件表面去除胶带。积极冲洗工件与DI水和空气干燥。 </li><li> PBB工件如第2部分所述，然后重复宝面对反对如在第3节中描述利升过程。 </li></ol> 4.计量检验<ol><li>使用干涉测量工件反射的两侧的波前（ 即 ，表面图）以及发送波阵面。 </li><li>明亮的光线检测站山工件测量使用光学加工标准方法的刮伤/坑性质。工件的简短BOE蚀刻，如在步骤2.1中所述，可以使用以暴露隐划痕用于高通量的激光应用中使用的工件。用于在工件上细的划痕或粗糙度的测定中，标准光学显微镜或白光干涉可被使用。 </li><li>商店中使用的脸的工件的容器最小化的接触完成的工件。 </li></ol>

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The authors have nothing to disclose.

正如引言中讨论，成功实现收敛相对于抛光表面图涉及消除或减少所有影响空间的材料的非均匀性，除了对工件 - 研具失配，由于工件形状的现象。如果这些现象的任何一个没有适当地减轻，无论是通过过程控制或通过抛光，然后将所需的会聚点不能达到或维持适当的工程;因此，每一个基本的缓解变得至关重要。为了说明这一点， 图6示出在工件上的收敛点的表面的图（表示为峰-谷?...

在一个典型的光学制造工艺的主要步骤包括整形，打磨，全口径抛光，有时小工具抛光1-3。凭借高品质的光学元件的需求成像和激光系统不断增加，出现了光学加工显著的进步在过去的几十年。例如，精密，确定性材料去除现在可以塑造和打磨工艺，在计算机数字控制的进步（CNC）玻璃成型机中。同样地，小工具抛光技术（ 例如 ，计算机控制光学表面（CCOS），离子辩别，而磁流变精加工（MRF）），导致确定性材料去除和表面形状控制，从而强烈地影响光学制造工业。然而，在整理过程中，全口径抛光的中间步骤，仍然缺乏确定性较高，通常需要熟练的opticiaNS开展多个，长常，迭代周期，多工艺变化，实现对所需的表面图1-3。 大量的研磨方法中，过程变量，以及复杂的化学和工件，搭接和浆料3-4之间的机械相互作用作出它具有挑战性的，从一个“艺术”到科学变换光学研磨。为了实现确定性全口径抛光，该材料去除速率，必须很好地理解。从历史上看，材料去除速率已经描述了广泛的应用普雷斯顿公式5 <img alt="式（1）" fo:content-width="1in" fo:src="/files/ftp_upload/51965/51965eqn1.jpg" src="/files/ftp_upload/51965/51965eqn1.jpg" width="100px" /> （1） 其中，DH / dt是平均厚度去除率，K p是普雷斯顿恒定的，σO被所施加的压力，而V r是在工件和研具之间的平均相对速度。 图1示意性地示出了如所描述的普雷斯顿公式，包括在速度的空间和时间的变化和压力，之间的差别影响的材料去除速率的物理概念施加的压力和压力分布工件经历，和摩擦效应6-8。具体地，经历了由工件的实际压力分布由一些现象强烈影响所得工件的表面图（在别处详细描述的6-8）的约束。另外，在普雷斯顿公式，微观和分子水平的影响在很大程度上折叠成宏观普雷斯顿常数（k p）的 ，这影响了整体材料去除率，微观粗糙度，甚至刮伤工件上。各种研究已扩大普雷斯顿的模型来解释<html>对于微观粒子的浆垫，工件的相互作用来解释材料去除率和微粗糙度9-16。 为了实现表面图的过程中充分孔径抛光确定性控制中，每个上述的现象，需要理解，量化，然后进行控制。后面收敛抛光的策略是消除或最小化的材料去除不均匀的不良的原因，无论是通过工程化抛光的设计或通过过程控制，使得去除仅驱动由工件-研具失配由于工件形状7,17- 18。 图2说明了如何根据工件-研具失配的概念工件形状可导致收敛。考虑一台一圈，并在左上方显示复杂形状的工件的假设。该接口高度不匹配（称为间隙，ΔHOL）影响界面压力分布（σ）为： 内容“FO：保持together.within页=”总是“&gt; <img alt="公式2" fo:content-width="1in" fo:src="/files/ftp_upload/51965/51965eqn2.jpg" src="/files/ftp_upload/51965/51965eqn2.jpg" width="100px" /> （2） 其中，h是常数，描述的速率将压力下降的增加间隙的ΔhOL 6。在这个例子中，工件具有在中心的最高局部压力（参见图2的左下角），因此这个位置将抛光期间观察的最高初始材料去除速率。作为材料被去除，横跨工件的压力差会减小，由于在工件 - 研具失配的降低，工件会收敛到搭接的形状。在收敛时，工件的压力分布，并且因此材料去除，将横跨该工件均匀（参照图2右侧的）。这个例子说明了一个平面搭接，howev呃同样的概念适用于一个球形棉卷（凹或凸）。同样，如果所有影响空间的材料的不均匀等现象已经消除了这种融合的过程才有效。在收敛抛光协议实施的具体程序和工程缓解在讨论中描述。 在以下研究中所描述的协议是收敛的抛光过程专门为26.5平方厘米的熔融石英玻璃工件从细地面开始。在8小时内抛光的（4小时/面），此工件可达到〜λ/ 2的抛光平坦度非常高的表面质量（ 即低刮密度）。

