这项研究是在太平洋西北国家实验室 (4500亿) 进行的, 这是由能源部巴特尔纪念研究所根据合同 No. 管理的。DE-AC05-76RL01830作者衷心感谢美国国务院通过机构间协议 SIAA15AVCVPO10 的关键核查资产基金 (V 基金) 的支持。

1. 材料准备 <ol> <li> 将数 2 in. 硅晶片放入石英载体中, 用于清洗并将硅片放入等离子蚀刻系统中。抽真空室直到它达到至少 75 mTorr。这可能需要几分钟的时间. </li>
	<li> 开始流的 O 2 (30 sccm) 气体, 并允许压力稳定。将蚀刻时间设置为15分钟。一旦室压力已稳定启动射频 (RF) 13.56 兆赫 250 W 等离子体. 
	注: 这一步清洗任何有机污染物的硅片和 functionalizes 表面与羟基 (-OH) 基从而确保亲水性表面. </li>
	<li> 在等待等离子清洗步骤完成时, 从冰箱中取出商业购买的聚苯乙烯纳米 (170 nm 直径、10% 固体、0.5% 十二烷基硫酸钠) (4 和 #176; C)。允许容器加热到室温. </li>
	<li> 短暂涡旋 (1 分钟) 和几种 (35 赫, 1 分钟) 聚苯乙烯纳米, 以尽量减少纳米团聚. </li>
	<li> 进入一个干净的玻璃瓶, 测量1.0 毫升的 170 nm 聚苯乙烯纳米和添加1.0 毫升 H 2 O 获得一个5% 固体胶体悬浮. </li>
	<li> 15 分钟后, 停止 O 2 的流量 , 排出真空室, 并卸下刚清洗过的晶片. </li>
</ol> 2。聚苯乙烯纳米模板的自旋涂层 <ol> <li> 从等离子蚀刻中卸下已清洗的硅片。然后将2的晶片贴在旋转涂布机上。确保它是正确的中心, O 形环是明确的任何碎片。启动真空, 确保晶片牢固地附着在舞台上. </li>
	<li> 设置自旋涂布机的自旋参数。这些参数根据纳米大小的不同而有所不同。对于 5% 170 nm 纳米的解决方案, 将自旋涂布机设置为1步过程, 自旋时间为1分钟, 速度为 3000 rpm, 加速度为 2000 rpm/秒. </li>
	<li> 使用一次性注射器, 从瓶子中提取1毫升的胶体悬浮液。把瓶子放一边采取5和 #181; m 注射器过滤器并且安置它在注射器的末端。按住注射器直到一滴悬浮液清除笔尖。过滤器消除了不良的骨料和微粒, 可以显著降低胶片质量. </li>
	<li> 将足够的悬浮液直接放置在晶片的中心, 这样大约2/3 的表面被覆盖。尽量减少气泡, 因为这些会影响胶片质量。关闭旋转式涂布机盖, 然后按开始。在这一过程中, 可能会看到薄膜对晶片表面的干涉效应纳米组装。这将根据纳米直径的不同而有所不同. </li>
	<li> 在停用真空后卸下自旋涂层晶片。擦拭的碗和盖子的旋转涂布机, 以消除过剩的纳米. </li>
</ol> 3。蚀刻的胶片质量评定和准备工作 <ol> <li> 通过寻找明显的缺陷 (如在自旋涂层过程中可能由微粒引起的条纹或孔), 直观地评估自行组装薄膜的质量. </li>
	<li> 通过在光学显微镜下放置晶片来评估胶片质量。晶粒边界和一些缺陷是正常的。如果晶片有较大的未涂布区域或明显的多层膜, 则需要调整自旋参数以获得更均匀的薄膜。电子显微镜也可以用来评估胶片的质量. </li>
	<li> 使用20X 物镜将光源打开到显微镜上并聚焦到硅片表面。评估在整个晶片的几个点的质量, 以确保均匀. </li>
	<li> 最后的胶片质量检查是使用扫描电子显微镜 (SEM) 在纳米尺度上对纳米自组装进行可视化。利用这种技术, 可以相对快速地对晶片的小部分进行多层、孔洞和晶界/缺陷的评估. </li>
	<li> 一旦获得足够的胶片, 将晶片放入烤箱 (107 和 #176; C) 中2分钟以退火自组装纳米。这有助于鼓励对基体的附着力, 并在蚀刻后产生更好的 nanopatterned 表面. </li>
</ol> 4。蚀刻、金属沉积和光学特性 <ol> <li> 将退火的晶圆加载到等离子体蚀刻中, 并启动泵浦过程. </li>
	<li> 一旦真空室达到至少 75 mTorr, 开始 O 2 (20 sccm) 气体的流量, 等待压力稳定。启动 RF 等离子 (75 W) 的 165s. </li>
	<li> 一旦射频等离子体循环完成, 停止 O 2 的流量 并将腔室排出. </li>
	<li> 基体现在被蚀刻并准备金属沉积。将样品输送到溅射涂布机, 并沉积一层薄薄的 (20 纳米) 金。不同的沉积角度可以用来改变 nanocups 的光学性质。在这种情况下, 金属沉积通常发生在基板上进行. </li>
	<li> 金属沉积后, 基体可以用光学光谱学进行表征。将 microspectrophotometer 聚焦到金属化基体表面, 测量反射光谱。对于170纳米蚀刻纳米阵列, LSPR 是在 615 nm. </li>
	<li> 使用压敏胶带, 轻轻地将胶片与承印物接触。它可能是必要的, 以消除任何气泡, 形成在接口使用镊子. </li>
	<li> 当磁带与基板接触后, 磁带可能会立即剥离, 以从基板表面卸下 nanocups。轻轻剥去胶带, 结果是一个灵活的和保形膜的黄金 nanocups. </li>
</ol>

