This work was supported by the Natural Science and Engineering Research Council of Canada (Discovery Grant No. 122795-2010) and the program of the Canada Research Chair in Quantum Semiconductors (JJD). The help provided by Xiaohuan Xuang, Mohamed Walid Hassen and technical assistance of Sonia Blais of the Universit&#233; de Sherbrooke Centre de caract&#233;risation de mat&#233;riaux (CCM) in collecting XPS data are greatly appreciated. NL acknowledges the Merit Scholarship Program for Foreign Student, Fonds de recherche du Qu&#233;bec - Nature et technologies, for providing a graduate student scholarship.

1. 샘플 준비 <ol><li> ((P)가 도핑 된) 한 쪽은 Si 웨이퍼 연마 n 형을 절단하는 diamode 스크라이브를 사용하여 (저항을 3.1 ~ 4.8 Ω.m) 직경이 3 인치, 12mm X 6mm의 샘플로, 380 μm의 두께; OptiClear, 아세톤, 이소 프로필 알코올 (모든 단계에 대한 5 분)에서 샘플을 청소하십시오. </li><li> 1 분은 초기 산화물을 얻어 에칭 용 ~ 0.9 %의 HF 용액에서 식각 된 샘플; (N 2) DI 물에 씻어 고순도 (99.999 %) 질소 건조. </li><li> N이 가방에 보관 준비 샘플은 공기에서의 산화를 억제한다. </li></ol> 의 ArF (λ = 193 ㎚)과의 KrF (λ = 248 nm의) 레이저 2. 조사 샘플. <ol><li> 장소 0.74 mm의 높이 실에서 샘플 후 자외선에 높은 전송 (≥90 %)가 용융 실리카 창으로 챔버를 밀봉. H와 0.01~0.2 %의 범위 또는 탈기 메타 2 O 2 / H 2 O 용액 챔버를 채우기NOL 미세 유체 채널을 사용. </li><li> 각각 2.6 및 1.8의 사이즈 축소에 균질의 ArF 용, KrF 레이저를 샘플을 조사. 원형 마스크 (직경 4mm)을 통해 100 단계에서 펄스 ​​100-600 레이저 펄스를 증가시킴으로써 각각의 샘플에 불과 2 사이트를 조사. &quot;메이플 리프&quot;(9mm X 7.2 mm) 마스크와 같은 방법으로 시료를 조사한다. </li><li> N 2 세척 건조 DI 물 린스 샘플; 신속 추가 실험 전에 공기에 노출되는 것을 방지하기 위해, N (2)와이 컨테이너를 채우는, 밀폐 용기에 시료를 배치했다. </li></ol> (3)의 고정화 바이오 복합 나노 <ol><li> pH 7.4의 인산염 완충 식염수 (PBS, 1X) RT 10 12 입자 / ㎖로 용액에서 비오틴 - 컨쥬 게이트 및 형광 염색 40 nm의 직경이 나노 희석 (~ 25 ℃). 2 대한의 ArF 또는의 KrF 레이저 조사 샘플을 담가# 160; RT에서이 솔루션의 시간. </li><li> PBS로 세척 샘플 표면에 물리적으로 결합 된 형광 염색 나노를 제거합니다. </li></ol> 4. 표면 특성 <ol><li> 접촉각 (CA) 측정 <ol><li> RT 및 주위 습도의 환경에서 CA 각도계 정적 측정을 수행한다. </li><li> 마이크로 주사기 고순도 DI 물 (비저항 17.95 MΩ · cm)을 채용; 비슷한 볼륨을 생성 (~ 5 μL)은 모든 측정 비슷한 높이로 마이크로 주사기를 낮추는 방법으로 시료 표면에 삭제합니다. </li><li> 캡처 물이 소프트웨어와 CCD 카메라에 의해 프로필 이미지를 떨어 저장합니다. 같은 조사 조건과 독립적으로 4 개의 다른 사이트를 측정한다. </li><li> 추정은 ImageJ에 소프트웨어의 액적 분석 모듈에서 CA 값을 평균; 이미지를로드 및 그레이 스케일로 변경; 플러그인 Dropsnake를 시작; 왼쪽에서 드롭 윤곽 (~ 10 노트)에 대략 몇 노트를 배치바로 뱀을 초기화; 이러한 매듭 연결 곡선을 적용하고 뱀 버튼을 눌러 곡선 진화. 주 : 접촉각은 이미지와 표에 표시되어있다. </li></ol></li><li> XPS 측정 <ol><li> 150 W에서 일하고 알 Kα 소스와 복 XPS 분광계 (1 × -9 토르의 기본 압력)와 표면의 화학적 변형을 조사 : <ol><li> 진공 챔버로 샘플을 로딩. </li><li> 220 μm의 X 220 ㎛ 인 영역으로부터 50 eV의 통과 에너지가 일정 에너지 모드에서의 표면 검사 데이터를 획득. </li><li> 20 eV의 에너지 전달에서 동일한 분석 영역에서 고해상도 검사 데이터를 획득. </li></ol></li><li> 25, 26을 참조하는 바와 같이 프로세스는 XPS 스펙트럼 정량 소프트웨어와 데이터를 XPS 스펙트럼. </li></ol></li><li> 형광 현미경 이미징 <ol><li> &quot;단풍 나무 잎&quot;마스크를 통해 조사 및 스테인드 나노를 형광에 노출 된 샘플을, 흥분 사용청색 광원 (λ = 450 ~ 490 ㎚). </li><li> 4 배의 배율에서 형광 도립 현미경으로, 515 nm에서 발광, 형광 이미지를 관찰한다. </li><li> 27를 참조로, AFM으로 이들 샘플의 표면 모폴로지를 특성화. </li></ol></li></ol>

