安嫩伯格基金会研究生研究奖学金A.制造商的支持，并支持这项工作是由国家科学基金会[085281和1028440]。

1。微球的制备<ol><li>选择从一端的光纤，带〜1.5“熔覆少量（约5英寸），无论是甲醇或乙醇（ 图1A，B）和清理。 </li><li>如果可用，年底，光纤切割刀切割。如果没有可用的，剪线刀或剪刀，离开〜0.5“。使用光纤菜刀的优势是，它会产生一个非常光滑，均匀切图1b。从削减过度粗糙或缺陷可能会导致不平衡回流，降低导致球的质量因素。 </li><li>暴露在清洁的纤维年底到了〜500μm的光斑大小直径为重点的CO 2激光电源3W〜1秒（ 图1C，D，E）。这将产生球体直径〜200μm的，但可以通过增加或减少光纤的直径大小调整。略有调整激光的强度可能也是Bê必要的回流规模较大或较小的领域。 </li></ol> 2。微型环芯制造<ol><li>设计和与黑暗，实心圆光罩，在您所选择的间距和直径。重要的是要注意生产的环形将25-30％的比面具界小。例如，一个直径为100微米的实心圆会产生一个直径约为75微米环形。此外，它建议留下空间至少为1-2mm之间每圈之间至少有5毫米的空间圆阵列和周围的面具的边缘。由于样本晶圆必须小心地用镊子处理，重要的是要离开握镊子，没有损坏的环形空间。额外的空间，还提供了一个锥形光纤耦合到成品设备的房间，并允许将样品切成更小的数组更容易。在此过程中，我们用160微米DI行口罩ameter界〜1mm的外，与圈子里的每一行之间的空间〜5毫米。完成环形，直径约110微米。 </li><li>开始与2微米厚的热生长二氧化硅层的硅片。切割晶圆，以适应所需的光刻掩模微盘模式，为光阻边缘珠离开房间。请注意，在开始制造，它是通常蚀刻几个圆阵列更大的硅片件（〜几个厘米×厘米数）最方便的。更大的晶圆允许光刻和蚀刻一次京东方更多的样本，并用镊子更容易处理。后来，前XEF 2蚀刻步骤，建议允许更快，更均匀XEF 2蚀刻成更小的阵列更大的晶圆切割。 </li><li>在通风柜，彻底清洗，丙酮，甲醇，异丙醇，去离子水冲洗晶圆。吹干样品用氮气或过滤排版ressed空气枪，把他们放在一个热点板块设置至少2分钟，晾干至120°C。 </li><li>让晶圆冷却后，放置在易燃/溶剂通风柜，并公开为2分钟，用气相沉积法，HMDS的。一个简单的气相沉积法：把在的小10毫升烧杯HMDS的几滴，然后覆盖的硅片和玻璃容器具有较大的小烧杯举行的蒸气。 </li><li>样品放置在一个适当大小的坐骑微调。使用滴管瓶或注射器和过滤器，适用于光阻样品。旋转到每个样品外套S1813光阻3000RPM，500RPM 45秒5秒。如果不需要晶圆足够大，所以，不干预的图案边缘珠边珠去除。 </li><li>软烤光阻上一个热点板块95°2分钟。 </li><li>使用紫外线光刻和所需的光罩，暴露在光致抗蚀剂覆盖的样本到总80mJ/cm 2的紫外线辐射。 </li><li>沉浸在MF-321开发的样本，以消除暴露在紫外线照射下的光致抗蚀剂。在发展过程中，密切关注从晶圆光阻和溶解。重要的是挑起/沙沙容器，在这个过程中不断地确保均匀的光阻被删除。对于给定的参数，光阻发展需要大约30秒。 </li><li>当大部分不必要的光致抗蚀剂溶解在开发，在流水下冲洗彻底的样品，轻轻吹干样品用氮气或空气枪，检查样品，用显微镜，以确保所有不需要的光致抗蚀剂已被删除。样品如果需要，可以再次沉浸在开发，但是，应该小心，不要过度发展的样本所需的光阻图案也被损坏。 （如果想要的图案损坏或有缺陷，光阻去除丙酮2.1-2.9可以重复）的步骤。 </li><li>发展后，在自来水彻底冲洗样品，轻轻吹干样品，硬烤热板，他们在110°C 2分钟。这一步温度高于其玻璃化转变温度的光致抗蚀剂，回流在发展过程中发生的光致抗蚀剂和部分修复粗糙。 </li><li>使用聚四氟乙烯容器和必要的防护设备，沉浸在改进缓冲氧化物蚀刻（京东方）的样品。京东方包含高频，蚀刻光阻覆盖的硅片（ 图2A-C）上形成圆形硅胶垫硅胶。改善缓冲高频产生平滑的蚀刻，减少粗糙造成的硅胶圈。虽然它有可能以49％的HF高频混合缓冲，这可能会导致高度变量通常只有少量的结果。 </li><li>经过约15-20分钟（D的模式，样本规模和样本数）epending，样品从使用特氟隆镊子京东方删除。仔细自来水冲洗样品。硅胶已被删除，当样品成为疏水。 </li><li>蚀刻，清洗，干燥的样品后，用光学显微镜检查。