<ol>
	<li>Fang, Y., Sun, M. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Nanoplasmonic+waveguides:+towards+applications+in+integrated+nanophotonic+circuits.">Nanoplasmonic waveguides: towards applications in integrated nanophotonic circuits.</a> Light Sci Appl. 4, e294 (2015).</li><li>Li, J. F., Anema, J. R., Wandlowski, T., Tian, Z. Q. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Dielectric+shell+isolated+and+graphene+shell+isolated+nanoparticle+enhanced+Raman+spectroscopies+and+their+applications.">Dielectric shell isolated and graphene shell isolated nanoparticle enhanced Raman spectroscopies and their applications.</a> Chemical Society Reviews. 44 (23), 8399-8409 (2015).</li><li>Wang, L., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Large+Area+Plasmonic+Color+Palettes+with+Expanded+Gamut+Using+Colloidal+Self-Assembly.">Large Area Plasmonic Color Palettes with Expanded Gamut Using Colloidal Self-Assembly.</a> ACS Photonics. , (2016).</li><li>Taylor, A. B., Michaux, P., Mohsin, A. S. M., Chon, J. W. M. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Electron-beam+lithography+of+plasmonic+nanorod+arrays+for+multilayered+optical+storage.">Electron-beam lithography of plasmonic nanorod arrays for multilayered optical storage.</a> Optics Express. 22 (11), 13234-13243 (2014).</li><li>Endo, H., Mochizuki, Y., Tamura, M., Kawai, T. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Fabrication+and+Functionalization+of+Periodically+Aligned+Metallic+Nanocup+Arrays+Using+Colloidal+Lithography+with+a+Sinusoidally+Wrinkled+Substrate.">Fabrication and Functionalization of Periodically Aligned Metallic Nanocup Arrays Using Colloidal Lithography with a Sinusoidally Wrinkled Substrate.</a> Langmuir. 29 (48), 15058-15064 (2013).</li><li>Wang, H., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Symmetry+breaking+in+individual+plasmonic+nanoparticles.">Symmetry breaking in individual plasmonic nanoparticles.</a> Proceedings of the National Academy of Sciences. 103 (29), 10856-10860 (2006).</li><li>Wollet, L., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Plasmon+hybridization+in+stacked+metallic+nanocups.">Plasmon hybridization in stacked metallic nanocups.</a> Optical Materials Express. 2 (10), 1384-1390 (2012).</li><li>Duempelmann, L., Casari, D., Luu-Dinh, A., Gallinet, B., Novotny, L. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Color+Rendering+Plasmonic+Aluminum+Substrates+with+Angular+Symmetry+Breaking.">Color Rendering Plasmonic Aluminum Substrates with Angular Symmetry Breaking.</a> ACS Nano. 9 (12), 12383-12391 (2015).</li><li>King, N. S., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Angle-+and+Spectral-Dependent+Light+Scattering+from+Plasmonic+Nanocups.">Angle- and Spectral-Dependent Light Scattering from Plasmonic Nanocups.</a> ACS Nano. 5 (9), 7254-7262 (2011).</li><li>Mirin, N. A., Halas, N. J. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Light-Bending+Nanoparticles.">Light-Bending Nanoparticles.</a> Nano Letters. 9 (3), 1255-1259 (2009).</li><li>Eggleston, M. S., Messer, K., Zhang, L., Yablonovitch, E., Wu, M. C. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Optical+antenna+enhanced+spontaneous+emission.">Optical antenna enhanced spontaneous emission.</a> Proceedings of the National Academy of Sciences. 112 (6), 1704-1709 (2015).</li><li>Bora, M., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Plasmonic+black+metals+in+resonant+nanocavities.">Plasmonic black metals in resonant nanocavities.</a> Applied Physics Letters. 102 (25), 251105 (2013).</li><li>Akselrod, G. M., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Efficient+Nanosecond+Photoluminescence+from+Infrared+PbS+Quantum+Dots+Coupled+to+Plasmonic+Nanoantennas.">Efficient Nanosecond Photoluminescence from Infrared PbS Quantum Dots Coupled to Plasmonic Nanoantennas.</a> ACS Photonics. , (2016).</li></ol>