The authors have nothing to disclose.

우리 때문에 SI-OH의 발생에 주로 초 친수성 실리콘 표면을 유도하는 H 2 O 2 용액의 농도가 낮은로 채워진 미세 유체 챔버 내에 Si 웨이퍼의 UV 레이저를 조사하는 프로토콜을 제안 하였다. 라디칼 - H 2 O 2의 UV 레이저의 광분해에 부정적인 OH 충전을 형성하기로했다. 또한, UV 레이저, 광전 효과 양전하 표면 (37)의 형성을 이끈다. 따라서, 이러한 부정적?...

놀라운 전자 화학적 특성뿐만 아니라 기계적 강도는 실리콘 (Si) 마이크로 전자 장치 및 생물 의학 칩 (1)을위한 이상적인 선택을 만들었습니다. 실리콘 표면의 선택 영역의 제어는 마이크로 유체 및 랩 온어 칩 장치 2,3- .This 종종 수득하거나, 표면 거칠기의 나노 크기 변경에 의해 또는 표면 (4)의 화학 처리가되어 관련된 애플리케이션에 상당한 관심을 받고있다. 실리콘 표면 상에 정렬 된 표면 또는 무질서한 구조를 생성하기 위해 표면 거칠기 또는 패터닝은 포토 리소그래피 (5), 이온빔 리소그래피 (6) 레이저 (7) 기술을 포함한다. 이들 방법과 비교하여, 레이저 표면 텍스쳐링 공정은 높은 공간 해상도 8 마이크로 구조체를 제조 할 가능성이있는 덜 복잡한 것으로보고된다. 그러나시는 펄스 플루 언스에와 높은 텍스쳐 임계 값, 요구 조사를 가지고로그 절제 임계치 (~을 500mJ / cm 2) 9를 초과하는 표면 텍스쳐링을 유도, 실리콘 표면 텍스쳐링은 흔히 고압 SF 6 환경 4,7,8의 경우와 반응성 가스 분위기를 채용함으로써 지원되었다. 따라서, 실리콘 표면의 습윤성을 수정하려면 많은 작품 10 유기 및 무기 박막 (2)을 증착 또는 플라즈마 또는 전자빔 표면 처리 (11, 12)을 사용하여 화학 처리에 초점을 맞추고있다. 몇 분이 13 100 ℃에서 H 2 O 2 용액을 비등에 의해 달성 될 수있는 표면에 단수와 관련 OH 기의 존재로부터 유래의 Si의 친수성을 인식한다. 그러나의 Si-H 또는 Si-O-CH 3 기의 존재로 인한 대부분의 소수성 실리콘 표면 상태는, 포토 레지스트 (13)와 HF 산 용액 또는 코팅 에칭 관련된 습식 화학적 처리에 의해 달성 될 수있다-15. Si를 선택 영역의 습윤성 제어를 달성하기 위해, 복잡한 패터닝 공정은 일반적으로 약액 (16) 처리를 포함해야한다. UV 레이저 방사선의 높은 화학 반응성이 또한 선택 영역 프로세스 유기 막 코팅에 사용되는 고체 기질과 그 습윤성 17을 수정하고있다. 그러나 제한된 양의 데이터는 다른 화학 솔루션에 몰입 샘플 조사에 의한시의 습윤성의 레이저를 이용한 변형에서 사용할 수 있습니다. 이전 연구에서, 공기 18-20 및 NH 3 (21) III-V 반도체의 UV 레이저 조사가 성공적 갈륨 비소, 인듐 갈륨 비소 및 InP의 표면의 화학적 조성을 변경하는 데 사용 하였다. 반도체 표면에 흡착 된 물 (22)을 증가하면서 탈에서 III-V 반도체의 UV 레이저를 조사 설립 (DI) 물은 표면 산화물 및 탄화물을 감소시킨다. 강한 소수성 실리콘 표면 (CA ~ 103 °)의 최근의 일 (23)에 메탄올의 Si 샘플의 ArF 레이저를 조사하여 얻었다. X 선 광전자 분광법 (XPS)에 의해 지시 된 바와 같이, 이는 주로 기인 CH 3 OH를 photodissociate하기의 ArF 레이저의 능력이다. 우리는 또한 DI 물에 H 2 O 2의 0.01 %에 (001)시에 조사의 KrF과의 ArF 레이저를 사용하고 있습니다. 이것은 우리가 가까운 15 ° CA의 특징으로 초 친수성 ​​표면의 Si (001)의 선택 영역 형성을 달성 할 수 있었다. XPS 결과는이 조사면 (24)에 SI-OH 결합의 생성에 기인하는 것이 좋습니다. H 2 O 2 / H 2 O 및 메탄올 솔루션의 낮은 농도에서 실리콘 표면의 친수성 / 소수성 표면의 현장 수정에서 선택 영역의 KrF과의 ArF 레이저를 사용하여이 새로운 기술에 대한 자세한 설명은이 문서에서 설명된다. 여기에 제공된 정보는 충분합니다수 있도록 유사한 실험은 관심이 연구자에 의해 수행된다.