检查，以确保所需的模式已经被完全蚀刻和所有不需要的硅胶已被删除。如果需要，京东方返回样品，作进一步的腐蚀。一个应该小心，不overetch样品，可能会损坏或圆形图案下方的光阻。 </li><li>一旦京东方蚀刻完成后，用去离子水彻底冲洗样品，并吹干。如果样本是大块的硅片，它也被建议削减他们使用切割锯或钻石文士个别行硅胶圈更小的碎片。圆的个别行更快，更均匀蚀刻的氟化氙2蚀刻步骤（2.16）。在下一步清洗，切割产生的硅尘被删除。 </li><li>删除的光致抗蚀剂用丙酮，甲醇，异丙醇，去离子水冲洗，至少2分钟，在120°C热板使用氮气枪和加热干燥的样品。 </li><li>使用XEF 2蚀刻，削弱下方的圆形硅胶垫的硅形成的二氧化硅microdisks（ 图2D-F）。蚀刻金额应是硅胶圈的大小约1/3，所以用光学显微镜检查确定，总磁盘直径约为1/3-1/2，由此产生的微盘的支柱。 XEF 2脉冲，每个脉冲的持续时间取决于XEF 2使用蚀刻室和类型的硅量。 </li><li> XEF 2蚀刻后，公开的样本集中的CO 2激光束在约12W〜3秒或直到顺利环形强度形成（ 图2G-I）。根据磁盘的确切大小和金额的2 XEF削弱，略高或更低的强度和暴露时间可能需要形成一个微型环芯。重要的是，激光束和微盘的中心的中心对齐，使硅微盘将形成一个光滑，圆形的微型环芯。 </li></ol> 3。代表结果微球和微型环芯成像设备可以同时使用光学显微镜和扫描电子显微镜（ 图1d，e和图2H，我 ）。所有图像，设备表面的均匀性是显而易见的。 要验证的详细方法创建超高Q器件，我们还有一个特点是执行线宽（Δλ）的测量和计算加载的几个器件的Q因子q在简单的表达式为Q =λ/Δλ=ωτ，其中λ=波长谐振，ω=频率，τ=光子寿命。代表每个设备采用先前的详细过程，1,9和几个设备比较图谱如图3所示。所有设备的质量因素超过10亿美元，与大多数人超过100万。 微球的光谱是一个单一的共鸣，表明光加上顺时针或逆时针蔓延光学模式。然而，频谱的环形展出分裂共振，表明成顺时针和逆时针的模式，同时加上光。这种现象发生时，有一个美中不足的耦合网站。通过拟合谱双洛伦兹，这两种模式的Q因子可以决定的。分裂共振phenome的NA可以发生在这两个领域和环形谐振器，但更经常在环形观察，因为它们更容易受到不完善到球相比减少光学模式。 <img src="/files/ftp_upload/4164/4164fig1.jpg" alt="图1"/> 图1。微腔制造工艺的流程图。一）渲染和b）清洁和切割的光纤的光学显微镜。 C）渲染，D）光学显微镜和电子）扫描电子显微镜一个microspere谐振器。 <img src="/files/ftp_upload/4164/4164fig2.jpg" alt="图2"/> 图2。微型环芯腔制造工艺的流程图。一）渲染，b）顶光学显微镜和c）侧视扫描电子显微光刻和京东方蚀刻定义，循环氧化垫。注意氧化物的形成，是由京东方轻微的楔形形状。 D）渲染，E）的顶部视图光学显微镜和f）侧视扫描电子显微镜氧化垫后XEF 2蚀刻步骤。请注意，氧化磁盘保持楔形的外围。 G）渲染，H）俯视光学显微镜和我）侧视扫描电子显微镜的微型环芯腔。 <img src="/files/ftp_upload/4164/4164fig3.jpg" alt="图3"/> 图3。代表质量的因素光谱一）微球和b）微型环芯使用线宽测量方法确定的谐振腔。在非常高Q器件，可以观察模式的分裂或双峰，光反映了一个小的缺陷，并顺时针和逆时针的方向循环。 C）比较图显示几个微球和微型环芯谐振腔的Q值。 <a href="http://www.jove.com/files/ftp_upload/4164/4164fig3large.jpg" target="_blank">按一下这里取得更大的数字</a> 。 图4 CO 2激光回流示意图设置。反映的CO 2激光束（蓝色实线），然后集中在样品上。它穿过的10.6微米/ 633 nm的光束合成，传输10.6微米，反映633纳米。样品的反射光列图像束合成，因此，图像有点红。此设置必要的零件清单是在表4。 <img src="/files/ftp_upload/4164/4164fig5.jpg" alt="图5"/> 图5。错误地回流）微球和B）微型环芯共振腔。由于不正确的位置在梁，该设备是正常形成。 C）作为一个贫穷的光罩或贫困光刻，磁环是月亮形。