作者没有什么可透露的。

该协议演示了一种低成本、高效率的浆金 nanocups 周期阵列制作技术。这种技术是特别有利的, 因为它避免了串行自上而下的过程, 如电子束光刻或聚焦离子束铣削。所提出的技术表明, 商业可用的聚合物纳米可以直接自组装的方式作为一个纳米模板的进一步处理。
修改和故障排除:
如果胶片质量较差, 可能需要预纳米溶液。在这里, 我们使用了5...

电的出现与改进的纳米和合成技术一起带来了各种各样的令人兴奋的技术, 如 sub-diffraction 有限的迂回, 增强化学检测和光学传感1 ,2,3。在本协议中, 我们展示了一个可伸缩的和相对低成本的技术, 能够制造 nanopatterned 浆基板使用商业可用的聚合物纳米和蚀刻步骤后, 金属沉积。不像其他制造 nanopatterned 基板的技术, 如电子束光刻机4, 这种技术可以快速有效地扩展到300毫米的硅片, 并以最小的努力, 并使用转移步骤产生灵活和保形薄膜5。
自罗马时代以来, 我们就已经知道, 某些金属, 如金和银, 可以有灿烂的光学性能, 当他们细分化。今天, 我们了解到这些金属粒子在其尺寸接近纳米尺度时表现出一种叫做 "局部表面等离子体共振" (LSPR) 的效应。LSPR 类似于一个驻波, 在金属中发现的弱束缚电子在特定频率的光照亮金属粒子的时候, 会有连贯的振荡。各向异性纳米结构的特殊利益, 因为独特的光学共振可以出现, 由于对称打破6,7,8。
光半 (nanocup) 结构的光照可以激发电偶极子或磁偶极子等离子体模式, 这取决于金属的沉积角度、基体相对入射光的取向以及入射光的偏振度9。Nanocups 通常被认为类似于三维分裂环形谐振器, 其中谐振频率可以近似为 LC 振荡器10,11。谐振频率为聚合物纳米的大小这里使用 (170 毫微米), 沉积的金子的数量 (20 毫微米) 和蚀刻率产生共振频率横跨可见光和接近 IR。
金 nanocups 的光学性能可以通过透射或反射来测量, 这取决于用于自旋涂层的基底。在所提出的协议, 我们选择使用2在. 硅晶片作为基板和执行反射测量后, 金属沉积。测量是使用显微镜耦合的色散光谱仪与卤素光源。我们也成功地使用玻璃基板, 允许在金属沉积后立即进行透射和反射测量。此外, 该技术可以很容易地进行缩放, 并且不限于2。由于高品质单分散聚合物纳米的广泛商业可用性, 简单地从不同大小的纳米开始调整这些结构的光学特性是直接的。
在本协议中, 使用一种称为胶体光刻的方法来制造各向异性半 (或 nanocup) 金纳米结构的技术。胶体光刻采用高度单分散聚合物纳米的自组装, 以快速模式的基板, 可以进一步加工成一个浆基板后溅射涂层一薄层的黄金。同样, 通过在金属沉积过程中倾斜样品基体, 可以调节基体的各向异性。由于所形成的纳米结构的各向异性, 因此产生的构造是极化敏感的。在这里, 我们演示一个特殊的情况, 并进行光学表征和剥离, 以转移到一个透明的, 灵活的薄膜结构。

