This work performed under the auspices of the U.S. Department of Energy by Lawrence Livermore National Laboratory under Contract DE-AC52-07NA27344 within the LDRD program.

ポリッシャー、スラリーの調製まず、収束研磨システム（特にというC onvergent、 私は独立した、Sイングルイテレーションは、R ogue粒子-無料ポリッシャーまたはCISR（発音は「ハサミ」）は、 表面nitial）パッド＆セプタムをインストールすることで、7,17を 、コンディショニングパッドを作製希釈すると、化学的に、スラリーを安定化し、ろ過システム内のスラリーを組み込む。 <ol><li> CISRポリッシャーでは、花崗岩のラップベース上にポリウレタンパッドを接着する。第1のパッドつのエッジを接着し、空隙を最小限にするために、対向するエッジに向かう方向に圧力を加える。張り出しパッドをトリミングして、穿刺し、必要に応じて気泡を除去するためにカミソリの刃とローラーを使用しています。 </li><li>最初の時間の使用のため、すべての〜100時間後（0.6 psiの圧力を適用し、25mmの間隔刻みで各ラジアル周位置での5分間の滞留、ラップ回転を25rpmで直径50mm）流動DI水でCMPダイヤモンドコンディショナを使用してパッド、ダイヤモンド研磨条件のrは。 </li><li> 、流れるDI水で、研磨の繰り返しの間に、 その場での超音波洗浄機（ラップ回転5回転〜各半径位置で2分間の滞留）を使用して、パッドから残留スラリーとガラス製品を削除。 </li><li>ユニークな形状セプタム重量に対して、両面フォームテープ、次に隔壁材料（ たとえば 、プレカットガラスまたは他の非摩耗材料）を接着する。隔壁材料の形状や重さに一致するようにオーバーハングフォームテープをトリミング。セプタムのデザイン（形状と重量の両方）、ワークピースとラップ7,17の異なるサイズの変更に注意してください。 </li><li>ボリュームによってミックス（具体的ボーム4濃度に研磨スラリーの準備〜11のL BUで1部の酸化セリウム研磨スラリーと〜9部の脱イオン（DI）水cket）。ボームフロートを使用してボームを確認してください。 pHを9.5に調整し、独自の界面活性剤19〜120ミリリットル（1体積％）を追加するKOHの約5ミリリットル（10 M）を加える。 pHとボーム研磨の24時間毎に再調整します。 </li><li>ろ過システムに調製したスラリーでバケツをインストールします。その後、ろ過システムへの所望のCMP粒子フィルタをインストールしてください。数時間ろ過システム内のスラリーの再循環をしてみましょう。 </li><li>スラリーの尺度粒子サイズ分布は、（ 例えば 、単一粒子光学検知技法を使用して）分布のテールエンドを確保することが十分に不正無粒子9,20である。 </li></ol>ワーク（エッチングおよびブロッキング）の調製研磨の前に、化学的にサブ表面研削損傷21を除去するために必要な材料除去の量を減らすために、受信された微細なアースワークをエッチングする。アスペクト比（長さ/厚み）は&gt; 1であれば、次に、（工作物をブロック0）をブロックし、22を研磨中に曲げからワークを防止するために、新規なピッチボタンブロッキング（PBB）技術を使用して。 <ol><li>取り外し6時間：（1緩衝酸化物エッチング（BOE）DI水で希釈した3×6）、NH 4 F：HFを入れた槽の中に微細なアースワークを（フラット特に265 xは265×8 mm 3の溶融シリカガラス）エッチング加工物の表面からガラスの10μmである。注意！ BOEは非常に危険です。適切な個人保護具（P​​PE）を着用。エッチタンクからワークを取り出して、積極的にDI水で工作物をすすぎ、空気に工作物を垂直方向に乾燥できます。 </li><li>暗い部屋で明るい光の検査を使用して粉砕工程の間に深いダメージのための工作物を検査します。何深いダメージが見つからない場合は、他の再研削用バックワークを送信、次のステップに進みます。 </li><li>の面にピッチ（〜0.06グラム）のグルーガンへ〜95ºCと場所滴（またボタンと呼ばれる）でピッチをブロックヒートアップ9×9配列内の遮光板（26ミリメートル間隔で81のボタン）。異なるサイズの工作物については、理想的な数、サイズ、及びピッチボタン22の間隔のためのルールを設計することを参照してください。適用ボタンが70で予備加熱したオーブンに表向きでブロッキングプレートを置き ºC。 </li><li>研磨されるべきではない工作物の面にテープを適用する。気泡を発生させるか、過剰にテープを延伸する避ける。 </li><li>オーブンで遮蔽板上のボタンの上に下にテープ側面と加工物を置きます。対流を最小限に抑えるために、ワーク·ボタン·ブロックをカバーしています。 1.5時間後、室温に10ºC/時を冷却するためにオーブンセット。冷却後、ブロックされ、ワー​​ク上のピッチの厚さは、〜1ミリメートルであるべきである。 </li></ol> 3.収束研磨<ol><li>研磨中の乾燥からのスラリーを防ぐためにCISRポリッシャーの環境チャンバー内の湿度システムの電源をオンにし、ワークに傷をつけ不正な粒子を最小限にするために。 </li><li>イン背が高く、研磨に特別に設計され、準備中隔をマウントします。工作物を保持するためにCISRポリッシャーと下ブームにPBBワークをインストールしてください。 </li><li> 〜75ミリメートルの半径方向ストロークと1ガロン/分のろ過システムからのスラリーの流れと25 rpmで一致したラップとワークの回転速度で4時間CISRにポーランドの工作物。 注：0.6 psiの対応するワークピース上積載重量が圧力を適用した遮蔽板を兼ねている。 </li><li>ラップとワーク回転、スラリーの流れをオフにします。 CISRポリッシャーからPBBワークを削除し、DI水満たされた槽にそれを沈める。水没しながら、クリーンルーム布でワーク表面を拭きます。浴からPBBワークを削除し、DI水ですすぎスプレー。 </li><li>ワークブロックの界面でのシムを挿入することにより、デブロックワーク。ワーク表面からテープを外します。積極的にDI水と空気乾燥で工作物をすすぐ。 </li><li> PBBその後、POを繰り返して第2節で説明したように、工作物の対向面第3節で説明したように手順をlishing。 </li></ol> 4.計量·検査<ol><li>測定値は、干渉計を用いてワークの両面の波面（ すなわち 、表面形状）ならびに透過波面を反映している。 </li><li>明るい光検査ステーションのマウントワークと光造形標準方法を使用してスクラッチ/ディグ特性を測定する。工作物の短いBOEエッチングは、ステップ2.1で説明したように、高フルエンスのレーザ用途で使用されるワークの隠れた傷を露出させるために使用することができる。ワーク上の微細な傷や粗さを測定するために、標準的な光学顕微鏡または白色光干渉法を用いてもよい。 </li><li>ストアは、工作物の顔を持つコンテナ最小化接触してワークを完成。 </li></ol>