<table><tbody><tr><td>fluorescein stained nanospheres</td><td>Invitrogen</td><td>F8795</td><td></td></tr><tr><td>OptiClear</td><td>National Diagnostics</td><td>OE-101</td><td></td></tr><tr><td>ArF laser (&amp;lambda;=193 nm)</td><td>Lumonics</td><td>pulse master 800</td><td></td></tr><tr><td>KrF laser (&amp;lambda;=248 nm)</td><td>Lumonics</td><td>pulse master 800</td><td></td></tr><tr><td>XPS</td><td>Kratos Analytical</td><td>AXIS Ultra DLD</td><td></td></tr><tr><td>Fluorescence microscope</td><td>Olympus</td><td>IX71</td><td></td></tr><tr><td>XPS quantitification software</td><td>CasaXPS</td><td>2.3.15</td><td></td></tr></tbody></table>

selective area modification of silicon surface wettability by pulsed uv laser irradiation in liquid environment

실리콘의 젖음성 (SI)는 바이오 센싱 장치의 재료 및 제조의 표면 기능화 기술의 중요한 변수 중 하나입니다. 우리는시의 습윤성 수정을 유도하기 위해 적당히 낮은 펄스 플루 언스에서 펄스의 수가 적은 액체 환경에 침지시 (001) 샘플 조사의 KrF과의 ArF 레이저를 사용하여 작동하는 프로토콜에보고한다. 웨이퍼는 초기 접촉각 (CA) ~ 75 °에서 측정 가능한 변화를 보이지 않았다 0.01 %의 H 2 O 2 / H 2 O 용액에서 최대 4 시간 동안 침지. 그러나, microchamber 이러한 웨이퍼의 500 펄스의 KrF과의 ArF 레이저 조사가 0.01 %의 H 가득 2 2 O 용액 250 65 엠제이 / ㎠에서 각각 가까운 15 °에 CA를 감소 / H O 2, 초 친수성 ​​표면의 형성을 나타낸다. 웨이퍼의 표면 형태없이 측정 가능한 변화 OH 종료시 (001)의 형성은,이X 선 광전자 분광법 및 원자력 현미경 측정에 의해 확인되었다. 선택 영역 샘플 조사는 비 조사 영역에서 나노 구의 성공 고정화 결과 2 시간 바이오틴 - 공액 형광 염색 나노 용액에 침지 하였다. 이것은 선택 영역 biofunctionalization 고급 Si 계 바이오 센싱 구조의 제작 방법의 가능성을 예시한다. 또한 65 mJ의 펄스 플루 언스에서 동작의 ArF 레이저를 사용하여, 메탄올 (CH 3 OH)에 침지하여 웨이퍼의 조사 유사한 프로토콜을 서술 / cm 2 (103)의 CA와의 Si (001)의 강한 소수성 표면의 인 시츄 형성 °. XPS 결과의 Si-의의 ArF 레이저 유도 형성을 나타냅니다 (OCH 3) 관찰 된 소수성에 대한 X 화합물 책임. 그러나, 이러한 화합물은 보여주는 메탄올의 KrF 레이저에 의해 조사 된 Si 표면 상 XPS에 의해 발견되지의 KrF 레이저의 무능력 메탄올을 photodissociate 및 -OCH 3 라디칼을 생성 할 수 있습니다.