<table border="0" cellpadding="0" cellspacing="0" width="762">
	<tbody>
		<tr height="43">
			<td height="43" style="height:43px;width:204px;">Polystyrene microspheres</td>
			<td style="width:152px;">Bangs Laboratories, Inc.</td>
			<td style="width:209px;">PS02N</td>
			<td style="width:197px;">170 nm &#8211; 580 nm diameter</td>
		</tr>
		<tr height="43">
			<td height="43" style="height:43px;width:204px;">Silicon wafers</td>
			<td style="width:152px;">El-CAT, Inc.</td>
			<td style="width:209px;">3489</td>
			<td style="width:197px;">300 mm thick, one side polished [100]</td>
		</tr>
		<tr height="22">
			<td height="22" style="height:22px;width:204px;">Adhesive tape</td>
			<td style="width:152px;">3M</td>
			<td style="width:209px;">Scotch 600</td>
			<td style="width:197px;"></td>
		</tr>
		<tr height="22">
			<td height="22" style="height:22px;width:204px;">Spin coater</td>
			<td style="width:152px;">Laurell</td>
			<td style="width:209px;">WS-650-23B</td>
			<td style="width:197px;"></td>
		</tr>
		<tr height="22">
			<td height="22" style="height:22px;width:204px;">Plasma etcher</td>
			<td style="width:152px;">Nordson March&#160;</td>
			<td style="width:209px;">AP-600</td>
			<td style="width:197px;"></td>
		</tr>
		<tr height="22">
			<td height="22" style="height:22px;width:204px;">Microspectrophotometer</td>
			<td style="width:152px;">CRAIC</td>
			<td style="width:209px;">380-PV</td>
			<td style="width:197px;"></td>
		</tr>
		<tr height="22">
			<td height="22" style="height:22px;width:204px;">Sonicator</td>
			<td style="width:152px;">VWR</td>
			<td style="width:209px;">97043-932</td>
			<td style="width:197px;"></td>
		</tr>
		<tr height="22">
			<td height="22" style="height:22px;width:204px;">Scintillation vials</td>
			<td style="width:152px;">Wheaton</td>
			<td style="width:209px;">986734</td>
			<td style="width:197px;"></td>
		</tr>
		<tr height="22">
			<td height="22" style="height:22px;width:204px;">5 um syringe filter</td>
			<td>Millex</td>
			<td>SLSV025LS</td>
			<td></td>
		</tr>
		<tr height="22">
			<td height="22" style="height:22px;width:204px;">Oxygen gas</td>
			<td>Oxarc</td>
			<td>PO249&#160;</td>
			<td>Industrial Grade 99.5% purity</td>
		</tr>
		<tr height="22">
			<td height="22" style="height:22px;width:204px;">Vaccum pump</td>
			<td>Kurt J. Lesker</td>
			<td>Edwards 28</td>
			<td></td>
		</tr>
		<tr height="22">
			<td height="22" style="height:22px;">Disposable syringes</td>
			<td>Air Tite Products Co.</td>
			<td>14-817-25</td>
			<td>1 mL capacity</td>
		</tr>
		<tr height="22">
			<td height="22" style="height:22px;width:204px;">Water</td>
			<td>Sigma-Aldrich</td>
			<td>W4502</td>
			<td></td>
		</tr>
	</tbody>
</table>

fabrication of periodic gold nanocup arrays using colloidal lithography

近年来, 随着研究人员展示了与化学和光学相关的令人兴奋的应用与新的纳米技术相结合, 电的领域发生了爆炸。等离子体是电荷密度振荡的量子, 它借给纳米金属, 如金和银独特的光学特性。特别是, 金和银纳米粒子表现出局部表面等离子体共振-集体电荷密度振荡的表面 nanoparticle-in 的可见光谱。在这里, 我们专注于制作的各向异性浆纳米结构的周期阵列。这些半 (或 nanocup) 结构可以表现出额外的独特的 light-bending 和偏振相关的光学性质, 简单的各向同性纳米材料不能。研究人员对 nanocups 的周期性阵列的制作有兴趣, 例如低成本光学器件、表面增强拉曼散射和篡改指示等。我们提出了一个可伸缩的技术, 基于胶体光刻, 它可以很容易地制造大周期阵列的 nanocups 使用自旋涂层和自行组装商业可用的聚合物纳米。电子显微镜和光学光谱学从可见光到近红外线 (近红外) 进行, 以确认成功的 nanocup 制造。最后, 我们演示了 nanocups 转移到一个灵活的, 保形胶膜。

用 170 nm 直径的聚苯乙烯纳米制备了金 nanocups。退火后2分钟, 在107° c 和蚀刻与 75 W, 20 sccm O2等离子体为 165s, 产生的薄膜的特点是使用 SEM (图 1)。为了评估自旋浇铸薄膜的质量, 可使用光学 microscopy-in 除目视检查外 (图 2)。高质量的电影应该基本上没有瑕疵。即使在高品质的薄膜中, 晶界通常也会被观察到, 但要仔细注意?...