<table border="0" cellpadding="0" cellspacing="0" width="634">
	<tbody>
		<tr height="21">
			<td height="21" style="height:21px;width:251px;">Name of Material/Equipment</td>
			<td style="width:245px;">Company</td>
			<td style="width:139px;">Catalog Number</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;">MHN 50 mil Polyurethane Pad&#160;</td>
			<td>Eminess Technologies</td>
			<td>PF-MHN15A050L-56</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;">Cerium oxide polishing slurry</td>
			<td>Universal Photonics</td>
			<td>HASTILITE PO</td>
		</tr>
		<tr height="21">
			<td dir="LTR" height="21" style="height:21px;width:251px;">Septum Glass (waterjet cut)</td>
			<td dir="LTR" style="width:245px;">Borofloat ; Schott&#160;</td>
			<td dir="LTR" style="width:139px;">NA</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;">Diamond conditioner</td>
			<td>Morgan Advanced Ceramics&#160;</td>
			<td>CMP-25035-SFT</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;">Ultrasonic Cleaner</td>
			<td>Advanced Sonics Processing System</td>
			<td>URC4</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;">Purification Optima Filter cartridge</td>
			<td>3M</td>
			<td>CMP560P10FC</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;">Blocking Pitch</td>
			<td>Universal Photonics</td>
			<td>BP1</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;">Blocking Tape</td>
			<td>3M</td>
			<td>#4712</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;">Cleanroom Cloth</td>
			<td>ITW Texwipe</td>
			<td>AlphaWipe TX1013</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;">Single Particle Optical Sensing</td>
			<td>Paritcle Sizing Systems</td>
			<td>Accusizer 780 AD</td>
		</tr>
	</tbody>
</table>

convergent polishing: a simple, rapid, full aperture polishing process of high quality optical flats &amp; spheres

会聚抛光是一种新颖的抛光系统及方法用于精加工平面和球形玻璃光学其中一个工件，独立于它的初始形状（ 即表面图），将收敛到最终表面的数字与下一个固定的，不变的一组良好的表面质量在单个抛光迭代抛光参数。与此相反，常规的全口径抛光方法需要多个常长，涉及抛光，计量和工艺变化以获得所需的表面图的迭代循环。的收敛抛光过程是基于工件 - 研具失配的高度造成的压力差，与去除并导致工件会聚到搭接的形状减小的概念。成功地执行收敛抛光处理的是若干的技术的结合的结果，以除去非均匀的空间的材料去除（所有来源除了工件 - 研具失配）为表面图形收敛性和减少在系统中为低刮密度和低粗糙度流氓颗粒的数目。的收敛抛光过程已被证明为单位和各种形状，尺寸的球体，以及各种玻璃材料的长宽比的制造。的实际影响是，高品质的光学元件，可以更快速地制造，更多次，以较少的计量，并以更少的劳动，从而降低了单位成本。在这项研究中，收敛抛光协议是专门用于制造26.5厘米正方形熔融二氧化硅单位从细地面表面到抛光〜λ/ 2的表面图抛光表面每4小时就A 81厘米直径的抛光后说明。

的收敛抛光协议上述允许地面熔融二氧化硅的工件（在此情况下26.5厘米见方）待抛光，以每面4小时的单次迭代，以的峰 - 谷平坦度〜λ/ 2（〜 330纳米）为低纵横比的工件和〜1λ（〜633纳米），用于高纵横比的工件（ 见图3）。再次，此过程反复收敛工件至相同的最终面形，而无需改变抛光参数，它独立于初始表面身影。另外，〜4微米/小时的高工件平均去除率一律取得使用上述条件?...