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没有利益冲突的声明。

与任何光学结构，在制造过程的每一步保持清洁是至关重要的。由于光刻技术和制造上的主题撰写了大量教科书，下面的建议是不打算要全面，但突出了几个比较常见的研究人员所面临的问题。19-20 由于微型环芯的外围均匀确定由均匀的初始磁盘，这是非常重要的模式非常圆盘。具体的微型环芯常见的问题是：1）模糊了照片口罩，2）贫困光刻（下或曝光过度，下发?...

<table border="1"><tbody><tr><td> 部分名称 </td><td> 公司 </td><td> 目录编号 </td><td> 评论 </td></tr><tr><td>纤维隶</td><td>纽波特</td><td>架F-RFS的</td><td>可选</td></tr><tr><td>光纤</td><td>纽波特</td><td>的F-SMF-28 </td><td>可用于任何类型的光纤。 </td></tr><tr><td>光纤涂层剥</td><td>纽波特</td><td>架F-STR-175 </td><td>也可用于剥线</td></tr><tr><td>乙醇</td><td>任何供应商</td><td>溶剂级纯度</td><td>甲醇或异丙醇是替代品</td></tr></tbody></table> 表1。微球的制造材料。 <table border="1"><tbody><tr><td> 试剂名称 </td><td> 公司 </td><td> &lt;强&gt;产品目录</td><td> 评论 </td></tr><tr><td>硅片与2μm的热生长二氧化硅</td><td>应激材料</td><td> N / A </td><td>我们使用的内在8，&lt;100&gt; 4“直径</td></tr><tr><td>涂HMDS（六甲基） </td><td>奥尔德里奇</td><td> 440191 </td><td></td></tr><tr><td>光阻</td><td>希普利</td><td> S1813 </td><td></td></tr><tr><td>开发人员</td><td>希普利</td><td> MF-321 </td><td></td></tr><tr><td>缓冲氢氟酸 - 改进</td><td> transene </td><td> N / A </td><td>改进缓冲高频提供更顺畅，更好的质量比普通京东方或HF蚀刻</td></tr><tr><td>丙酮，甲醇，异丙醇</td><td>任何供应商</td><td>纯度99.8％ </td><td></td></tr></tbody></table> 表2。MICRotoroid制作材料。 <table border="1"><tbody><tr><td> 设备名称 </td><td> 生产厂家 </td><td> 目录编号 </td><td> 评论 </td></tr><tr><td>微调</td><td> solitec </td><td> 5110-ND </td><td>可用于任何微调。 </td></tr><tr><td>对准</td><td> SUSS MicroTec公司</td><td> MJB 3 </td><td>可用于任何对准。 </td></tr><tr><td> XEF 2蚀刻</td><td>先进的通信设备公司</td><td> ＃ADCETCH2007 </td><td></td></tr></tbody></table> 表3。微型环芯半导体设备。 <table border="1"><tbody><tr><td> 部分名称 </td><td> 公司 </td><td> 目录编号 </td><td> 评论 </td></tr><tr><td>的CO 2 </suB&gt;激光</td><td> SYNRAD </td><td>系列48 </td><td></td></tr><tr><td> 3轴阶段</td><td> OptoSigma </td><td> 120-0770 </td><td>以及从其他供应商提供。 </td></tr><tr><td>硅反射镜直径为1“） </td><td> II-VI族</td><td> 308325 </td><td>以及从其他供应商提供。 </td></tr><tr><td>运动学万向节安装（硅反射镜） </td><td>托尔实验室</td><td> KX1G </td><td>以及从其他供应商提供。 </td></tr><tr><td>波束合成（1“直径） </td><td>梅勒光学</td><td> L19100008-B0 </td><td>以及从其他供应商提供。 </td></tr><tr><td> 4“焦距镜头（直径为1”） </td><td>梅勒光学或II-VI </td><td></td><td>以及从其他供应商提供</td></tr><tr><td>什锦职位，镜头坐骑</td><td>托尔实验室，新港，埃德蒙光学或Optosigma </td><td></td><td></td></tr><tr><td>变焦6000机器视觉系统</td><td> NAVITAR </td><td> N / A </td><td>需要通用的USB摄像头和计算机实时成像。这是作为套件购买。 </td></tr><tr><td>调焦为变焦6000系统</td><td>埃德蒙光学</td><td> 54-792 </td><td>以及从其他供应商提供。 </td></tr><tr><td>变焦6000的XZ轴定位</td><td>帕克千变万化</td><td> CR4457，CR4452，4499 </td><td> CR4457是X轴，CR4452是4499 Z轴，安装支架。 </td></tr></tbody></table> 表4 CO 2激光回流焊设置。