이러한 대표적인 결과는 그림 1. 이전 출판 일 (23, 24)에서 제시 H의 서로 다른 농도에 대한 H 2 O DI 250 엠제이 / ㎠에서의 KrF 레이저로 조사 사이트에 N (펄스 수) 대 CA를 보여주고있다 2 O 2 / H 2 O 용액 (예., 0.01, 0.02, 0.05 및 0.2 %). CA는 모두 H 2 O 2 솔루션 펄스 수를 증가와 감소한다. 0.02 및 0.01 % H 2 O 2 ?...

Watch this Scientific Journal Video about Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment at JoVE.com

Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment

우리는 HF의 시츄 변경이 2 O 2 / H 2 O 용액 (0.01 % -0.5 %) 또는 메탄올 용액 H로 채워진 미세 유체 챔버에서 샘플을 조사함으로써 친수성 또는 소수성 상태의 Si (001) 표면 처리에서의 공정보고 상대적으로 낮은 펄스 UV 플루 언스의 레이저 펄스를 사용.

액체 환경에서의 펄스 자외선 레이저 조사에 의한 실리콘 표면의 젖음성의 선택 영역 수정

The wettability of silicon (Si) is one of the important parameters in the technology of surface functionalization of this material and fabrication of ...

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8.2K 조회수.  Université de Sherbrooke.  우리는 HF의 시츄 변경이 2 O 2 / H 2 O 용액 (0.01 % -0.5 %) 또는 메탄올 용액 H로 채워진 미세 유체 챔버에서 샘플을 조사함으로써 친수성 또는 소수성 상태의 Si (001) 표면 처리에서의 공정보고 상대적으로 낮은 펄스 UV 플루 언스의 레이저 펄스를 사용. 

비디오: Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment

A Method of Targeted Cell Isolation via Glass Surface Functionalization

One of the limiting factors to the adoption and advancement of personalized medicine is the inability to develop diagnostic tools to probe individual nuances in expression from patient to patient. Current methodologies that try to separate cells to fill this niche result in disruption of physiological expression, making the separation technique useless as a diagnostic tool. In this protocol, we describe the functionalization and optimization of a surface for the cellular capture and release. This functionalized surface integrates biotinylated antibodies with a glass surface functionalized with an aminosilane (APTES), desthiobiotin and streptavidin. Cell release is facilitated through the introduction of biotin, allowing the recollection and purification of cells captured by the surface. This release is done through the targeting of the secondary moiety desthiobiotin, which results in a much more gentle release paradigm. This reduction in harsh reagents and shear forces reduces changes in cellular expression. The functionalized surface captures up to 80% of cells in a single cell mixture and has demonstrated 50% capture in a dual-cell mixture. Applications of this technology to xenografts and cancer separation studies are investigated. Quantification techniques for surface verification such as plate reader and ImageJ analyses are described as well.

This protocol describes customizable surface functionalization of the desthiobiotin, streptavidin, and APTES system in order to isolate specific cell types of interest. In addition, this manuscript covers the applications, optimization, and verification of this process.

유리 표면 기능화를 통해 표적 세포 격리 방법

One of the limiting factors to the adoption and advancement of personalized medicine is the inability to develop diagnostic tools to probe individual ...

연구

암 연구학

Fabrication of Nano-engineered Transparent Conducting Oxides by Pulsed Laser Deposition

Nanosecond Pulsed Laser Deposition (PLD) in the presence of a background gas allows the deposition of metal oxides with tunable morphology, structure, density and stoichiometry by a proper control of the plasma plume expansion dynamics. Such versatility can be exploited to produce nanostructured films from compact and dense to nanoporous characterized by a hierarchical assembly of nano-sized clusters. In particular we describe the detailed methodology to fabricate two types of Al-doped ZnO (AZO) films as transparent electrodes in photovoltaic devices: 1) at low O2 pressure, compact films with electrical conductivity and optical transparency close to the state of the art transparent conducting oxides (TCO) can be deposited at room temperature, to be compatible with thermally sensitive materials such as polymers used in organic photovoltaics (OPVs); 2) highly light scattering hierarchical structures resembling a forest of nano-trees are produced at higher pressures. Such structures show high Haze factor (&gt;80%) and may be exploited to enhance the light trapping capability. The method here described for AZO films can be applied to other metal oxides relevant for technological applications such as TiO2, Al2O3, WO3 and Ag4O4.

We describe the experimental method to deposit nanostructured oxide thin films by nanosecond Pulsed Laser Deposition (PLD) in the presence of a background gas. By using this method Al-doped ZnO (AZO) films, from compact to hierarchically structured as nano-tree forests, can be deposited.