Watch this Scientific Journal Video about Convergent Polishing: A Simple, Rapid, Full Aperture Polishing Process of High Quality Optical Flats & Spheres at JoVE.com

Convergent Polishing: A Simple, Rapid, Full Aperture Polishing Process of High Quality Optical Flats &amp; Spheres

A novel optical polishing process, called &#8220;Convergent Polishing&#8221;, which enables faster, lower cost polishing, is described. Unlike conventional polishing processes, Convergent Polishing allows a glass workpiece to be polished in a single iteration and with high surface quality to its final surface figure without requiring changes to polishing parameters.

收敛抛光：高品质光学平面与球的一种简单，快速，全口径抛光工艺

Convergent Polishing is a novel polishing system and method for finishing flat and spherical glass optics in which a workpiece, independent of its initial ...

convergent-polishing-simple-rapid-full-aperture-polishing-process

Research

JoVE Journal

Engineering

11.0K 次观看.  Lawrence Livermore National Laboratory. A novel optical polishing process, called “Convergent Polishing”, which enables faster, lower cost polishing, is described. Unlike conventional polishing processes, Convergent Polishing allows a glass workpiece to be polished in a single iteration and with high surface quality to its final surface figure without requiring changes to polishing parameters.

视频: Convergent Polishing: A Simple, Rapid, Full Aperture Polishing Process of High Quality Optical Flats & Spheres

Fabrication of Silica Ultra High Quality Factor Microresonators

Whispering gallery resonant cavities confine light in circular orbits at their periphery.1-2 The photon storage lifetime in the cavity, quantified by the quality factor (Q) of the cavity, can be in excess of 500ns for cavities with Q factors above 100 million. As a result of their low material losses, silica microcavities have demonstrated some of the longest photon lifetimes to date1-2. Since a portion of the circulating light extends outside the resonator, these devices can also be used to probe the surroundings. This interaction has enabled numerous experiments in biology, such as single molecule biodetection and antibody-antigen kinetics, as well as discoveries in other fields, such as development of ultra-low-threshold microlasers, characterization of thin films, and cavity quantum electrodynamics studies.3-7
The two primary silica resonant cavity geometries are the microsphere and the microtoroid. Both devices rely on a carbon dioxide laser reflow step to achieve their ultra-high-Q factors (Q&gt;100 million).1-2,8-9 However, there are several notable differences between the two structures. Silica microspheres are free-standing, supported by a single optical fiber, whereas silica microtoroids can be fabricated on a silicon wafer in large arrays using a combination of lithography and etching steps. These differences influence which device is optimal for a given experiment.
Here, we present detailed fabrication protocols for both types of resonant cavities. While the fabrication of microsphere resonant cavities is fairly straightforward, the fabrication of microtoroid resonant cavities requires additional specialized equipment and facilities (cleanroom). Therefore, this additional requirement may also influence which device is selected for a given experiment.
Introduction
An optical resonator efficiently confines light at specific wavelengths, known as the resonant wavelengths of the device. 1-2 The common figure of merit for these optical resonators is the quality factor or Q. This term describes the photon lifetime (&tau;o) within the resonator, which is directly related to the resonator's optical losses. Therefore, an optical resonator with a high Q factor has low optical losses, long photon lifetimes, and very low photon decay rates (1/&tau;o). As a result of the long photon lifetimes, it is possible to build-up extremely large circulating optical field intensities in these devices. This very unique property has allowed these devices to be used as laser sources and integrated biosensors.10
A unique sub-class of resonators is the whispering gallery mode optical microcavity. In these devices, the light is confined in circular orbits at the periphery. Therefore, the field is not completely confined within the device, but evanesces into the environment. Whispering gallery mode optical cavities have demonstrated some of the highest quality factors of any optical resonant cavity to date.9,11 Therefore, these devices are used throughout science and engineering, including in fundamental physics studies and in telecommunications as well as in biodetection experiments. 3-7,12
Optical microcavities can be fabricated from a wide range of materials and in a wide variety of geometries. A few examples include silica and silicon microtoroids, silicon, silicon nitride, and silica microdisks, micropillars, and silica and polymer microrings.13-17 The range in quality factor (Q) varies as dramatically as the geometry. Although both geometry and high Q are important considerations in any field, in many applications, there is far greater leverage in boosting device performance through Q enhancement. Among the numerous options detailed previously, the silica microsphere and the silica microtoroid resonator have achieved some of the highest Q factors to date.1,9 Additionally, as a result of the extremely low optical loss of silica from the visible through the near-IR, both microspheres and microtoroids are able to maintain their Q factors over a wide range of testing wavelengths.18 Finally, because silica is inherently biocompatible, it is routinely used in biodetection experiments.
In addition to high material absorption, there are several other potential loss mechanisms, including surface roughness, radiation loss, and contamination loss.2 Through an optimization of the device size, it is possible to eliminate radiation losses, which arise from poor optical field confinement within the device. Similarly, by storing a device in an appropriately clean environment, contamination of the surface can be minimized. Therefore, in addition to material loss, surface scattering is the primary loss mechanism of concern.2,8
In silica devices, surface scattering is minimized by using a laser reflow technique, which melts the silica through surface tension induced reflow. While spherical optical resonators have been studied for many years, it is only with recent advances in fabrication technologies that researchers been able to fabricate high quality silica optical toroidal microresonators (Q&gt;100 million) on a silicon substrate, thus paving the way for integration with microfluidics.1
The present series of protocols details how to fabricate both silica microsphere and microtoroid resonant cavities. While silica microsphere resonant cavities are well-established, microtoroid resonant cavities were only recently invented.1 As many of the fundamental methods used to fabricate the microsphere are also used in the more complex microtoroid fabrication procedure, by including both in a single protocol it will enable researchers to more easily trouble-shoot their experiments.