fabrication of silica ultra high quality factor microresonators

花落画廊谐振腔局限光圆轨道，在其周边的1-2光子在腔内的存储寿命，腔的品质因数（Q）的量化，可以与Q值超过腔为500ns以上。亿。由于其低的物质损失的结果已经证明，硅微腔迄今寿命最长的光子1-2。由于部分循环光谐振腔外扩展，这些设备也可以被用来探测周围的环境。这种相互作用使生物学中的无数次的实验，如单分子生物检测和抗体抗原反应动力学，以及在其他领域，如超低阈值的微腔，薄膜的特性，腔量子电动力学研究的发展，发现。 3-7 两个主要的硅谐振腔的几何是微的microtoroi的D。这两款器件依靠二氧化碳激光回流步骤，以实现其超高Q值的因素（问&gt; 100万美元）。1-2,8-9，但有几个显着的差异，两种结构之间的。硅胶微球是自由站立，由一个单一的光纤，而在大型阵列使用光刻和蚀刻步骤的组合硅片上制造硅microtoroids可以支持。这些差异的影响，对于一个给定的实验设备是最佳。 在这里，我们提出了谐振腔两种类型的详细制作协议。虽然微谐振腔的制作相当简单，制造微型环芯共振腔，需要额外的专用设备和设施（洁净室）。因此，这额外的要求，也可能影响选择一个给定的实验设备。 介绍光学重sonator有效地局限在特定波长，称为设备的谐振波长的光。1-2这些光学谐振腔的共同优点的数字是质量因素或问：这个术语描述了光子寿命（τO）在谐振器，这是直接关系到谐振器的光损失。因此，具有很高的Q因子的光学谐振器具有低光学损失，光子寿命长，和非常低的光子衰减率（1 /τØ）。为光子寿命长，它是不可能建立的循环在这些设备中的光场强度非常大。这非常独特的属性允许这些设备将用于激光源和集成传感器10。 独特的谐振子类回音壁模式光学微腔。在这些设备中，光被局限在外围的圆形轨道。因此，该领域还没有完全刀豆罚款内的设备，但evanesces到环境中。光学腔回音壁模式已经证明任何光学谐振腔的一些最高质量的因素。9,11因此，这些设备被用于整个科学与工程，包括在基础物理研究，以及在电讯，生物检测实验。 3-7,12 制作光学微腔可以从各种材料和各种各样的几何图形。举几个例子包括硅和硅microtoroids的，硅，氮化硅和二氧化硅microdisks，micropillars，硅和聚合物微环。13-17品质因数（Q）的范围内变化急剧的几何。虽然几何和高Q值在任何领域都是重要的考虑因素，在许多应用中，有更大的杠杆提高设备的性能通过Q增强。其中德泰众多选项以前的领导，二氧化硅微球和二氧化硅微型环芯共振器取得了一些最高的Q值。1,9此外，作为一个非常低的光损失，可见通过近红外光谱，这两个球和二氧化硅的结果microtoroids能够保持其Q值的测试波长范围广泛。18最后，因为硅胶是固有的生物相容性，它经常用于在生物检测实验。 除了 ​​在高物质的吸收，还有其他一些潜在的损失的机制，包括表面粗糙度，辐射损耗，污染损失。2，通过优化设备的大小，它是可以消除贫困光学领域禁闭产生的辐射损失，内的设备。同样，存储在一个适当的环境清洁设备，表面污染可减至最低。因此，除了物质损失外，苏rface散射2,8是关注的主要损失机制。 在硅器件，尽量减少使用激光回流焊技术，它通过表面张力引起的回流熔化二氧化硅表面散射。球面光学谐振器已研究多年，虽然它是只与制造技​​术的最新进展，研究人员已经能够制造高品质的硅光环形微谐振器（问&gt; 100万美元），在硅衬底上，从而铺平了整合的方式微流体。1 目前的一系列协议，详细介绍了如何制作二氧化硅微球和微型环芯共振腔。虽然建立硅微谐振腔，微型环芯共振腔最近才发明的。1由于许多用于制造微球的基本方法也更复杂的微型环芯制造程序及使用E，它包括在一个单一的协议将使研究人员能够更容易闹事拍摄他们的实验。

