Demonstration of Equal-Intensity Beam Generation by Dielectric Metasurfaces

0:52

Deposition of Hydrogenated Amorphous Silicon (a-Si:H) on a Fused Silica Substrate by Plasma-enhanced Chemical Vapor Deposition (PECVD)

1:35

Formation of the Chromium Etching Mask

6:53

Etching Process of Hydrogenated Amorphous Silicon

7:41

Results: The Fabricated Metasurface and its Polarization-independent

8:31

Conclusion