We describe the use of a carbon dioxide laser reflow technique to fabricate silica resonant cavities, including free-standing microspheres and on-chip microtoroids. The reflow method removes surface imperfections, allowing long photon lifetimes within both devices. The resulting devices have ultra high quality factors, enabling applications ranging from telecommunications to biodetection.

硅胶超高品质因子微谐振器的制造

Whispering gallery resonant cavities confine light in circular orbits at their periphery.1-2 The photon storage lifetime in the cavity, quantified by the ...

科研

工程学

Process of Making Three-dimensional Microstructures using Vaporization of a Sacrificial Component

Vascular structures in natural systems are able to provide high mass transport through high surface areas and optimized structure. Few synthetic material fabrication techniques are able to mimic the complexity of these structures while maintaining scalability. The Vaporization of a Sacrificial Component (VaSC) process is able to do so. This process uses sacrificial fibers as a template to form hollow, cylindrical microchannels embedded within a matrix. Tin (II) oxalate (SnOx) is embedded within poly(lactic) acid (PLA) fibers which facilitates the use of this process. The SnOx catalyzes the depolymerization of the PLA fibers at lower temperatures. The lactic acid monomers are gaseous at these temperatures and can be removed from the embedded matrix at temperatures that do not damage the matrix. Here we show a method for aligning these fibers using micromachined plates and a tensioning device to create complex patterns of three-dimensionally arrayed microchannels. The process allows the exploration of virtually any arrangement of fiber topologies and structures.

The Vaporization of a Sacrificial Component (VaSC) process is used to fabricate microvascular structures. This procedure uses sacrificial poly(lactic) acid fibers to form hollow microchannels with precise 3D geometric positioning provided by laser micromachined guide plates.

制作三维微结构，用牺牲部分汽化过程

Vascular structures in natural systems are able to provide high mass transport through high surface areas and optimized structure. Few synthetic material ...

Construction of a High Resolution Microscope with Conventional and Holographic Optical Trapping Capabilities

High resolution microscope systems with optical traps allow for precise manipulation of various refractive objects, such as dielectric beads 1 or cellular organelles 2,3, as well as for high spatial and temporal resolution readout of their position relative to the center of the trap. The system described herein has one such "traditional" trap operating at 980 nm. It additionally provides a second optical trapping system that uses a commercially available holographic package to simultaneously create and manipulate complex trapping patterns in the field of view of the microscope 4,5 at a wavelength of 1,064 nm. The combination of the two systems allows for the manipulation of multiple refractive objects at the same time while simultaneously conducting high speed and high resolution measurements of motion and force production at nanometer and piconewton scale.