Watch this Scientific Journal Video about Fabrication of Silica Ultra High Quality Factor Microresonators at JoVE.com

Fabrication of Silica Ultra High Quality Factor Microresonators

我们描述了利用二氧化碳激光回流焊技术来制造石英谐振腔，包括微球和芯片microtoroids的独立。回流法去除表面缺陷，允许在两个设备的光子寿命。由此产生的设备有超高质量的因素，使应用范围从电信到生物检测。

硅胶超高品质因子微谐振器的制造

Whispering gallery resonant cavities confine light in circular orbits at their periphery.1-2 The photon storage lifetime in the cavity, quantified by the ...

fabrication-of-silica-ultra-high-quality-factor-microresonators

Research

JoVE Journal

Engineering

16.0K 次观看.  University of Southern California. 我们描述了利用二氧化碳激光回流焊技术来制造石英谐振腔，包括微球和芯片microtoroids的独立。回流法去除表面缺陷，允许在两个设备的光子寿命。由此产生的设备有超高质量的因素，使应用范围从电信到生物检测。

视频: Fabrication of Silica Ultra High Quality Factor Microresonators

Angle-resolved Photoemission Spectroscopy At Ultra-low Temperatures

The physical properties of a material are defined by its electronic structure. Electrons in solids are characterized by energy (&omega;) and momentum (k) and the probability to find them in a particular state with given &omega; and k is described by the spectral function A(k, &omega;). This function can be directly measured in an experiment based on the well-known photoelectric effect, for the explanation of which Albert Einstein received the Nobel Prize back in 1921. In the photoelectric effect the light shone on a surface ejects electrons from the material. According to Einstein, energy conservation allows one to determine the energy of an electron inside the sample, provided the energy of the light photon and kinetic energy of the outgoing photoelectron are known. Momentum conservation makes it also possible to estimate k relating it to the momentum of the photoelectron by measuring the angle at which the photoelectron left the surface. The modern version of this technique is called Angle-Resolved Photoemission Spectroscopy (ARPES) and exploits both conservation laws in order to determine the electronic structure, i.e. energy and momentum of electrons inside the solid. In order to resolve the details crucial for understanding the topical problems of condensed matter physics, three quantities need to be minimized: uncertainty* in photon energy, uncertainty in kinetic energy of photoelectrons and temperature of the sample.
In our approach we combine three recent achievements in the field of synchrotron radiation, surface science and cryogenics. We use synchrotron radiation with tunable photon energy contributing an uncertainty of the order of 1 meV, an electron energy analyzer which detects the kinetic energies with a precision of the order of 1 meV and a He3 cryostat which allows us to keep the temperature of the sample below 1 K. We discuss the exemplary results obtained on single crystals of Sr2RuO4 and some other materials. The electronic structure of this material can be determined with an unprecedented clarity.

The overall goal of this method is to determine the low-energy electronic structure of solids at ultra-low temperatures using Angle-Resolved Photoemission Spectroscopy with synchrotron radiation.

在极低的温度下角分辨光电子能谱

The physical properties of a material are defined by its  electronic structure. Electrons in solids are characterized by energy (&omega;)  and momentum ...

科研

工程学

Synthesis and Microdiffraction at Extreme Pressures and Temperatures

High pressure compounds and polymorphs are investigated for a broad range of purposes such as determine structures and processes of deep planetary interiors, design materials with novel properties, understand the mechanical behavior of materials exposed to very high stresses as in explosions or impacts. Synthesis and structural analysis of materials at extreme conditions of pressure and temperature entails remarkable technical challenges. In the laser heated diamond anvil cell (LH-DAC), very high pressure is generated between the tips of two opposing diamond anvils forced against each other; focused infrared laser beams, shined through the diamonds, allow to reach very high temperatures on samples absorbing the laser radiation. When the LH-DAC is installed in a synchrotron beamline that provides extremely brilliant x-ray radiation, the structure of materials under extreme conditions can be probed in situ. LH-DAC samples, although very small, can show highly variable grain size, phase and chemical composition. In order to obtain the high resolution structural analysis and the most comprehensive characterization of a sample, we collect diffraction data in 2D grids and combine powder, single crystal and multigrain diffraction techniques. Representative results obtained in the synthesis of a new iron oxide, Fe4O5 1 will be shown.

