Fabricating Nanogaps by Nanoskiving

There are several methods of fabricating nanogaps with controlled spacings, but the precise control over the sub-nanometer spacing between two ...

University of Groningen

This paper describes the fabrication of electrically addressable, high-aspect-ratio (>10000:1) nanowires of gold with square cross sections of 100 nm on each side that are separated by gaps of 1.7-2.2 nm which were defined using self-assembled monolayers (SAMs) as templates. We fabricated these nanowires and nanogaps without a clean room or any photo- or electron-beam lithographic processes by mechanically sectioning sandwich structures of gold separated by a SAM using an ultramicrotome. This process is a form of edge lithography known as Nanoskiving. These wires can be manually positioned by transporting them on drops of water and are directly electrically addressable; no further lithography is required to connect them to an electrometer. Once a block has been prepared for Nanoskiving (which takes less than one day), hundreds of thousands of nanogaps can be generated, on demand, at a rate of about one nanogap per second. After ashing the organic components with oxygen plasma, we measured the width of a free-standing gap formed from a SAM of 16-mercaptodohexanoic acid (2.4 nm in length) of 2.6 Â± 0.5 nm by transmission electron microscopy. By fitting current-voltage plots of unashed gaps containing three alkanedithiolates of differing lengths to Simmonsâ€™ approximation, we derived a value of Î² = 0.75 Ã…(-1) (0.94 n(C)(-1)) at 500 mV. This value is in excellent agreement with literature values determined by a variety of methods, demonstrating that the gap-size can be controlled at resolutions as low as 2.5 Ã… (i.e., two carbon atoms).

Directly addressable sub-3 nm gold nanogaps fabricated by Nanoskiving using self-assembled monolayers as templates.

Cet article d&eacute;crit la fabrication d&#39;&eacute;lectriquement adressable, haute-format (&gt; 10000) nanofils d&#39;or avec des coupes carr&eacute;es de 100 nm de chaque c&ocirc;t&eacute; qui sont s&eacute;par&eacute;s par de 1,7 &agrave; 2,2 nm, des lacunes qui ont &eacute;t&eacute; d&eacute;finis &agrave; l&#39;aide des monocouches auto-assembl&eacute;es (SAMs) en tant que mod&egrave;les. Nous avons fabriqu&eacute; ces nanofils et nanogaps sans une salle blanche ou n&#39;importe quel processus lithographique photo - ou faisceau d&#39;&eacute;lectrons &agrave; s&eacute;parer m&eacute;caniquement les structures sandwichs d&#39;or s&eacute;par&eacute;es par une SAM en utilisant un ultramicrotome. Ce processus est une forme de lithographie de bord appel&eacute;e Nanoskiving. Ces fils peuvent &ecirc;tre positionn&eacute;es manuellement par leur transport sur les gouttes d&#39;eau et sont directement &eacute;lectriquement adressables ; aucun Lithographie suppl&eacute;mentaire n&#39;est requis pour les relier &agrave; un &eacute;lectrom&egrave;tre. Une fois un bloc a &eacute;t&eacute; pr&eacute;par&eacute; pour Nanoskiving (ce qui prend moins d&#39;une journ&eacute;e), des centaines de milliers de nanogaps peuvent &ecirc;tre g&eacute;n&eacute;r&eacute;s, sur demande, &agrave; un rythme d&#39;environ un nanogap par seconde. Apr&egrave;s calcination les composants organiques avec le plasma d&#39;oxyg&egrave;ne, nous avons mesur&eacute; la largeur d&#39;un &eacute;cart d&#39;autonome form&eacute; d&#39;une SAM de 16-mercaptodohexanoic acide (2,4 nm de longueur) de 2,6 &plusmn; 0,5 nm par microscopie &eacute;lectronique &agrave; transmission. En ajustant le courant-tension parcelles de lacunes unashed contenant trois alkanedithiolates de diff&eacute;rentes longueurs pour rapprochement de Simmons, nous d&eacute;riv&eacute; d&#39;une valeur de &beta; = 0,75 &Aring;(-1) (0.94 n(C)(-1)) &agrave; 500 mV. Cette valeur est en excellent accord avec la litt&eacute;rature valeurs d&eacute;termin&eacute;es par diverses m&eacute;thodes, ce qui d&eacute;montre que l&#39;&eacute;cart de taille peut &ecirc;tre command&eacute; &agrave; des r&eacute;solutions aussi basses que 2,5 &Aring; (c.-&agrave;-d., deux atomes de carbone).

Directement adressables sub-3 nm or nanogaps fabriqu&eacute;e par Nanoskiving &agrave; l&#39;aide de monocouches auto-assembl&eacute;es en tant que mod&egrave;les.

Questo documento descrive la fabbricazione di elettricamente indirizzabile, alto allungamento (&amp;gt; 10000: 1) nanofili di oro con sezioni trasversali quadrate di 100 nm su ogni lato che sono separati da vuoti di 1.7-2.2 nm che sono stati definiti tramite monostrati auto-assemblati (SAMs) come modelli. Abbiamo fabbricato questi nanofili e nanogaps senza una camera pulita o eventuali processi litografici foto - o elettrone-fascio sezionando meccanicamente le strutture sandwich di oro separati da un SAM utilizzando un ultramicrotomo. Questo processo &egrave; una forma di litografia a bordo noto come Nanoskiving. Questi fili possono essere posizionati manualmente da li trasporta sulle gocce d&#39;acqua e sono direttamente indirizzabili elettricamente; per collegarli a un Elettrometro non &egrave; necessaria nessuna ulteriore litografia. Una volta che un blocco &egrave; stato preparato per Nanoskiving (che prende meno di un giorno), centinaia di migliaia di nanogaps pu&ograve; essere generato, su richiesta, con un tasso di circa un nanogap al secondo. Dopo lampeggiante i componenti organici con il plasma di ossigeno, abbiamo misurato la larghezza di un gap di free-standing formata da un SAM di acido 16-mercaptodohexanoic (2,4 nm di lunghezza) di 2,6 &plusmn; 0,5 nm da microscopia elettronica della trasmissione. Tramite il montaggio di corrente-tensione appezzamenti di lacune unashed contenente tre alkanedithiolates di diverse lunghezze per approssimazione Simmons&#39;, abbiamo derivato un valore di &beta; = 0.75 &Aring;(-1) (0.94 n(C)(-1)) a 500 mV. Questo valore &egrave; in ottimo accordo con letteratura valori determinati da una variet&agrave; di metodi, dimostrando che il divario-dimensione pu&ograve; essere controllata a risoluzioni pi&ugrave; bassi 2,5 &Aring; (in cio&egrave;, due atomi di carbonio).

Parisa Pourhossein

Stratingh Institute for Chemistry and Zernike Institute for Advanced Materials

University of Groningen

Fabricating Nanogaps by Nanoskiving

Parisa Pourhossein

.css-o250i3{font-size:18px;font-family:Open Sans,sans-serif;line-height:21.6px;}Stratingh Institute for Chemistry and Zernike Institute for Advanced Materials

University of Groningen

Fabricating Nanogaps by Nanoskiving

Stratingh Institute for Chemistry and Zernike Institute for Advanced Materials