The system described herein employs a traditional optical trap as well as an independent holographic optical trapping line, capable of creating and manipulating multiple traps. This allows for the creation of complex geometric arrangements of refractive particles while also permitting simultaneous high-speed, high-resolution measurements of the activity of biological enzymes.

高分辨率显微镜与常规和全息光学捕获能力建设

High resolution microscope systems with optical traps allow for precise manipulation of various refractive objects, such as dielectric beads 1 or cellular ...

The Generation of Higher-order Laguerre-Gauss Optical Beams for High-precision Interferometry

Thermal noise in high-reflectivity mirrors is a major impediment for several types of high-precision interferometric experiments that aim to reach the standard quantum limit or to cool mechanical systems to their quantum ground state. This is for example the case of future gravitational wave observatories, whose sensitivity to gravitational wave signals is expected to be limited in the most sensitive frequency band, by atomic vibration of their mirror masses. One promising approach being pursued to overcome this limitation is to employ higher-order Laguerre-Gauss (LG) optical beams in place of the conventionally used fundamental mode. Owing to their more homogeneous light intensity distribution these beams average more effectively over the thermally driven fluctuations of the mirror surface, which in turn reduces the uncertainty in the mirror position sensed by the laser light.
We demonstrate a promising method to generate higher-order LG beams by shaping a fundamental Gaussian beam with the help of diffractive optical elements. We show that with conventional sensing and control techniques that are known for stabilizing fundamental laser beams, higher-order LG modes can be purified and stabilized just as well at a comparably high level. A set of diagnostic tools allows us to control and tailor the properties of generated LG beams. This enabled us to produce an LG beam with the highest purity reported to date. The demonstrated compatibility of higher-order LG modes with standard interferometry techniques and with the use of standard spherical optics makes them an ideal candidate for application in a future generation of high-precision interferometry.

Large laser-interferometers are being constructed to create a new type of astronomy based on gravitational waves. Their sensitivities, as for many other high-precision experiments, are approaching fundamental noise limits such as the atomic vibration of their components. We are pioneering technologies to overcome these limits using novel laser beam shapes.

代高阶拉盖尔 - 高斯光束的高精度干涉

Thermal noise in high-reflectivity mirrors is a major impediment for several  types of high-precision interferometric experiments that aim to reach the  ...

Fabrication Process of Silicone-based Dielectric Elastomer Actuators

This contribution demonstrates the fabrication process of dielectric elastomer transducers (DETs). DETs are stretchable capacitors consisting of an elastomeric dielectric membrane sandwiched between two compliant electrodes. The large actuation strains of these transducers when used as actuators (over 300% area strain) and their soft and compliant nature has been exploited for a wide range of applications, including electrically tunable optics, haptic feedback devices, wave-energy harvesting, deformable cell-culture devices, compliant grippers, and propulsion of a bio-inspired fish-like airship. In most cases, DETs are made with a commercial proprietary acrylic elastomer and with hand-applied electrodes of carbon powder or carbon grease. This combination leads to non-reproducible and slow actuators exhibiting viscoelastic creep and a short lifetime. We present here a complete process flow for the reproducible fabrication of DETs based on thin elastomeric silicone films, including casting of thin silicone membranes, membrane release and prestretching, patterning of robust compliant electrodes, assembly and testing. The membranes are cast on flexible polyethylene terephthalate (PET) substrates coated with a water-soluble sacrificial layer for ease of release. The electrodes consist of carbon black particles dispersed into a silicone matrix and patterned using a stamping technique, which leads to precisely-defined compliant electrodes that present a high adhesion to the dielectric membrane on which they are applied.

This manuscript shows the fabrication process for the manufacture of dielectric elastomer soft actuators based on silicone membranes. The three key stages of production are presented in detail: blade casting of thin silicone membranes; pad printing of compliant electrodes; and the assembly of all the components.

有机硅为基础的介电弹性体致动器的制作工艺

This contribution demonstrates the fabrication process of dielectric elastomer transducers (DETs). DETs are stretchable capacitors consisting of an ...