The laser heated diamond anvil cell combined with synchrotron micro-diffraction techniques allows researchers to explore the nature and properties of new phases of matter at extreme pressure and temperature (PT) conditions. Heterogeneous samples can be characterized in situ under high pressure by 2D mapping and combined powder, single-crystal and multigrain diffraction approaches.

在极端的压力和温度的合成和Microdiffraction

High pressure compounds and polymorphs are investigated for a broad range of purposes such as determine structures and processes of deep planetary ...

Convergent Polishing: A Simple, Rapid, Full Aperture Polishing Process of High Quality Optical Flats &amp; Spheres

Convergent Polishing is a novel polishing system and method for finishing flat and spherical glass optics in which a workpiece, independent of its initial shape (i.e., surface figure), will converge to final surface figure with excellent surface quality under a fixed, unchanging set of polishing parameters in a single polishing iteration. In contrast, conventional full aperture polishing methods require multiple, often long, iterative cycles involving polishing, metrology and process changes to achieve the desired surface figure. The Convergent Polishing process is based on the concept of workpiece-lap height mismatch resulting in pressure differential that decreases with removal and results in the workpiece converging to the shape of the lap. The successful implementation of the Convergent Polishing process is a result of the combination of a number of technologies to remove all sources of non-uniform spatial material removal (except for workpiece-lap mismatch) for surface figure convergence and to reduce the number of rogue particles in the system for low scratch densities and low roughness. The Convergent Polishing process has been demonstrated for the fabrication of both flats and spheres of various shapes, sizes, and aspect ratios on various glass materials. The practical impact is that high quality optical components can be fabricated more rapidly, more repeatedly, with less metrology, and with less labor, resulting in lower unit costs. In this study, the Convergent Polishing protocol is specifically described for fabricating 26.5 cm square fused silica flats from a fine ground surface to a polished ~&#955;/2 surface figure after polishing 4 hr per surface on a 81 cm diameter polisher.

A novel optical polishing process, called &#8220;Convergent Polishing&#8221;, which enables faster, lower cost polishing, is described. Unlike conventional polishing processes, Convergent Polishing allows a glass workpiece to be polished in a single iteration and with high surface quality to its final surface figure without requiring changes to polishing parameters.

收敛抛光：高品质光学平面与球的一种简单，快速，全口径抛光工艺

Convergent Polishing is a novel polishing system and method for finishing flat and spherical glass optics in which a workpiece, independent of its initial ...

Fabrication of High Contrast Gratings for the Spectrum Splitting Dispersive Element in a Concentrated Photovoltaic System

High contrast gratings are designed and fabricated and its application is proposed in a parallel spectrum splitting dispersive element that can improve the solar conversion efficiency of a concentrated photovoltaic system. The proposed system will also lower the solar cell cost in the concentrated photovoltaic system by replacing the expensive tandem solar cells with the cost-effective single junction solar cells. The structures and the parameters of high contrast gratings for the dispersive elements were numerically optimized. The large-area fabrication of high contrast gratings was experimentally demonstrated using nanoimprint lithography and dry etching. The quality of grating material and the performance of the fabricated device were both experimentally characterized. By analyzing the measurement results, the possible side effects from the fabrication processes are discussed and several methods that have the potential to improve the fabrication processes are proposed, which can help to increase the optical efficiency of the fabricated devices.

The fabrication of high contrast gratings as the parallel spectrum splitting dispersive element in a concentrated photovoltaic system is demonstrated. Fabrication processes including nanoimprint lithography, TiO2 sputtering and reactive ion etching are described. Reflectance measurement results are used to characterize the optical performance.

制造高对比度光栅的频谱分割色散元件的聚光光伏系统

High contrast gratings are designed and fabricated and its application is proposed in a parallel spectrum splitting dispersive element that can improve ...

The Evolution of Silica Nanoparticle-polyester Coatings on Surfaces Exposed to Sunlight

Corrosion of metallic surfaces is prevalent in the environment and is of great concern in many areas, including the military, transport, aviation, building and food industries, amongst others. Polyester and coatings containing both polyester and silica nanoparticles (SiO2NPs) have been widely used to protect steel substrata from corrosion. In this study, we utilized X-ray photoelectron spectroscopy, attenuated total reflection infrared micro-spectroscopy, water contact angle measurements, optical profiling and atomic force microscopy to provide an insight into how exposure to sunlight can cause changes in the micro- and nanoscale integrity of the coatings. No significant change in surface micro-topography was detected using optical profilometry, however, statistically significant nanoscale changes to the surface were detected using atomic force microscopy. Analysis of the X-ray photoelectron spectroscopy and attenuated total reflection infrared micro-spectroscopy data revealed that degradation of the ester groups had occurred through exposure to ultraviolet light to form COO&#903;, -H2C&#903;, -O&#903;, -CO&#903; radicals. During the degradation process, CO and CO2 were also produced.