Watch this Scientific Journal Video about Fabrication of Periodic Gold Nanocup Arrays Using Colloidal Lithography at JoVE.com

Fabrication of Periodic Gold Nanocup Arrays Using Colloidal Lithography

我们用胶体光刻技术演示了周期性金 nanocup 阵列的制作, 并讨论了 nanoplasmonic 薄膜的重要性。

用胶体光刻制备周期性金 Nanocup 阵列

Within recent years, the field of plasmonics has exploded as researchers have demonstrated exciting applications related to chemical and optical sensing ...

fabrication-periodic-gold-nanocup-arrays-using-colloidal

Research

JoVE Journal

Engineering

7.1K 次观看.  Energy and Environment Directorate. 我们用胶体光刻技术演示了周期性金 nanocup 阵列的制作, 并讨论了 nanoplasmonic 薄膜的重要性。

视频: Fabrication of Periodic Gold Nanocup Arrays Using Colloidal Lithography

Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates

Conducting polymers have attracted great attention since the discovery of high conductivity in doped polyacetylene in 19771. They offer the advantages of low weight, easy tailoring of properties and a wide spectrum of applications2,3. Due to sensitivity of conducting polymers to environmental conditions (e.g., air, oxygen, moisture, high temperature and chemical solutions), lithographic techniques present significant technical challenges when working with these materials4. For example, current photolithographic methods, such as ultra-violet (UV), are unsuitable for patterning the conducting polymers due to the involvement of wet and/or dry etching processes in these methods. In addition, current micro/nanosystems mainly have a planar form5,6. One layer of structures is built on the top surfaces of another layer of fabricated features. Multiple layers of these structures are stacked together to form numerous devices on a common substrate. The sidewall surfaces of the microstructures have not been used in constructing devices. On the other hand, sidewall patterns could be used, for example, to build 3-D circuits, modify fluidic channels and direct horizontal growth of nanowires and nanotubes.
A macropunching method has been applied in the manufacturing industry to create macropatterns in a sheet metal for over a hundred years. Motivated by this approach, we have developed a micropunching lithography method (MPL) to overcome the obstacles of patterning conducting polymers and generating sidewall patterns. Like the macropunching method, the MPL also includes two operations (Fig. 1): (i) cutting; and (ii) drawing. The "cutting" operation was applied to pattern three conducting polymers4, polypyrrole (PPy), Poly(3,4-ethylenedioxythiophen)-poly(4-styrenesulphonate) (PEDOT) and polyaniline (PANI). It was also employed to create Al microstructures7. The fabricated microstructures of conducting polymers have been used as humidity8, chemical8, and glucose sensors9. Combined microstructures of Al and conducting polymers have been employed to fabricate capacitors and various heterojunctions9,10,11. The "cutting" operation was also applied to generate submicron-patterns, such as 100- and 500-nm-wide PPy lines as well as 100-nm-wide Au wires. The "drawing" operation was employed for two applications: (i) produce Au sidewall patterns on high density polyethylene (HDPE) channels which could be used for building 3D microsystems12,13,14, and (ii) fabricate polydimethylsiloxane (PDMS) micropillars on HDPE substrates to increase the contact angle of the channel15.

A micropunching lithography approach is developed to generate micro- and submicron-patterns on top, sidewall and bottom surfaces of polymer substrates. It overcomes the obstacles of patterning conducting polymers and generating sidewall patterns. This method allows rapid fabrication of multiple features and is free of aggressive chemistry.

Micropunching为微型和亚微米模式聚合物基板上生成的光刻

Conducting polymers have attracted great attention since the discovery of high conductivity in doped polyacetylene in 19771. They offer the advantages of ...

科研

工程学

Fabrication of Spatially Confined Complex Oxides

Complex materials such as high Tc superconductors, multiferroics, and colossal magnetoresistors have electronic and magnetic properties that arise from the inherent strong electron correlations that reside within them. These materials can also possess electronic phase separation in which regions of vastly different resistive and magnetic behavior can coexist within a single crystal alloy material. By reducing the scale of these materials to length scales at and below the inherent size of the electronic domains, novel behaviors can be exposed. Because of this and the fact that spin-charge-lattice-orbital order parameters each involve correlation lengths, spatially reducing these materials for transport measurements is a critical step in understanding the fundamental physics that drives complex behaviors. These materials also offer great potential to become the next generation of electronic devices 1-3. Thus, the fabrication of low dimensional nano- or micro-structures is extremely important to achieve new functionality. This involves multiple controllable processes from high quality thin film growth to accurate electronic property characterization. Here, we present fabrication protocols of high quality microstructures for complex oxide manganite devices. Detailed descriptions and required equipment of thin film growth, photo-lithography, and wire-bonding are presented.