의 제작 펄스 레이저 증착에 의해 투명 실시 산화물 나노 설계

Nanosecond Pulsed  Laser Deposition (PLD) in the presence of a background gas allows the deposition  of metal oxides with tunable morphology, structure, ...

공학

Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium

The development of hybrid electronic devices relies in large part on the integration of (bio)organic materials and inorganic semiconductors through a stable interface that permits efficient electron transport and protects underlying substrates from oxidative degradation. Group IV semiconductors can be effectively protected with highly-ordered self-assembled monolayers (SAMs) composed of simple alkyl chains that act as impervious barriers to both organic and aqueous solutions. Simple alkyl SAMs, however, are inert and not amenable to traditional patterning techniques. The motivation for immobilizing organic molecular systems on semiconductors is to impart new functionality to the surface that can provide optical, electronic, and mechanical function, as well as chemical and biological activity. 
Microcontact printing (&mu;CP) is a soft-lithographic technique for patterning SAMs on myriad surfaces.1-9 Despite its simplicity and versatility, the approach has been largely limited to noble metal surfaces and has not been well developed for pattern transfer to technologically important substrates such as oxide-free silicon and germanium. Furthermore, because this technique relies on the ink diffusion to transfer pattern from the elastomer to substrate, the resolution of such traditional printing is essentially limited to near 1 &mu;m.10-16
In contrast to traditional printing, inkless &mu;CP patterning relies on a specific reaction between a surface-immobilized substrate and a stamp-bound catalyst. Because the technique does not rely on diffusive SAM formation, it significantly expands the diversity of patternable surfaces. In addition, the inkless technique obviates the feature size limitations imposed by molecular diffusion, facilitating replication of very small (&lt;200 nm) features.17-23 However, up till now, inkless &mu;CP has been mainly used for patterning relatively disordered molecular systems, which do not protect underlying surfaces from degradation.
Here, we report a simple, reliable high-throughput method for patterning passivated silicon and germanium with reactive organic monolayers and demonstrate selective functionalization of the patterned substrates with both small molecules and proteins. The technique utilizes a preformed NHS-reactive bilayered system on oxide-free silicon and germanium. The NHS moiety is hydrolyzed in a pattern-specific manner with a sulfonic acid-modified acrylate stamp to produce chemically distinct patterns of NHS-activated and free carboxylic acids. A significant limitation to the resolution of many &mu;CP techniques is the use of PDMS material which lacks the mechanical rigidity necessary for high fidelity transfer. To alleviate this limitation we utilized a polyurethane acrylate polymer, a relatively rigid material that can be easily functionalized with different organic moieties. Our patterning approach completely protects both silicon and germanium from chemical oxidation, provides precise control over the shape and size of the patterned features, and gives ready access to chemically discriminated patterns that can be further functionalized with both organic and biological molecules. The approach is general and applicable to other technologically-relevant surfaces.

Here we describe a simple method for patterning oxide-free silicon and germanium with reactive organic monolayers and demonstrate functionalization of the patterned substrates with small molecules and proteins. The approach completely protects surfaces from chemical oxidation, provides precise control over feature morphology, and provides ready access to chemically discriminated patterns.

소프트 리소그래피 작용화 및 Patterning 산화물없는 실리콘과 게르마늄

The development of hybrid electronic devices relies in large part on the integration of (bio)organic materials and inorganic semiconductors through a ...

생체공학

Patterning via Optical Saturable Transitions - Fabrication and Characterization

This protocol describes the fabrication and characterization of nanostructures using a novel nanolithographic technique called Patterning via Optical Saturable Transitions (POST). In this technique the chemical properties of organic photochromic molecules that undergo single-photon reactions are exploited, enabling rapid top-down nanopatterning over large areas at low light intensities, thereby, allowing for the circumvention of the far-field diffraction barrier.4 Simple, cost-effective, high throughput and resolution alternatives to nanopatterning are being explored, such as, two-photon polymerization5,6, beam pen lithography (BPL)7, scanning electron beam lithography (SEBL), and focused ion beam (FIB) patterning. However, multi-photon approaches require high light intensities, which limit their potential for high throughput and offer low image contrast. Although, electron and ion beam lithographic processes offer increased resolution, the serial nature of the process is limited to slow writing speeds, which also prevents patterning of features over large areas. Beam-pen lithography is an approach towards parallel near-field optical lithography. However, the gap between the source of the beam and the surface of the photoresist needs to be controlled extremely precisely for good pattern uniformity and this is very challenging to accomplish for large arrays of beams. Patterning via Optical Saturable Transitions (POST) is an alternative optical nanopatterning technique for patterning sub-wavelength features1-3. Since this technique uses single photons instead of electrons, it is extremely fast and does not require high light intensities1-3, opening the door to massive parallelization.

