metal-assisted-electrochemical-nanoimprinting-porous-solid-silicon

Metal-Assisted Electrochemical Nanoimprinting of Porous and Solid Silicon Wafers

Metal-assisted electrochemical imprinting (Mac-Imprint) is a combination of metal-assisted chemical etching (MACE) and nanoimprint lithography that is ...

Arizona State University

Scalable nanomanufacturing enables the commercialization of nanotechnology, particularly in applications such as nanophotonics, silicon photonics, photovoltaics, and biosensing. Nanoimprinting lithography (NIL) was the first scalable process to introduce 3D nanopatterning of polymeric films. Despite efforts to extend NIL's library of patternable media, imprinting of inorganic semiconductors has been plagued by concomitant generation of crystallography defects during imprinting. Here, we use an electrochemical nanoimprinting process-called Mac-Imprint-for directly patterning electronic-grade silicon with 3D microscale features. It is shown that stamps made of mesoporous metal catalysts allow for imprinting electronic-grade silicon without the concomitant generation of porous silicon damage while introducing mesoscale roughness. Unlike most NIL processes, Mac-Imprint does not rely on plastic deformation, and thus, it allows for replicating hard and brittle materials, such as silicon, from a reusable polymeric mold, which can be manufactured by almost any existing microfabrication technique.

Electrochemical nanoimprinting of silicon.

This work studies the optical reflectance of nanoporous gold (NPG) thin films of varying pore volume fraction (PVF) synthesized by chemical dealloying of Ag-Au alloy precursors. The fabricated samples are characterized by scanning electron microscopy, and spectral hemispherical reflectance is measured with an integrating sphere. The effective isotropic optical constants of NPG with varying PVF are modeled for the wavelength range from 0.4 to 1.6 μm using the Bruggeman effective medium theory. As the thickness of the NPG thin films is more than ten times larger than the effective penetration depth, the spectral reflectance is simply modeled with the Fresnel coefficients at the interface of air and semi-infinite NPG with different incident angles and polarizations. Consistent with the modeling results, the optical measurement data shows that the spectral normal reflectance of NPG significantly decreases with larger PVF values in the near-infrared regime. On the other hand, the reflectance increases greatly only within visible range at larger oblique angles for transverse-electric polarized waves compared to transverse-magnetic waves. Moreover, the NPG samples demonstrate good thermal stability from room temperature up to 100 °C with little changes in the temperature-dependent spectral hemispherical reflectance.

Stanislau Niauzorau

The Polytechnic School

Arizona State University

Metal-Assisted Electrochemical Nanoimprinting of Porous and Solid Silicon Wafers

Stanislau Niauzorau

.css-o250i3{font-size:18px;font-family:Open Sans,sans-serif;line-height:21.6px;}The Polytechnic School

Arizona State University

Metal-Assisted Electrochemical Nanoimprinting of Porous and Solid Silicon Wafers

The Polytechnic School