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The authors have nothing to disclose.

章で説明したように、表面形状に対する研磨収束の実装を成功さが原因ワーク形状にワークピース - ラップミスマッチのことを除いて空間的な材料の不均一性に影響を与えるすべての現象を排除または最小化することが含まれます。これらの現象のいずれかが適切なプロセス制御を介して、または研磨の適切な技術のいずれかを介して、軽減されていない場合は、所望の収束点を達成または?...

典型的な光製造プロセスの主な手順は、シェーピング、研削、全開口研磨、及び1-3の研磨時々小さなツールが含まれています。イメージングとレーザーシステムのための高品質の光学部品の需要の増加により、過去数十年にわたって、光学製造において重要な進歩があった。たとえば、精度については、決定論的な材料除去は（CNC）ガラスの成形機制御コンピュータ数値の進歩と整形及び研削工程中にできるようになりました。同様に、技術は（ 例えば 、コンピュータ制御光学浮上（CCOS）、イオン考え出す、及び磁気流動仕上げ（MRF））を研磨小さなツールは、このように強く、光製造産業に影響を与え、決定論的な材料除去と表面形状制御につながっている。しかし、仕上げ工程、全開口研磨の中間段階では、まだ一般的に熟練したopticiaを必要とする、高い決定論を欠いている所望の表面図1-3に達成するために、複数のプロセスの変更で複数の、しばしば長い反復サイクルを実施するためのナノ。 研磨する方法は、プロセス変数、及び複雑な化学及びワーク、ラップ、スラリー3-4との間の機械的相互作用の大多数は、それが困難な科学への「アート」から光学研磨を変換するために行った。決定論的な全開口研磨を達成するために、材料除去速度が十分に理解されなければならない。歴史的に、材料除去速度が広く用いプレストン方程式5により記載されている<img alt="式1" fo:content-width="1in" fo:src="/files/ftp_upload/51965/51965eqn1.jpg" src="/files/ftp_upload/51965/51965eqn1.jpg" width="100px" /> （1） dhの/ dtは、平均厚さ除去速度であり、kはpはプレストン定数であり、σOで加えられる圧力、およびV rは、ワークピースとラップとの間の平均相対速度である。 図1は、速度および圧力の空間的および時間的変動を含むプレストン方程式は、説明した材料除去速度に影響を与える物理的な概念を示している、との違い加えられた圧力と圧力分布ワーク経験、および摩擦効果6-8。具体的には、被加工物が経験する実際の圧力分布が強く加工物の表面形状を得られる影響を及ぼす（詳細他所6-8に記載される）現象の数によって支配される。また、プレストン方程式において、微視的な分子レベルの影響が大きく、全体的な材料除去速度、マイクロラフネス、さらにワークに引っかき傷に影響巨視的プレストン定数（k p）は 、に折り畳まれている。様々な研究が口座にプレストンのモデルを拡大している<html>微細なスラリー粒子パッドワーク相互作用が材料除去速度及びマイクロラフネス9-16を説明するため。 全開口研磨時の表面形状の決定論的制御を達成するために、上述の現象の各々は、理解を定量化した後、制御する必要がある。収束研磨背後の戦略は、不均一な材料の除去の望ましくない原因を排除または最小化するために、操作された研磨装置の設計を介して、またはプロセス制御のいずれかによって、そのようなその除去により、ワーク形状にのみワークピース-ラップミスマッチによって駆動される7,17- 18。 図2に、ワーク形状がワークピース-ラップミスマッチのコンセプトに基づいて、収束につながる方法を示しています。平らなラップと左上に示す複雑な形状の仮想的なワークを考えてみましょう。 （ギャップ、ΔhはOLとも呼ばれる）界面高さのミスマッチは、界面圧分布（σ）が影響する。 コンテンツ &quot;FO：キープtogether.withinページ=&quot;常に &quot;&gt; <img alt="式2" fo:content-width="1in" fo:src="/files/ftp_upload/51965/51965eqn2.jpg" src="/files/ftp_upload/51965/51965eqn2.jpg" width="100px" /> （2） Hは、圧力がギャップΔhはOL 6の増加に伴って低下する速度を一定に記述される。この例では、被加工物（ 図2の左下を参照）、中心で最も局所的な圧力を有するため、この位置は、研磨中に最も初期の材料除去率を観察する。材料が除去されるように、ワークピースを横切る圧力差は、ワークピース - ラップミスマッチの減少に起因する減少し、工作物は、ラップの形状に収束する。収束ワーク圧力分布、したがって、材料除去に、（ 図2の右側参照）、ワーク全体で均一である。この例はhowev、フラットラップのために例示されているえー、同じ概念が球状のラップ（凹面または凸面のいずれか）に適用されます。空間的な材料の不均一性に影響を与え、他のすべての現象が解消されている場合でも、この収束プロセスにのみ機能します。収束研磨プロトコル内で実現された特定の手続きやエンジニアリングの対応策は、ディスカッションに記載されています。 以下の研究に記載されているプロトコルは、特に微細な地面から始まる26.5センチメートル平方溶融シリカガラス工作物用の収束研磨プロセスである。研磨の8時間（4時間/表面）には、このワークは、非常に高い表面品質（ すなわち 、低スクラッチ密度）で〜λ/ 2の研磨平坦性を達成することができます。