Two types of surfaces, polyester-coated steel and polyester coated with a layer of silica nanoparticles, were studied. Both surfaces were exposed to sunlight, which was found to cause substantial changes in the chemistry and nanoscale topography of the surface.

表面上的纳米硅聚酯涂料暴露在阳光下的演变

Corrosion of metallic surfaces is prevalent in the environment and is of great concern in many areas, including the military, transport, aviation, ...

High Temperature Fabrication of Nanostructured Yttria-Stabilized-Zirconia (YSZ) Scaffolds by In Situ Carbon Templating Xerogels

We demonstrate a method for the high temperature fabrication of porous, nanostructured yttria-stabilized-zirconia (YSZ, 8 mol% yttria - 92 mol% zirconia) scaffolds with tunable specific surface areas up to 80 m2&#183;g-1. An aqueous solution of a zirconium salt, yttrium salt, and glucose is mixed with propylene oxide (PO) to form a gel. The gel is dried under ambient conditions to form a xerogel. The xerogel is pressed into pellets and then sintered in an argon atmosphere. During sintering, a YSZ ceramic phase forms and the organic components decompose, leaving behind amorphous carbon. The carbon formed in situ serves as a hard template, preserving a high surface area YSZ nanomorphology at sintering temperature. The carbon is subsequently removed by oxidation in air at low temperature, resulting in a porous, nanostructured YSZ scaffold. The concentration of the carbon template and the final scaffold surface area can be systematically tuned by varying the glucose concentration in the gel synthesis. The carbon template concentration was quantified using thermogravimetric analysis (TGA), the surface area and pore size distribution was determined by physical adsorption measurements, and the morphology was characterized using scanning electron microscopy (SEM). Phase purity and crystallite size was determined using X-ray diffraction (XRD). This fabrication approach provides a novel, flexible platform for realizing unprecedented scaffold surface areas and nanomorphologies for ceramic-based electrochemical energy conversion applications, e.g. solid oxide fuel cell (SOFC) electrodes.

High Temperature Fabrication of Nanostructured Yttria-Stabilized-Zirconia YSZ Scaffolds by In Situ Carbon Templating Xerogels

A protocol for fabricating porous, nanostructured yttria-stabilized-zirconia (YSZ) scaffolds at temperatures between 1,000 &#176;C and 1,400 &#176;C is presented.

通过纳米氧化钇稳定的二氧化锆（YSZ）的支架的高温加工<em&gt;原位</em&gt;碳模板干凝胶

We demonstrate a method for the high temperature fabrication of porous, nanostructured yttria-stabilized-zirconia (YSZ, 8 mol% yttria - 92 mol% zirconia) ...

Scalable Solution-processed Fabrication Strategy for High-performance, Flexible, Transparent Electrodes with Embedded Metal Mesh

Here, the authors report the embedded metal-mesh transparent electrode (EMTE), a new transparent electrode (TE) with a metal mesh completely embedded in a polymer film. This paper also presents a low-cost, vacuum-free fabrication method for this novel TE; the approach combines lithography, electroplating, and imprint transfer (LEIT) processing. The embedded nature of the EMTEs offers many advantages, such as high surface smoothness, which is essential for organic electronic device production; superior mechanical stability during bending; favorable resistance to chemicals and moisture; and strong adhesion with plastic film. LEIT fabrication features an electroplating process for vacuum-free metal deposition and is favorable for industrial mass production. Furthermore, LEIT allows for the fabrication of metal mesh with a high aspect ratio (i.e., thickness to linewidth), significantly enhancing its electrical conductance without adversely losing optical transmittance. We demonstrate several prototypes of flexible EMTEs, with sheet resistances lower than 1 &#937;/sq and transmittances greater than 90%, resulting in very high figures of merit (FoM) &#8211; up to 1.5 x 104 &#8211; which are amongst the best values in the published literature.

This protocol describes a solution-based fabrication strategy for high-performance, flexible, transparent electrodes with fully-embedded, thick metal mesh. Flexible transparent electrodes fabricated by this process demonstrate among the highest reported performances, including ultra-low sheet resistance, high optical transmittance, mechanical stability under bending, strong substrate adhesion, surface smoothness, and environmental stability.

具有嵌入式金属网的高性能，灵活，透明电极的可扩展解决方案处理制造策略

Here, the authors report the embedded metal-mesh transparent electrode (EMTE), a new transparent electrode (TE) with a metal mesh completely embedded in a ...