We describe the use of pulsed laser deposition (PLD), photolithography and wire-bonding techniques to create micrometer scale complex oxides devices. The PLD is utilized to grow epitaxial thin films. Photolithography and wire-bonding techniques are introduced to create practical devices for measurement purposes.

空间密闭的复合氧化物制备

Complex materials such as high Tc superconductors, multiferroics, and colossal magnetoresistors have electronic and magnetic properties that arise from ...

Fabrication and Testing of Microfluidic Optomechanical Oscillators

Cavity optomechanics experiments that parametrically couple the phonon modes and photon modes have been investigated in various optical systems including microresonators. However, because of the increased acoustic radiative losses during direct liquid immersion of optomechanical devices, almost all published optomechanical experiments have been performed in solid phase. This paper discusses a recently introduced hollow microfluidic optomechanical resonator. Detailed methodology is provided to fabricate these ultra-high-Q microfluidic resonators, perform optomechanical testing, and measure radiation pressure-driven breathing mode and SBS-driven whispering gallery mode parametric vibrations. By confining liquids inside the capillary resonator, high mechanical- and optical- quality factors are simultaneously maintained.

Parametric optomechanical excitations have recently been experimentally demonstrated in microfluidic optomechanical resonators by means of optical radiation pressure and stimulated Brillouin scattering. This paper describes the fabrication of these microfluidic resonators along with methodologies for generating and verifying optomechanical oscillations.

制造和微流控光机振荡器测试

Cavity optomechanics experiments that parametrically couple the phonon modes and photon modes have been investigated in various optical systems including ...

Atomically Traceable Nanostructure Fabrication

Reducing the scale of etched nanostructures below the 10 nm range eventually will require an atomic scale understanding of the entire fabrication process being used in order to maintain exquisite control over both feature size and feature density. Here, we demonstrate a method for tracking atomically resolved and controlled structures from initial template definition through final nanostructure metrology, opening up a pathway for top-down atomic control over nanofabrication. Hydrogen depassivation lithography is the first step of the nanoscale fabrication process followed by selective atomic layer deposition of up to 2.8 nm of titania to make a nanoscale etch mask. Contrast with the background is shown, indicating different mechanisms for growth on the desired patterns and on the H passivated background. The patterns are then transferred into the bulk using reactive ion etching to form 20 nm tall nanostructures with linewidths down to ~6 nm. To illustrate the limitations of this process, arrays of holes and lines are fabricated. The various nanofabrication process steps are performed at disparate locations, so process integration is discussed. Related issues are discussed including using fiducial marks for finding nanostructures on a macroscopic sample and protecting the chemically reactive patterned Si(100)-H surface against degradation due to atmospheric exposure.

We report a protocol for combining the atomic metrology of the Scanning Tunneling Microscope for surface patterning with selective Atomic Layer Deposition and Reactive Ion Etching. Using a robust process involving numerous atmospheric exposures and transport, 3D nanostructures with atomic metrology are fabricated.

原子纳米结构可追溯制造

Reducing the scale of etched nanostructures below the 10 nm range eventually will require an atomic scale understanding of the entire fabrication process ...

Indirect Fabrication of Lattice Metals with Thin Sections Using Centrifugal Casting

One of the typical methods to manufacture 3D lattice metals is the direct-metal additive manufacturing (AM) process such as Selective Laser Melting (SLM) and Electron Beam Melting (EBM). In spite of its potential processing capability, the direct AM method has several disadvantages such as high cost, poor surface finish of final products, limitation in material selection, high thermal stress, and anisotropic properties of parts. We propose a cost-effective method to manufacture 3D lattice metals. The objective of this study is to provide a detailed protocol on fabrication of 3D lattice metals having a complex shape and a thin wall thickness; e.g., octet truss made of Al and Cu alloys having a unit cell length of 5 mm and a cell wall thickness of 0.5 mm. An overall experimental procedure is divided into eight sections: (a) 3D printing of sacrificial patterns (b) melt-out of support materials (c) removal of residue of support materials (d) pattern assembly (e) investment (f) burn-out of sacrificial patterns (g) centrifugal casting (h) post-processing for final products. The suggested indirect AM technique provides the potential to manufacture ultra-lightweight lattice metals; e.g., lattice structures with Al alloys. It appears that the process parameters should be properly controlled depending on materials and lattice geometry, observing the final products of octet truss metals by the indirect AM technique.