<table border="0" cellpadding="0" cellspacing="0" width="634">
	<tbody>
		<tr height="21">
			<td height="21" style="height:21px;width:251px;">Name of Material/Equipment</td>
			<td style="width:245px;">Company</td>
			<td style="width:139px;">Catalog Number</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;">MHN 50 mil Polyurethane Pad&#160;</td>
			<td>Eminess Technologies</td>
			<td>PF-MHN15A050L-56</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;">Cerium oxide polishing slurry</td>
			<td>Universal Photonics</td>
			<td>HASTILITE PO</td>
		</tr>
		<tr height="21">
			<td dir="LTR" height="21" style="height:21px;width:251px;">Septum Glass (waterjet cut)</td>
			<td dir="LTR" style="width:245px;">Borofloat ; Schott&#160;</td>
			<td dir="LTR" style="width:139px;">NA</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;">Diamond conditioner</td>
			<td>Morgan Advanced Ceramics&#160;</td>
			<td>CMP-25035-SFT</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;">Ultrasonic Cleaner</td>
			<td>Advanced Sonics Processing System</td>
			<td>URC4</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;">Purification Optima Filter cartridge</td>
			<td>3M</td>
			<td>CMP560P10FC</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;">Blocking Pitch</td>
			<td>Universal Photonics</td>
			<td>BP1</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;">Blocking Tape</td>
			<td>3M</td>
			<td>#4712</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;">Cleanroom Cloth</td>
			<td>ITW Texwipe</td>
			<td>AlphaWipe TX1013</td>
		</tr>
		<tr height="21">
			<td height="21" style="height:21px;">Single Particle Optical Sensing</td>
			<td>Paritcle Sizing Systems</td>
			<td>Accusizer 780 AD</td>
		</tr>
	</tbody>
</table>

convergent polishing: a simple, rapid, full aperture polishing process of high quality optical flats &amp; spheres