We report that the diffraction limit of conventional optical lithography can be overcome by exploiting the transitions of organic photochromic derivatives induced by their photoisomerization at low light intensities.1-3 This paper outlines our fabrication technique and two locking mechanisms, namely: dissolution of one photoisomer and electrochemical oxidation.

광학 가포 전환을 통해 패터닝 - 제조 및 특성

This protocol describes the fabrication and characterization of nanostructures using a novel nanolithographic technique called Patterning via Optical ...

Light Enhanced Hydrofluoric Acid Passivation: A Sensitive Technique for Detecting Bulk Silicon Defects

A procedure to measure the bulk lifetime (&#62;100 &#181;sec) of silicon wafers by temporarily attaining a very high level of surface passivation when immersing the wafers in hydrofluoric acid (HF) is presented. By this procedure three critical steps are required to attain the bulk lifetime. Firstly, prior to immersing silicon wafers into HF, they are chemically cleaned and subsequently etched in 25% tetramethylammonium hydroxide. Secondly, the chemically treated wafers are then placed into a large plastic container filled with a mixture of HF and hydrochloric acid, and then centered over an inductive coil for photoconductance (PC) measurements. Thirdly, to inhibit surface recombination and measure the bulk lifetime, the wafers are illuminated at 0.2 suns for 1 min&#160;using a halogen lamp, the illumination is switched off, and a PC measurement is immediately taken. By this procedure, the characteristics of bulk silicon defects can be accurately determined. Furthermore, it is anticipated that a sensitive RT surface passivation technique will be imperative for examining bulk silicon defects when their concentration is low (&#60;1012 cm-3).

A RT liquid surface passivation technique to investigate the recombination activity of bulk silicon defects is described. For the technique to be successful, three critical steps are required: (i) chemical cleaning and etching of silicon, (ii) immersion of silicon in 15% hydrofluoric acid and (iii) illumination for 1 min.

향상된 광 불산 패시베이션 : 벌크 실리콘 결함을 검출하기위한 민감한 기술

A procedure to measure the bulk lifetime (&#62;100 &#181;sec) of silicon wafers by temporarily attaining a very high level of surface passivation when ...

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Nano-patterns fabricated with extreme ultraviolet (EUV) or electron-beam (E-beam) lithography exhibit unexpected variations in size. This variation has been attributed to statistical fluctuations in the number of photons/electrons arriving at a given nano-region arising from shot-noise (SN). The SN varies inversely to the square root of a number of photons/electrons. For a fixed dosage, the SN is larger in EUV and E-beam lithographies than for traditional (193 nm) optical lithography. Bottom-up and top-down patterning approaches are combined to minimize the effects of shot noise in nano-hole patterning. Specifically, an amino-silane surfactant self-assembles on a silicon wafer that is subsequently spin-coated with a 100 nm film of a PMMA-based E-beam photoresist. Exposure to the E-beam and the subsequent development uncover the underlying surfactant film at the bottoms of the holes. Dipping the wafer in a suspension of negatively charged, citrate-capped, 20 nm gold nanoparticles (GNP) deposits one particle per hole. The exposed positively charged surfactant film in the hole electrostatically funnels the negatively charged nanoparticle to the center of an exposed hole, which permanently fixes the positional registry. Next, by heating near the glass transition temperature of the photoresist polymer, the photoresist film reflows and engulfs the nanoparticles. This process erases the holes affected by SN but leaves the deposited GNPs locked in place by strong electrostatic binding. Treatment with oxygen plasma exposes the GNPs by etching a thin layer of the photoresist. Wet-etching the exposed GNPs with a solution of I2/KI yields uniform holes located at the center of indentations patterned by E-beam lithography. The experiments presented show that the approach reduces the variation in the size of the holes caused by SN from 35% to below 10%. The method extends the patterning limits of transistor contact holes to below 20 nm.

Uniformly sized nanoparticles can remove fluctuations in contact hole dimensions patterned in poly(methyl methacrylate) (PMMA) photoresist films by electron beam (E-beam) lithography. The process involves electrostatic funneling to center and deposit nanoparticles in contact holes, followed by photoresist reflow and plasma- and wet-etching steps.

희생 나노 입자의 사용은 E-빔 리소그래피에 의해 제조 연락 홀에서 샷 노이즈의 영향을 제거하는 방법

Nano-patterns fabricated with extreme ultraviolet (EUV) or electron-beam (E-beam) lithography exhibit unexpected variations in size. This variation has ...