An indirect additive manufacturing method combining a 3D printing of polymers with a centrifugal casting is outlined for manufacturing 3D octet truss metals (Al and Cu alloys) having a unit cell length of 5 mm with a wall thickness of 0.5 mm.

与超薄切片格金属制造间接使用离心铸造

One of the typical methods to manufacture 3D lattice metals is the direct-metal additive manufacturing (AM) process such as Selective Laser Melting (SLM) ...

Fabrication and Characterization of Superconducting Resonators

Superconducting microwave resonators are of interest for a wide range of applications, including for their use as microwave kinetic inductance detectors (MKIDs) for the detection of faint astrophysical signatures, as well as for quantum computing applications and materials characterization. In this paper, procedures are presented for the fabrication and characterization of thin-film superconducting microwave resonators. The fabrication methodology allows for the realization of superconducting transmission-line resonators with features on both sides of an atomically smooth single-crystal silicon dielectric. This work describes the procedure for the installation of resonator devices into a cryogenic microwave testbed and for cool-down below the superconducting transition temperature. The set-up of the cryogenic microwave testbed allows one to do careful measurements of the complex microwave transmission of these resonator devices, enabling the extraction of the properties of the superconducting lines and dielectric substrate (e.g., internal quality factors, loss and kinetic inductance fractions), which are important for device design and performance.

Superconducting microwave resonators are of interest for detection of light, quantum computing applications and materials characterization. This work presents a detailed procedure for fabrication and characterization of superconducting microwave resonator scattering parameters.

制备与表征超导谐振器的

Superconducting microwave resonators are of interest for a wide range of applications, including for their use as microwave kinetic inductance detectors ...

Colloidal Synthesis of Nanopatch Antennas for Applications in Plasmonics and Nanophotonics

We present a method for colloidal synthesis of silver nanocubes and the use of these in combination with a smooth gold film, to fabricate plasmonic nanoscale patch antennas. This includes a detailed procedure for the fabrication of thin films with a well-controlled thickness over macroscopic areas using layer-by-layer deposition of polyelectrolyte polymers, namely poly(allylamine) hydrochloride (PAH) and polystyrene sulfonate (PSS). These polyelectrolyte spacer layers serve as a dielectric gap in between silver nanocubes and a gold film. By controlling the size of the nanocubes or the gap thickness, the plasmon resonance can be tuned from about 500 nm to 700 nm. Next, we demonstrate how to incorporate organic sulfo-cyanine5 carboxylic acid (Cy5) dye molecules into the dielectric polymer gap region of the nanopatch antennas. Finally, we show greatly enhanced fluorescence of the Cy5 dyes by spectrally matching the plasmon resonance with the excitation energy and the Cy5 absorption peak. The method presented here enables the fabrication of plasmonic nanopatch antennas with well-controlled dimensions utilizing colloidal synthesis and a layer-by-layer dip-coating process with the potential for low cost and large-scale production. These nanopatch antennas hold great promise for practical applications, for example in sensing, ultrafast optoelectronic devices and for high-efficiency photodetectors.

A protocol for the colloidal synthesis of silver nanocubes and fabrication of plasmonic nanoscale patch antennas with sub-10 nm gaps is presented.

在等离子体激元和纳米光子学应用Nanopatch天线的合成胶体

We present a method for colloidal synthesis of silver nanocubes and the use of these in combination with a smooth gold film, to fabricate plasmonic ...

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Nano-patterns fabricated with extreme ultraviolet (EUV) or electron-beam (E-beam) lithography exhibit unexpected variations in size. This variation has been attributed to statistical fluctuations in the number of photons/electrons arriving at a given nano-region arising from shot-noise (SN). The SN varies inversely to the square root of a number of photons/electrons. For a fixed dosage, the SN is larger in EUV and E-beam lithographies than for traditional (193 nm) optical lithography. Bottom-up and top-down patterning approaches are combined to minimize the effects of shot noise in nano-hole patterning. Specifically, an amino-silane surfactant self-assembles on a silicon wafer that is subsequently spin-coated with a 100 nm film of a PMMA-based E-beam photoresist. Exposure to the E-beam and the subsequent development uncover the underlying surfactant film at the bottoms of the holes. Dipping the wafer in a suspension of negatively charged, citrate-capped, 20 nm gold nanoparticles (GNP) deposits one particle per hole. The exposed positively charged surfactant film in the hole electrostatically funnels the negatively charged nanoparticle to the center of an exposed hole, which permanently fixes the positional registry. Next, by heating near the glass transition temperature of the photoresist polymer, the photoresist film reflows and engulfs the nanoparticles. This process erases the holes affected by SN but leaves the deposited GNPs locked in place by strong electrostatic binding. Treatment with oxygen plasma exposes the GNPs by etching a thin layer of the photoresist. Wet-etching the exposed GNPs with a solution of I2/KI yields uniform holes located at the center of indentations patterned by E-beam lithography. The experiments presented show that the approach reduces the variation in the size of the holes caused by SN from 35% to below 10%. The method extends the patterning limits of transistor contact holes to below 20 nm.