収束研磨は、その最初の形状（ すなわち 、表面形状）の独立したワークは、一定不変のセットの下で優れた表面品質を有する最終的な表面形状に収束するもので平坦かつ球状ガラス光学素子を終了するための新規の研磨システム及び方法であるシングル研磨の繰り返しでパラメータを研磨する。対照的に、従来の全開口の研磨方法は、所望の表面形状を達成するために、研磨、計測およびプロセス変化を含む、複数の、しばしば長い反復サイクルを必要とする。収束研磨プロセスは、ラップの形状に収束するワークで除去し、その結果に伴って減少する圧力差が生じるワークピース - ラップ高さの不一致の概念に基づいている。収束研磨プロセスの実装を成功させるには、ワークピース - ラップを除いて不均一な空間材料の除去（のすべてのソースを除去するための多くの技術の組み合わせの結果である表面形状の収束ミスマッチ）と低スクラッチ密度および低い粗システムに不正粒子の数を減少させる。収束研磨プロセスは、各種ガラス材料の両方のフラット様々な形状、大きさの球、およびアスペクト比の製造のために実証されている。実際的な影響は、高品質の光学部品がより低い単位コストをもたらし、より少ない計測と、より少ない労力で、より多く繰り返して、より迅速に製造することができることである。本研究では、収束研磨プロトコルは、特に正方形の81センチメートル直径研磨面につき4時間研磨後の研磨〜λ/ 2の表面形状の微地表面からシリカフラットを融合した26.5センチメートルを製造するために記載されている。

収束研磨プロトコルは、前述の山から谷までの平坦度に、表面あたり4時間の単一の反復で、研磨される（この場合は26.5センチ角）を地面溶融シリカワークを可能に〜λ/ 2（〜低アスペクト比の加工物及び高アスペクト比の加工物のため〜1λ（〜633 nm）のために330 nm）を（ 図3参照）。再び、このプロセスを繰り返し、研磨パラメータを変更することなく同一の最終表面形状に加?...

Watch this Scientific Journal Video about Convergent Polishing: A Simple, Rapid, Full Aperture Polishing Process of High Quality Optical Flats & Spheres at JoVE.com

Convergent Polishing: A Simple, Rapid, Full Aperture Polishing Process of High Quality Optical Flats &amp; Spheres

A novel optical polishing process, called &#8220;Convergent Polishing&#8221;, which enables faster, lower cost polishing, is described. Unlike conventional polishing processes, Convergent Polishing allows a glass workpiece to be polished in a single iteration and with high surface quality to its final surface figure without requiring changes to polishing parameters.

収束研磨：高品質の光学フラット＆球のシンプル、迅速、全開口研磨プロセス

Convergent Polishing is a novel polishing system and method for finishing flat and spherical glass optics in which a workpiece, independent of its initial ...

convergent-polishing-simple-rapid-full-aperture-polishing-process

Research

JoVE Journal

Engineering

11.0K ビュー.  Lawrence Livermore National Laboratory. A novel optical polishing process, called “Convergent Polishing”, which enables faster, lower cost polishing, is described. Unlike conventional polishing processes, Convergent Polishing allows a glass workpiece to be polished in a single iteration and with high surface quality to its final surface figure without requiring changes to polishing parameters.

ビデオ: Convergent Polishing: A Simple, Rapid, Full Aperture Polishing Process of High Quality Optical Flats & Spheres