Utilization of Microscale Silicon Cantilevers to Assess Cellular Contractile Function In Vitro

The development of more predictive and biologically relevant in vitro assays is predicated on the advancement of versatile cell culture systems which facilitate the functional assessment of the seeded cells. To that end, microscale cantilever technology offers a platform with which to measure the contractile functionality of a range of cell types, including skeletal, cardiac, and smooth muscle cells, through assessment of contraction induced substrate bending. Application of multiplexed cantilever arrays provides the means to develop moderate to high-throughput protocols for assessing drug efficacy and toxicity, disease phenotype and progression, as well as neuromuscular and other cell-cell interactions. This manuscript provides the details for fabricating reliable cantilever arrays for this purpose, and the methods required to successfully culture cells on these surfaces. Further description is provided on the steps necessary to perform functional analysis of contractile cell types maintained on such arrays using a novel laser and photo-detector system. The representative data provided highlights the precision and reproducible nature of the analysis of contractile function possible using this system, as well as the wide range of studies to which such technology can be applied. Successful widespread adoption of this system could provide investigators with the means to perform rapid, low cost functional studies in vitro, leading to more accurate predictions of tissue performance, disease development and response to novel therapeutic treatment.

Utilization of Microscale Silicon Cantilevers to Assess Cellular Contractile Function In Vitro

This protocol describes the use of microscale silicon cantilevers as pliable culture surfaces for measuring the contractility of muscle cells in vitro. Cellular contraction causes cantilever bending, which can be measured, recorded, and converted into readouts of force, providing a non-invasive and scalable system for measuring contractile function in vitro.

마이크로 실리콘 캔틸레버의 이용은 세포 수축 기능을 평가하기 위해<em&gt; 체외</em

The development of more predictive and biologically relevant in vitro assays is predicated on the advancement of versatile cell culture systems which ...

Fabricating Reactive Surfaces with Brush-like and Crosslinked Films of Azlactone-Functionalized Block Co-Polymers

In this paper, fabrication methods that generate novel surfaces using the azlactone-based block co-polymer, poly (glycidyl methacrylate)-block-poly (vinyl dimethyl azlactone) (PGMA-b-PVDMA), are presented. Due to the high reactivity of azlactone groups towards amine, thiol, and hydroxyl groups, PGMA-b-PVDMA surfaces can be modified with secondary molecules to create chemically or biologically functionalized interfaces for a variety of applications. Previous reports of patterned PGMA-b-PVDMA interfaces have used traditional top-down patterning techniques that generate non-uniform films and poorly controlled background chemistries. Here, we describe customized patterning techniques that enable precise deposition of highly uniform PGMA-b-PVDMA films in backgrounds that are chemically inert or that have biomolecule-repellent properties. Importantly, these methods are designed to deposit PGMA-b-PVDMA films in a manner that completely preserves azlactone functionality through each processing step. Patterned films show well-controlled thicknesses that correspond to polymer brushes (~90 nm) or to highly crosslinked structures (~1-10 &#956;m). Brush patterns are generated using either the parylene lift-off or interface directed assembly methods described and are useful for precise modulation of overall chemical surface reactivity by adjusting either the PGMA-b-PVDMA pattern density or the length of the VDMA block. In contrast, the thick, crosslinked PGMA-b-PVDMA patterns are obtained using a customized micro-contact printing technique and offer the benefit of higher loading or capture of secondary material due to higher surface area to volume ratios. Detailed experimental steps, critical film characterizations, and trouble-shooting guides for each fabrication method are discussed.

Surface fabrication methods for patterned deposition of nanometer thick brushes or micron thick, crosslinked films of an azlactone block co-polymer are reported. Critical experimental steps, representative results, and limitations of each method are discussed. These methods are useful for creating functional interfaces with tailored physical features and tunable surface reactivity.

브러쉬 모양의 반응 표면 날조 및 Azlactone 기능성된 블록 공동 고분자의 가교 된 영화

In this paper, fabrication methods that generate novel surfaces using the azlactone-based block co-polymer, poly (glycidyl methacrylate)-block-poly (vinyl ...

Photopatterning Proteins and Cells in Aqueous Environment Using TiO2 Photocatalysis

Organic contaminants adsorbed on the surface of titanium dioxide (TiO2) can be decomposed by photocatalysis under ultraviolet (UV) light. Here we describe a novel protocol employing the TiO2 photocatalysis to locally alter cell affinity of the substrate surface. For this experiment, a thin TiO2 film was sputter-coated on a glass coverslip, and the TiO2 surface was subsequently modified with an organosilane monolayer derived from octadecyltrichlorosilane (OTS), which inhibits cell adhesion. The sample was immersed in a cell culture medium, and focused UV light was irradiated to an octagonal region. When a neuronal cell line PC12 cells were plated on the sample, cells adhered only on the UV-irradiated area. We further show that this surface modification can also be performed in situ, i.e., even when cells are growing on the substrate. Proper modification of the surface required an extracellular matrix protein collagen to be present in the medium at the time of UV irradiation. The technique presented here can potentially be employed in patterning multiple cell types for constructing coculture systems or to arbitrarily manipulate cells under culture.

