Hydrogel Synthesis
Differential Scanning Calorimetry
Thermal Diffusivity and the Laser Flash Method
Electroplating of Thin Films
Analysis of Thermal Expansion via Dilatometry
Electrochemical Impedance Spectroscopy
We report that the diffraction limit of conventional optical lithography can be overcome by exploiting the transitions of organic photochromic derivatives induced by their photoisomerization at low light intensities.1-3 This paper outlines our fabrication technique and two locking mechanisms, namely: dissolution of one photoisomer and electrochemical oxidation.
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