Fabrication of Silica Ultra High Quality Factor Microresonators

Whispering gallery resonant cavities confine light in circular orbits at their periphery.1-2 The photon storage lifetime in the cavity, quantified by the quality factor (Q) of the cavity, can be in excess of 500ns for cavities with Q factors above 100 million. As a result of their low material losses, silica microcavities have demonstrated some of the longest photon lifetimes to date1-2. Since a portion of the circulating light extends outside the resonator, these devices can also be used to probe the surroundings. This interaction has enabled numerous experiments in biology, such as single molecule biodetection and antibody-antigen kinetics, as well as discoveries in other fields, such as development of ultra-low-threshold microlasers, characterization of thin films, and cavity quantum electrodynamics studies.3-7
The two primary silica resonant cavity geometries are the microsphere and the microtoroid. Both devices rely on a carbon dioxide laser reflow step to achieve their ultra-high-Q factors (Q&gt;100 million).1-2,8-9 However, there are several notable differences between the two structures. Silica microspheres are free-standing, supported by a single optical fiber, whereas silica microtoroids can be fabricated on a silicon wafer in large arrays using a combination of lithography and etching steps. These differences influence which device is optimal for a given experiment.
Here, we present detailed fabrication protocols for both types of resonant cavities. While the fabrication of microsphere resonant cavities is fairly straightforward, the fabrication of microtoroid resonant cavities requires additional specialized equipment and facilities (cleanroom). Therefore, this additional requirement may also influence which device is selected for a given experiment.
Introduction
An optical resonator efficiently confines light at specific wavelengths, known as the resonant wavelengths of the device. 1-2 The common figure of merit for these optical resonators is the quality factor or Q. This term describes the photon lifetime (&tau;o) within the resonator, which is directly related to the resonator's optical losses. Therefore, an optical resonator with a high Q factor has low optical losses, long photon lifetimes, and very low photon decay rates (1/&tau;o). As a result of the long photon lifetimes, it is possible to build-up extremely large circulating optical field intensities in these devices. This very unique property has allowed these devices to be used as laser sources and integrated biosensors.10
A unique sub-class of resonators is the whispering gallery mode optical microcavity. In these devices, the light is confined in circular orbits at the periphery. Therefore, the field is not completely confined within the device, but evanesces into the environment. Whispering gallery mode optical cavities have demonstrated some of the highest quality factors of any optical resonant cavity to date.9,11 Therefore, these devices are used throughout science and engineering, including in fundamental physics studies and in telecommunications as well as in biodetection experiments. 3-7,12
Optical microcavities can be fabricated from a wide range of materials and in a wide variety of geometries. A few examples include silica and silicon microtoroids, silicon, silicon nitride, and silica microdisks, micropillars, and silica and polymer microrings.13-17 The range in quality factor (Q) varies as dramatically as the geometry. Although both geometry and high Q are important considerations in any field, in many applications, there is far greater leverage in boosting device performance through Q enhancement. Among the numerous options detailed previously, the silica microsphere and the silica microtoroid resonator have achieved some of the highest Q factors to date.1,9 Additionally, as a result of the extremely low optical loss of silica from the visible through the near-IR, both microspheres and microtoroids are able to maintain their Q factors over a wide range of testing wavelengths.18 Finally, because silica is inherently biocompatible, it is routinely used in biodetection experiments.
In addition to high material absorption, there are several other potential loss mechanisms, including surface roughness, radiation loss, and contamination loss.2 Through an optimization of the device size, it is possible to eliminate radiation losses, which arise from poor optical field confinement within the device. Similarly, by storing a device in an appropriately clean environment, contamination of the surface can be minimized. Therefore, in addition to material loss, surface scattering is the primary loss mechanism of concern.2,8
In silica devices, surface scattering is minimized by using a laser reflow technique, which melts the silica through surface tension induced reflow. While spherical optical resonators have been studied for many years, it is only with recent advances in fabrication technologies that researchers been able to fabricate high quality silica optical toroidal microresonators (Q&gt;100 million) on a silicon substrate, thus paving the way for integration with microfluidics.1
The present series of protocols details how to fabricate both silica microsphere and microtoroid resonant cavities. While silica microsphere resonant cavities are well-established, microtoroid resonant cavities were only recently invented.1 As many of the fundamental methods used to fabricate the microsphere are also used in the more complex microtoroid fabrication procedure, by including both in a single protocol it will enable researchers to more easily trouble-shoot their experiments.

We describe the use of a carbon dioxide laser reflow technique to fabricate silica resonant cavities, including free-standing microspheres and on-chip microtoroids. The reflow method removes surface imperfections, allowing long photon lifetimes within both devices. The resulting devices have ultra high quality factors, enabling applications ranging from telecommunications to biodetection.

シリカ超高品質ファクターMicroresonatorsの作製

Whispering gallery resonant cavities confine light in circular orbits at their periphery.1-2 The photon storage lifetime in the cavity, quantified by the ...

工学

Process of Making Three-dimensional Microstructures using Vaporization of a Sacrificial Component

Vascular structures in natural systems are able to provide high mass transport through high surface areas and optimized structure. Few synthetic material fabrication techniques are able to mimic the complexity of these structures while maintaining scalability. The Vaporization of a Sacrificial Component (VaSC) process is able to do so. This process uses sacrificial fibers as a template to form hollow, cylindrical microchannels embedded within a matrix. Tin (II) oxalate (SnOx) is embedded within poly(lactic) acid (PLA) fibers which facilitates the use of this process. The SnOx catalyzes the depolymerization of the PLA fibers at lower temperatures. The lactic acid monomers are gaseous at these temperatures and can be removed from the embedded matrix at temperatures that do not damage the matrix. Here we show a method for aligning these fibers using micromachined plates and a tensioning device to create complex patterns of three-dimensionally arrayed microchannels. The process allows the exploration of virtually any arrangement of fiber topologies and structures.

The Vaporization of a Sacrificial Component (VaSC) process is used to fabricate microvascular structures. This procedure uses sacrificial poly(lactic) acid fibers to form hollow microchannels with precise 3D geometric positioning provided by laser micromachined guide plates.