Uniformly sized nanoparticles can remove fluctuations in contact hole dimensions patterned in poly(methyl methacrylate) (PMMA) photoresist films by electron beam (E-beam) lithography. The process involves electrostatic funneling to center and deposit nanoparticles in contact holes, followed by photoresist reflow and plasma- and wet-etching steps.

牺牲纳米颗粒使用删除散粒噪声的影响通过电子束光刻装配式接触孔

Nano-patterns fabricated with extreme ultraviolet (EUV) or electron-beam (E-beam) lithography exhibit unexpected variations in size. This variation has ...

Fabrication of 1-D Photonic Crystal Cavity on a Nanofiber Using Femtosecond Laser-induced Ablation

We present a protocol for fabricating 1-D Photonic Crystal (PhC) cavities on subwavelength-diameter tapered optical fibers, optical nanofibers, using femtosecond laser-induced ablation. We show that thousands of periodic nano-craters are fabricated on an optical nanofiber by irradiating with just a single femtosecond laser pulse. For a typical sample, periodic nano-craters with a period of 350 nm and with diameter gradually varying from 50 - 250 nm over a length of 1 mm are fabricated on a nanofiber with diameter around 450 - 550 nm. A key aspect of such a nanofabrication is that the nanofiber itself acts as a cylindrical lens and focuses the femtosecond laser beam on its shadow surface. Moreover, the single-shot fabrication makes it immune to mechanical instabilities and other fabrication imperfections. Such periodic nano-craters on nanofiber, act as a 1-D PhC and enable strong and broadband reflection while maintaining the high transmission out of the stopband. We also present a method to control the profile of the nano-crater array to fabricate apodized and defect-induced PhC cavities on the nanofiber. The strong confinement of the field, both transverse and longitudinal, in the nanofiber-based PhC cavities and the efficient integration to the fiber networks, may open new possibilities for nanophotonic applications and quantum information science.

We present a protocol for fabricating 1-D photonic crystal cavities on subwavelength diameter silica fibers (optical nanofibers) using femtosecond laser-induced ablation.

1-D光子晶体空穴对纳米纤维使用飞秒激光诱导消融制造

We present a protocol for fabricating 1-D Photonic Crystal (PhC) cavities on subwavelength-diameter tapered optical fibers, optical nanofibers, using ...

Fabrication of Ultra-thin Color Films with Highly Absorbing Media Using Oblique Angle Deposition

Ultra-thin film structures have been studied extensively for use as optical coatings, but performance and fabrication challenges remain.&#160; We present an advanced method for fabricating ultra-thin color films with improved characteristics. The proposed process addresses several fabrication issues, including large area processing. Specifically, the protocol describes a process for fabricating ultra-thin color films using an electron beam evaporator for oblique angle deposition of germanium (Ge) and gold (Au) on silicon (Si) substrates.&#160; Film porosity produced by the oblique angle deposition induces color changes in the ultra-thin film. The degree of color change depends on factors such as deposition angle and film thickness. Fabricated samples of the ultra-thin color films showed improved color tunability and color purity. In addition, the measured reflectance of the fabricated samples was converted into chromatic values and analyzed in terms of color. Our ultra-thin film fabricating method is expected to be used for various ultra-thin film applications such as flexible color electrodes, thin film solar cells, and optical filters. Also, the process developed here for analyzing the color of the fabricated samples is broadly useful for studying various color structures.

We present a detailed method for fabricating ultra-thin color films with improved characteristics for optical coatings. The oblique angle deposition technique using an electron beam evaporator allows improved color tunability and purity. Fabricated films of Ge and Au on Si substrates were analyzed by reflectance measurements and color information conversion.

用斜角沉积法制备高吸收介质的超薄彩色薄膜

Ultra-thin film structures have been studied extensively for use as optical coatings, but performance and fabrication challenges remain.&#160; We present ...