Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment
8.2K Views
•
08:48 min
•
November 9th, 2015
DOI :
November 9th, 2015
•Rozdziały w tym wideo
0:05
Title
1:24
Sample Preparation
2:16
Pulsed UV Laser Irradiation in Liquid Environment
3:18
Immobilization of Bio-conjugated Nanospheres
3:56
Contact Angle Measurement
5:05
XPS Measurement
5:52
Results: Pulsed UV Laser Irradiation Increases SiOH Surface Concentration
7:10
Conclusion
Powiązane Filmy
Investigation of Early Plasma Evolution Induced by Ultrashort Laser Pulses
14.9K Views
Characterization of Surface Modifications by White Light Interferometry: Applications in Ion Sputtering, Laser Ablation, and Tribology Experiments
15.5K Views
Fabrication of Nano-engineered Transparent Conducting Oxides by Pulsed Laser Deposition
15.4K Views
Visualization of High Speed Liquid Jet Impaction on a Moving Surface
11.4K Views
Integration of Light Trapping Silver Nanostructures in Hydrogenated Microcrystalline Silicon Solar Cells by Transfer Printing
7.7K Views
Automation of Mode Locking in a Nonlinear Polarization Rotation Fiber Laser through Output Polarization Measurements
11.3K Views
Emission Spectroscopic Boundary Layer Investigation during Ablative Material Testing in Plasmatron
12.3K Views
High Temperature Fabrication of Nanostructured Yttria-Stabilized-Zirconia (YSZ) Scaffolds by In Situ Carbon Templating Xerogels
10.5K Views
Quantitative Analysis of Vacuum Induction Melting by Laser-induced Breakdown Spectroscopy
7.2K Views
Accurate Determination of the Equilibrium Surface Tension Values with Area Perturbation Tests
7.4K Views
Copyright © 2025 MyJoVE Corporation. Wszelkie prawa zastrzeżone