犠牲成分の蒸発を用いた三次元微細構造を作る過程

Vascular structures in natural systems are able to provide high mass transport through high surface areas and optimized structure. Few synthetic material ...

Construction of a High Resolution Microscope with Conventional and Holographic Optical Trapping Capabilities

High resolution microscope systems with optical traps allow for precise manipulation of various refractive objects, such as dielectric beads 1 or cellular organelles 2,3, as well as for high spatial and temporal resolution readout of their position relative to the center of the trap. The system described herein has one such "traditional" trap operating at 980 nm. It additionally provides a second optical trapping system that uses a commercially available holographic package to simultaneously create and manipulate complex trapping patterns in the field of view of the microscope 4,5 at a wavelength of 1,064 nm. The combination of the two systems allows for the manipulation of multiple refractive objects at the same time while simultaneously conducting high speed and high resolution measurements of motion and force production at nanometer and piconewton scale.

The system described herein employs a traditional optical trap as well as an independent holographic optical trapping line, capable of creating and manipulating multiple traps. This allows for the creation of complex geometric arrangements of refractive particles while also permitting simultaneous high-speed, high-resolution measurements of the activity of biological enzymes.

従来のホログラフィック光トラッピング機能を備えた高分解能顕微鏡の構成

High resolution microscope systems with optical traps allow for precise manipulation of various refractive objects, such as dielectric beads 1 or cellular ...

The Generation of Higher-order Laguerre-Gauss Optical Beams for High-precision Interferometry

Thermal noise in high-reflectivity mirrors is a major impediment for several types of high-precision interferometric experiments that aim to reach the standard quantum limit or to cool mechanical systems to their quantum ground state. This is for example the case of future gravitational wave observatories, whose sensitivity to gravitational wave signals is expected to be limited in the most sensitive frequency band, by atomic vibration of their mirror masses. One promising approach being pursued to overcome this limitation is to employ higher-order Laguerre-Gauss (LG) optical beams in place of the conventionally used fundamental mode. Owing to their more homogeneous light intensity distribution these beams average more effectively over the thermally driven fluctuations of the mirror surface, which in turn reduces the uncertainty in the mirror position sensed by the laser light.
We demonstrate a promising method to generate higher-order LG beams by shaping a fundamental Gaussian beam with the help of diffractive optical elements. We show that with conventional sensing and control techniques that are known for stabilizing fundamental laser beams, higher-order LG modes can be purified and stabilized just as well at a comparably high level. A set of diagnostic tools allows us to control and tailor the properties of generated LG beams. This enabled us to produce an LG beam with the highest purity reported to date. The demonstrated compatibility of higher-order LG modes with standard interferometry techniques and with the use of standard spherical optics makes them an ideal candidate for application in a future generation of high-precision interferometry.

Large laser-interferometers are being constructed to create a new type of astronomy based on gravitational waves. Their sensitivities, as for many other high-precision experiments, are approaching fundamental noise limits such as the atomic vibration of their components. We are pioneering technologies to overcome these limits using novel laser beam shapes.

高精度の干渉のための高次ラゲールガウス光ビームの生成

Thermal noise in high-reflectivity mirrors is a major impediment for several  types of high-precision interferometric experiments that aim to reach the  ...

Fabrication Process of Silicone-based Dielectric Elastomer Actuators

This contribution demonstrates the fabrication process of dielectric elastomer transducers (DETs). DETs are stretchable capacitors consisting of an elastomeric dielectric membrane sandwiched between two compliant electrodes. The large actuation strains of these transducers when used as actuators (over 300% area strain) and their soft and compliant nature has been exploited for a wide range of applications, including electrically tunable optics, haptic feedback devices, wave-energy harvesting, deformable cell-culture devices, compliant grippers, and propulsion of a bio-inspired fish-like airship. In most cases, DETs are made with a commercial proprietary acrylic elastomer and with hand-applied electrodes of carbon powder or carbon grease. This combination leads to non-reproducible and slow actuators exhibiting viscoelastic creep and a short lifetime. We present here a complete process flow for the reproducible fabrication of DETs based on thin elastomeric silicone films, including casting of thin silicone membranes, membrane release and prestretching, patterning of robust compliant electrodes, assembly and testing. The membranes are cast on flexible polyethylene terephthalate (PET) substrates coated with a water-soluble sacrificial layer for ease of release. The electrodes consist of carbon black particles dispersed into a silicone matrix and patterned using a stamping technique, which leads to precisely-defined compliant electrodes that present a high adhesion to the dielectric membrane on which they are applied.

This manuscript shows the fabrication process for the manufacture of dielectric elastomer soft actuators based on silicone membranes. The three key stages of production are presented in detail: blade casting of thin silicone membranes; pad printing of compliant electrodes; and the assembly of all the components.

