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Patterning via Optical Saturable Transitions - Fabrication and Characterization

DOI :

10.3791/52449-v

December 11th, 2014

December 11th, 2014

6,658 Views

1Department of Electrical and Computer Engineering, The University of Utah, 2Department of Chemistry, The University of Wisconsin-Madison

We report that the diffraction limit of conventional optical lithography can be overcome by exploiting the transitions of organic photochromic derivatives induced by their photoisomerization at low light intensities.1-3 This paper outlines our fabrication technique and two locking mechanisms, namely: dissolution of one photoisomer and electrochemical oxidation.

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Patterning Via Optical Saturable Transitions

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