Fabrication of Ultra-thin Color Films with Highly Absorbing Media Using Oblique Angle Deposition

Ultra-thin film structures have been studied extensively for use as optical coatings, but performance and fabrication challenges remain.&#160; We present an advanced method for fabricating ultra-thin color films with improved characteristics. The proposed process addresses several fabrication issues, including large area processing. Specifically, the protocol describes a process for fabricating ultra-thin color films using an electron beam evaporator for oblique angle deposition of germanium (Ge) and gold (Au) on silicon (Si) substrates.&#160; Film porosity produced by the oblique angle deposition induces color changes in the ultra-thin film. The degree of color change depends on factors such as deposition angle and film thickness. Fabricated samples of the ultra-thin color films showed improved color tunability and color purity. In addition, the measured reflectance of the fabricated samples was converted into chromatic values and analyzed in terms of color. Our ultra-thin film fabricating method is expected to be used for various ultra-thin film applications such as flexible color electrodes, thin film solar cells, and optical filters. Also, the process developed here for analyzing the color of the fabricated samples is broadly useful for studying various color structures.

We present a detailed method for fabricating ultra-thin color films with improved characteristics for optical coatings. The oblique angle deposition technique using an electron beam evaporator allows improved color tunability and purity. Fabricated films of Ge and Au on Si substrates were analyzed by reflectance measurements and color information conversion.

用斜角沉积法制备高吸收介质的超薄彩色薄膜

Ultra-thin film structures have been studied extensively for use as optical coatings, but performance and fabrication challenges remain.&#160; We present ...

Flow-assisted Dielectrophoresis: A Low Cost Method for the Fabrication of High Performance Solution-processable Nanowire Devices

Flow-assisted dielectrophoresis (DEP) is an efficient self-assembly method for the controllable and reproducible positioning, alignment, and selection of nanowires. DEP is used for nanowire analysis, characterization, and for solution-based fabrication of semiconducting devices. The method works by applying an alternating electric field between metallic electrodes. The nanowire formulation is then dropped onto the electrodes which are on an inclined surface to create a flow of the formulation using gravity. The nanowires then align along the gradient of the electric field and in the direction of the liquid flow. The frequency of the field can be adjusted to select nanowires with superior conductivity and lower trap density. 
In this work, flow-assisted DEP is used to create nanowire field effect transistors. Flow-assisted DEP has several advantages: it allows selection of nanowire electrical properties; control of nanowire length; placement of nanowires in specific areas; control of orientation of nanowires; and control of nanowire density in the device. 
The technique can be expanded to many other applications such as gas sensors and microwave switches. The technique is efficient, quick, reproducible, and it uses a minimal amount of dilute solution making it ideal for the testing of novel nanomaterials. Wafer scale assembly of nanowire devices can also be achieved using this technique, allowing large numbers of samples for testing and large-area electronic applications.

In this paper, flow assisted dielectrophoresis is demonstrated for the self-assembly of nanowire devices. The fabrication of a silicon nanowire field effect transistor is shown as an example.

流动辅助介: 一种低成本的制备高性能溶液可纳米线器件的方法

Flow-assisted dielectrophoresis (DEP) is an efficient self-assembly method for the controllable and reproducible positioning, alignment, and selection of ...

Determination of Aggregate Surface Morphology at the Interfacial Transition Zone (ITZ)

Here, we present a comprehensive method to illustrate the uneven distribution of the interfacial transition zone (ITZ) around the aggregate and the effect of aggregate surface morphology on the formation of ITZ. First, a model concrete sample is prepared with a spherical ceramic particle in roughly the central part of the cement matrix, acting as a coarse aggregate used in common concrete/mortar. After curing until the designed age, the sample is scanned by X-ray computed tomography to determine the relative location of the ceramic particle inside the cement matrix. Three locations of the ITZ are chosen: above the aggregate, on the side of the aggregate, and below the aggregate. After a series of treatments, the samples are scanned with a SEM-BSE detector. The resultant images were further processed using a digital image processing method (DIP) to obtain quantitative characteristics of the ITZ. The surface morphology is characterized at the pixel level based on the digital image. Thereafter, K-means clustering method is used to illustrate the effect of surface roughness on ITZ formation.

Determination of Aggregate Surface Morphology at the Interfacial Transition Zone ITZ

Hereby, we proposed a protocol to illustrate the effect of aggregate surface morphology on the ITZ microstructure. The SEM-BSE image were quantitatively analyzed to obtain ITZ's porosity gradient via digital image processing and a K-means clustering algorithm was further employed to establish a relationship between porosity gradient and surface roughness.

在界面过渡区（ITZ）的聚合曲面形态测定

Here, we present a comprehensive method to illustrate the uneven distribution of the interfacial transition zone (ITZ) around the aggregate and the effect ...