Adsorption Device Based on a Langatate Crystal Microbalance for High Temperature High Pressure Gas Adsorption in Zeolite H-ZSM-5

We present a high-temperature and high-pressure gas adsorption measurement device based on a high-frequency oscillating microbalance (5 MHz langatate crystal microbalance, LCM) and its use for gas adsorption measurements in zeolite H-ZSM-5. Prior to the adsorption measurements, zeolite H-ZSM-5 crystals were synthesized on the gold electrode in the center of the LCM, without covering the connection points of the gold electrodes to the oscillator, by the steam-assisted crystallization (SAC) method, so that the zeolite crystals remain attached to the oscillating microbalance while keeping good electroconductivity of the LCM during the adsorption measurements. Compared to a conventional quartz crystal microbalance (QCM) which is limited to temperatures below 80 &#176;C, the LCM can realize the adsorption measurements in principle at temperatures as high as 200-300 &#176;C (i.e., at or close to the reaction temperature of the target application of one-stage DME synthesis from the synthesis gas), owing to the absence of crystalline-phase transitions up to its melting point (1,470 &#176;C). The system was applied to investigate the adsorption of CO2, H2O, methanol and dimethyl ether (DME), each in the gas phase, on zeolite H-ZSM-5 in the temperature and pressure range of 50-150 &#176;C and 0-18 bar, respectively. The results showed that the adsorption isotherms of these gases in H-ZSM-5 can be well fitted by Langmuir-type adsorption isotherms. Furthermore, the determined adsorption parameters, i.e., adsorption capacities, adsorption enthalpies, and adsorption entropies, compare well to literature data. In this work, the results for CO2 are shown as an example.

A protocol for high-temperature and high-pressure gas adsorption measurements on zeolite H-ZSM-5 using an adsorption measurement device based on a langatate crystal microbalance is presented. Prior to the adsorption measurements, the synthesis of zeolite H-ZSM-5 on the langatate crystal microbalance sensor by the steam-assisted crystallization (SAC) method is demonstrated.

基于一个Langatate体微天平的高温高压气体吸附在分子筛吸附器H-ZSM-5

We present a high-temperature and high-pressure gas adsorption measurement device based on a high-frequency oscillating microbalance (5 MHz langatate ...

Challenges in Rheological Characterization of Highly Concentrated Suspensions &#8212; A Case Study for Screen-printing Silver Pastes

A comprehensive rheological characterization of highly concentrated suspensions or pastes is mandatory for a targeted product development meeting the manifold requirements during processing and application of such complex fluids. In this investigation, measuring protocols for a conclusive assessment of different process relevant rheological parameters have been evaluated. This includes the determination of yield stress, viscosity, wall slip velocity, structural recovery after large deformation and elongation at break as well as tensile force during filament stretching.
The importance of concomitant video recordings during parallel-plate rotational rheometry for a significant determination of rheological quantities is demonstrated. The deformation profile and flow field at the sample edge can be determined using appropriate markers. Thus, measurement parameter settings and plate roughness values can be identified for which yield stress and viscosity measurements are possible. Slip velocity can be measured directly and measuring conditions at which plug flow, shear banding or sample spillover occur can be identified clearly. 
Video recordings further confirm that the change in shear moduli observed during three stage oscillatory shear tests with small deformation amplitude in stage I and III but large oscillation amplitude in stage II can be directly attributed to structural break down and recovery. For the pastes investigated here, the degree of irreversible, shear-induced structural change increases with increasing deformation amplitude in stage II until a saturation is reached at deformations corresponding to the crossover of G' and G'', but the irreversible damage is independent of the duration of large amplitude shear. 
A capillary breakup elongational rheometer and a tensile tester have been used to characterize deformation and breakup behavior of highly filled pastes in uniaxial elongation. Significant differences were observed in all experiments described above for two commercial screen-printing silver pastes used for front side metallization of Si-solar cells.

Challenges in Rheological Characterization of Highly Concentrated Suspensions &amp;#8212; A Case Study for Screen-printing Silver Pastes

A protocol for a robust and application relevant rheological characterization of highly concentrated suspensions is presented. Silver pastes used for screen-printing application in solar cell production are employed as model systems.

挑战流变特性高度集中悬架 - 为例进行丝网印刷银浆

A comprehensive rheological characterization of highly concentrated suspensions or pastes is mandatory for a targeted product development meeting the ...

