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The University of Wisconsin-Madison

2 ARTICLES PUBLISHED IN JoVE

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Engineering

Patterning via Optical Saturable Transitions - Fabrication and Characterization
Precious Cantu 1, Trisha L. Andrew 2, Rajesh Menon 1
1Department of Electrical and Computer Engineering, The University of Utah, 2Department of Chemistry, The University of Wisconsin-Madison

We report that the diffraction limit of conventional optical lithography can be overcome by exploiting the transitions of organic photochromic derivatives induced by their photoisomerization at low light intensities.1-3 This paper outlines our fabrication technique and two locking mechanisms, namely: dissolution of one photoisomer and electrochemical oxidation.

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Chemistry

Reactive Vapor Deposition of Conjugated Polymer Films on Arbitrary Substrates
Nongyi Cheng 1,2, Trisha L. Andrew 2,3
1Department of Chemistry, University of Wisconsin-Madison, 2Department of Chemistry, University of Massachusetts Amherst, 3Department of Polymer Science and Engineering, University of Massachusetts Amherst

This paper presents a protocol for reactive vapor deposition of poly(3,4-ethylenedioxythiophene), poly(3,4-propylenedioxythiophene), and poly(thieno[3,2-b]thiophene) films on glass slides and rough substrates, such as textiles and paper.

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