シリコーン系誘電エラストマーアクチュエータの製造工程

This contribution demonstrates the fabrication process of dielectric elastomer transducers (DETs). DETs are stretchable capacitors consisting of an ...

Adsorption Device Based on a Langatate Crystal Microbalance for High Temperature High Pressure Gas Adsorption in Zeolite H-ZSM-5

We present a high-temperature and high-pressure gas adsorption measurement device based on a high-frequency oscillating microbalance (5 MHz langatate crystal microbalance, LCM) and its use for gas adsorption measurements in zeolite H-ZSM-5. Prior to the adsorption measurements, zeolite H-ZSM-5 crystals were synthesized on the gold electrode in the center of the LCM, without covering the connection points of the gold electrodes to the oscillator, by the steam-assisted crystallization (SAC) method, so that the zeolite crystals remain attached to the oscillating microbalance while keeping good electroconductivity of the LCM during the adsorption measurements. Compared to a conventional quartz crystal microbalance (QCM) which is limited to temperatures below 80 &#176;C, the LCM can realize the adsorption measurements in principle at temperatures as high as 200-300 &#176;C (i.e., at or close to the reaction temperature of the target application of one-stage DME synthesis from the synthesis gas), owing to the absence of crystalline-phase transitions up to its melting point (1,470 &#176;C). The system was applied to investigate the adsorption of CO2, H2O, methanol and dimethyl ether (DME), each in the gas phase, on zeolite H-ZSM-5 in the temperature and pressure range of 50-150 &#176;C and 0-18 bar, respectively. The results showed that the adsorption isotherms of these gases in H-ZSM-5 can be well fitted by Langmuir-type adsorption isotherms. Furthermore, the determined adsorption parameters, i.e., adsorption capacities, adsorption enthalpies, and adsorption entropies, compare well to literature data. In this work, the results for CO2 are shown as an example.

A protocol for high-temperature and high-pressure gas adsorption measurements on zeolite H-ZSM-5 using an adsorption measurement device based on a langatate crystal microbalance is presented. Prior to the adsorption measurements, the synthesis of zeolite H-ZSM-5 on the langatate crystal microbalance sensor by the steam-assisted crystallization (SAC) method is demonstrated.

ゼオライトH-ZSM-5で高温・高圧のガス吸着用のLangatateクリスタルマイクロバランスに基づいて吸着装置

We present a high-temperature and high-pressure gas adsorption measurement device based on a high-frequency oscillating microbalance (5 MHz langatate ...

Challenges in Rheological Characterization of Highly Concentrated Suspensions &#8212; A Case Study for Screen-printing Silver Pastes

A comprehensive rheological characterization of highly concentrated suspensions or pastes is mandatory for a targeted product development meeting the manifold requirements during processing and application of such complex fluids. In this investigation, measuring protocols for a conclusive assessment of different process relevant rheological parameters have been evaluated. This includes the determination of yield stress, viscosity, wall slip velocity, structural recovery after large deformation and elongation at break as well as tensile force during filament stretching.
The importance of concomitant video recordings during parallel-plate rotational rheometry for a significant determination of rheological quantities is demonstrated. The deformation profile and flow field at the sample edge can be determined using appropriate markers. Thus, measurement parameter settings and plate roughness values can be identified for which yield stress and viscosity measurements are possible. Slip velocity can be measured directly and measuring conditions at which plug flow, shear banding or sample spillover occur can be identified clearly. 
Video recordings further confirm that the change in shear moduli observed during three stage oscillatory shear tests with small deformation amplitude in stage I and III but large oscillation amplitude in stage II can be directly attributed to structural break down and recovery. For the pastes investigated here, the degree of irreversible, shear-induced structural change increases with increasing deformation amplitude in stage II until a saturation is reached at deformations corresponding to the crossover of G' and G'', but the irreversible damage is independent of the duration of large amplitude shear. 
A capillary breakup elongational rheometer and a tensile tester have been used to characterize deformation and breakup behavior of highly filled pastes in uniaxial elongation. Significant differences were observed in all experiments described above for two commercial screen-printing silver pastes used for front side metallization of Si-solar cells.

Challenges in Rheological Characterization of Highly Concentrated Suspensions &amp;#8212; A Case Study for Screen-printing Silver Pastes

A protocol for a robust and application relevant rheological characterization of highly concentrated suspensions is presented. Silver pastes used for screen-printing application in solar cell production are employed as model systems.

高度に濃縮された懸濁液のレオロジー特性評価における課題 - スクリーン印刷シルバーペーストのためのケーススタディ

A comprehensive rheological characterization of highly concentrated suspensions or pastes is mandatory for a targeted product development meeting the ...