Method for Recording Broadband High Resolution Emission Spectra of Laboratory Lightning Arcs

Lightning is one of the most common and destructive forces in nature and has long been studied using spectroscopic techniques, first with traditional camera film methods and then digital camera technology, from which several important characteristics have been derived. However, such work has always been limited due to the inherently random and non-repeatable nature of natural lightning events in the field. Recent developments in lightning test facilities now allow the reproducible generation of lightning arcs within controlled laboratory environments, providing a test bed for the development of new sensors and diagnostic techniques to understand lightning mechanisms better. One such technique is a spectroscopic system using digital camera technology capable of identifying the chemical elements with which the lightning arc interacts, with these data then being used to derive further characteristics. In this paper, the spectroscopic system is used to obtain the emission spectrum from a 100 kA peak, 100 &#181;s duration lightning arc generated across a pair of hemispherical tungsten electrodes separated by a small air gap. To maintain a spectral resolution of less than 1 nm, several individual spectra were recorded across discrete wavelength ranges, averaged, stitched, and corrected to produce a final composite spectrum in the 450 nm (blue light) to 890 nm (near infrared light) range. Characteristic peaks within the data were then compared to an established publicly available database to identify the chemical element interactions. This method is readily applicable to a variety of other light emitting events, such as fast electrical discharges, partial discharges, and sparking in electrical equipment, apparatus, and systems.

Emission spectroscopy techniques have traditionally been used to analyze inherently random lightning arcs occurring in nature. In this paper, a method developed to obtain the emission spectroscopy from reproducible lightning arcs generated within a laboratory environment is described.

记录实验室闪电弧宽带高分辨率发射光谱的方法

Lightning is one of the most common and destructive forces in nature and has long been studied using spectroscopic techniques, first with traditional ...

Atomic Layer Deposition of Vanadium Dioxide and a Temperature-dependent Optical Model

Vanadium dioxide is a material that has a reversible metal-insulator phase change near 68 &#176;C. To grow VO2 on a wide variety of substrates, with wafer-scale uniformity and angstrom level control of thickness, the method of atomic-layer deposition was chosen. This ALD process enables high-quality, low-temperature (&#8804;150 &#176;C) growth of ultrathin films (100-1000 &#197;) of VO2. For this demonstration, the VO2 films were grown on sapphire substrates. This low temperature growth technique produces mostly amorphous VO2 films. A subsequent anneal in an ultra-high vacuum chamber with a pressure of 7x10-4 Pa of ultra-high purity (99.999%) oxygen produced oriented, polycrystalline VO2 films. The crystallinity, phase, and strain of the VO2 were determined by Raman spectroscopy and X-ray diffraction, while the stoichiometry and impurity levels were determined by X-ray photoelectron spectroscopy, and finally the morphology was determined by atomic force microscopy. These data demonstrate the high-quality of the films grown by this technique. A model was created to fit to the data for VO2 in its metallic and insulating phases in the near infrared spectral region. The permittivity and refractive index of the ALD VO2 agreed well with the other fabrication methods in its insulating phase, but showed a difference in its metallic state. Finally, the analysis of the films&#39; optical properties enabled the creation of a wavelength- and temperature-dependent model of the complex optical refractive index for developing VO2 as a tunable refractive index material.

Thin films (100-1000 &#197;) of vanadium dioxide (VO2) were created by atomic-layer deposition (ALD) on sapphire substrates. Following this, the optical properties were characterized through the metal-insulator transition of VO2. From the measured optical properties, a model was created to describe the tunable refractive index of VO2.

二氧化钒原子层沉积与温度依赖性光学模型

Vanadium dioxide is a material that has a reversible metal-insulator phase change near 68 &#176;C. To grow VO2 on a wide variety of substrates, with ...

Predicting Catalyst Extrudate Breakage Based on the Modulus of Rupture

The mechanical strength of extruded catalysts and their natural or forced breakage by either collision against a surface or by a compressive load in a fixed bed are important phenomena in catalyst technology. The mechanical strength of the catalyst is measured here by its bending strength or flexural strength. This technique is relatively new from the perspective of applying it to commercial catalysts of typical sizes used in the industry. Catalyst breakage by collision against a surface is measured after a fall of the extrudates through the ambient air in a vertical pipe. Quantifying the impact force is done theoretically by applying Newton's second law. Measurement of catalyst breakage due to stress in a fixed bed is done following the standard procedure of the bulk crush strength test. Novel here is the focus on measuring the reduction in the length to diameter ratio of the extrudates as a function of the stress.

Here we present a protocol to measure the modulus of rupture of an extruded catalyst and the breakage of said catalyst extrudates by collision against a surface or by compression in a fixed bed.

基于断裂模量的催化剂挤出断裂预测

The mechanical strength of extruded catalysts and their natural or forced breakage by either collision against a surface or by a compressive load in a ...