Method for Recording Broadband High Resolution Emission Spectra of Laboratory Lightning Arcs

Lightning is one of the most common and destructive forces in nature and has long been studied using spectroscopic techniques, first with traditional camera film methods and then digital camera technology, from which several important characteristics have been derived. However, such work has always been limited due to the inherently random and non-repeatable nature of natural lightning events in the field. Recent developments in lightning test facilities now allow the reproducible generation of lightning arcs within controlled laboratory environments, providing a test bed for the development of new sensors and diagnostic techniques to understand lightning mechanisms better. One such technique is a spectroscopic system using digital camera technology capable of identifying the chemical elements with which the lightning arc interacts, with these data then being used to derive further characteristics. In this paper, the spectroscopic system is used to obtain the emission spectrum from a 100 kA peak, 100 &#181;s duration lightning arc generated across a pair of hemispherical tungsten electrodes separated by a small air gap. To maintain a spectral resolution of less than 1 nm, several individual spectra were recorded across discrete wavelength ranges, averaged, stitched, and corrected to produce a final composite spectrum in the 450 nm (blue light) to 890 nm (near infrared light) range. Characteristic peaks within the data were then compared to an established publicly available database to identify the chemical element interactions. This method is readily applicable to a variety of other light emitting events, such as fast electrical discharges, partial discharges, and sparking in electrical equipment, apparatus, and systems.

Emission spectroscopy techniques have traditionally been used to analyze inherently random lightning arcs occurring in nature. In this paper, a method developed to obtain the emission spectroscopy from reproducible lightning arcs generated within a laboratory environment is described.

実験室雷アークの広帯域高解像度発光スペクトルの記録方法

Lightning is one of the most common and destructive forces in nature and has long been studied using spectroscopic techniques, first with traditional ...

Atomic Layer Deposition of Vanadium Dioxide and a Temperature-dependent Optical Model

Vanadium dioxide is a material that has a reversible metal-insulator phase change near 68 &#176;C. To grow VO2 on a wide variety of substrates, with wafer-scale uniformity and angstrom level control of thickness, the method of atomic-layer deposition was chosen. This ALD process enables high-quality, low-temperature (&#8804;150 &#176;C) growth of ultrathin films (100-1000 &#197;) of VO2. For this demonstration, the VO2 films were grown on sapphire substrates. This low temperature growth technique produces mostly amorphous VO2 films. A subsequent anneal in an ultra-high vacuum chamber with a pressure of 7x10-4 Pa of ultra-high purity (99.999%) oxygen produced oriented, polycrystalline VO2 films. The crystallinity, phase, and strain of the VO2 were determined by Raman spectroscopy and X-ray diffraction, while the stoichiometry and impurity levels were determined by X-ray photoelectron spectroscopy, and finally the morphology was determined by atomic force microscopy. These data demonstrate the high-quality of the films grown by this technique. A model was created to fit to the data for VO2 in its metallic and insulating phases in the near infrared spectral region. The permittivity and refractive index of the ALD VO2 agreed well with the other fabrication methods in its insulating phase, but showed a difference in its metallic state. Finally, the analysis of the films&#39; optical properties enabled the creation of a wavelength- and temperature-dependent model of the complex optical refractive index for developing VO2 as a tunable refractive index material.

Thin films (100-1000 &#197;) of vanadium dioxide (VO2) were created by atomic-layer deposition (ALD) on sapphire substrates. Following this, the optical properties were characterized through the metal-insulator transition of VO2. From the measured optical properties, a model was created to describe the tunable refractive index of VO2.

二酸化バナジウムと温度依存性の光学モデルの原子層堆積法

Vanadium dioxide is a material that has a reversible metal-insulator phase change near 68 &#176;C. To grow VO2 on a wide variety of substrates, with ...

Predicting Catalyst Extrudate Breakage Based on the Modulus of Rupture

The mechanical strength of extruded catalysts and their natural or forced breakage by either collision against a surface or by a compressive load in a fixed bed are important phenomena in catalyst technology. The mechanical strength of the catalyst is measured here by its bending strength or flexural strength. This technique is relatively new from the perspective of applying it to commercial catalysts of typical sizes used in the industry. Catalyst breakage by collision against a surface is measured after a fall of the extrudates through the ambient air in a vertical pipe. Quantifying the impact force is done theoretically by applying Newton's second law. Measurement of catalyst breakage due to stress in a fixed bed is done following the standard procedure of the bulk crush strength test. Novel here is the focus on measuring the reduction in the length to diameter ratio of the extrudates as a function of the stress.

Here we present a protocol to measure the modulus of rupture of an extruded catalyst and the breakage of said catalyst extrudates by collision against a surface or by compression in a fixed bed.

破壊係数をに基づいて推定触媒押し出し破損

The mechanical strength of extruded catalysts and their natural or forced breakage by either collision against a surface or by a compressive load in a ...