Photopatterning Proteins and Cells in Aqueous Environment Using TiO2 Photocatalysis

We describe a protocol for modifying cell affinity of a scaffold surface in aqueous environment. The method takes advantage of titanium dioxide photocatalysis to decompose organic film in the photo-irradiated region. We show that it can be used to create microdomains of scaffolding proteins, both ex situ and in situ.

산화 티타늄을 사용하여 수성 환경에서 단백질과 세포를 포토 패터닝<sub&gt; 2</sub&gt; 광촉매

Organic contaminants adsorbed on the surface of titanium dioxide (TiO2) can be decomposed by photocatalysis under ultraviolet (UV) light. Here we describe ...

Rendering SiO2/Si Surfaces Omniphobic by Carving Gas-Entrapping Microtextures Comprising Reentrant and Doubly Reentrant Cavities or Pillars

We present microfabrication protocols for rendering intrinsically wetting materials repellent to liquids (omniphobic) by creating gas-entrapping microtextures (GEMs) on them comprising cavities and pillars with reentrant and doubly reentrant features. Specifically, we use SiO2/Si as the model system and share protocols for two-dimensional (2D) designing, photolithography, isotropic/anisotropic etching techniques, thermal oxide growth, piranha cleaning, and storage towards achieving those microtextures. Even though the conventional wisdom indicates that roughening intrinsically wetting surfaces (&#952;o &#60; 90&#176;) renders them even more wetting (&#952;r &#60; &#952;o &#60; 90&#176;), GEMs demonstrate liquid repellence despite the intrinsic wettability of the substrate. For instance, despite the intrinsic wettability of silica &#952;o &#8776; 40&#176; for the water/air system, and &#952;o &#8776; 20&#176; for the hexadecane/air system, GEMs comprising cavities entrap air robustly on immersion in those liquids, and the apparent contact angles for the droplets are &#952;r &#62; 90&#176;. The reentrant and doubly reentrant features in the GEMs stabilize the intruding liquid meniscus thereby trapping the liquid-solid-vapor system in metastable air-filled states (Cassie states) and delaying wetting transitions to the thermodynamically-stable fully-filled state (Wenzel state) by, for instance, hours to months. Similarly, SiO2/Si surfaces with arrays of reentrant and doubly reentrant micropillars demonstrate extremely high contact angles (&#952;r &#8776; 150&#176;&#8211;160&#176;) and low contact angle hysteresis for the probe liquids, thus characterized as superomniphobic. However, on immersion in the same liquids, those surfaces dramatically lose their superomniphobicity and get fully-filled within &#60;1 s. To address this challenge, we present protocols for hybrid designs that comprise arrays of doubly reentrant pillars surrounded by walls with doubly reentrant profiles. Indeed, hybrid microtextures entrap air on immersion in the probe liquids. To summarize, the protocols described here should enable the investigation of GEMs in the context of achieving omniphobicity without chemical coatings, such as perfluorocarbons, which might unlock the scope of inexpensive common materials for applications as omniphobic materials. Silica microtextures could also serve as templates for soft materials.

Rendering SiO2/Si Surfaces Omniphobic by Carving Gas-Entrapping Microtextures Comprising Reentrant and Doubly Reentrant Cavities or Pillars

This work presents microfabrication protocols for achieving cavities and pillars with reentrant and doubly reentrant profiles on SiO2/Si wafers using photolithography and dry etching. Resulting microtextured surfaces demonstrate remarkable liquid repellence, characterized by robust long-term entrapment of air under wetting liquids, despite the intrinsic wettability of silica.

액체 환경에서의 펄스 자외선 레이저 조사에 의한 실리콘 표면의 젖음성의 선택 영역 수정

요약

더 많은 비디오 탐색

이 비디오의 챕터

유리 표면 기능화를 통해 표적 세포 격리 방법

의 제작 펄스 레이저 증착에 의해 투명 실시 산화물 나노 설계

소프트 리소그래피 작용화 및 Patterning 산화물없는 실리콘과 게르마늄

광학 가포 전환을 통해 패터닝 - 제조 및 특성

향상된 광 불산 패시베이션 : 벌크 실리콘 결함을 검출하기위한 민감한 기술

희생 나노 입자의 사용은 E-빔 리소그래피에 의해 제조 연락 홀에서 샷 노이즈의 영향을 제거하는 방법

마이크로 실리콘 캔틸레버의 이용은 세포 수축 기능을 평가하기 위해

브러쉬 모양의 반응 표면 날조 및 Azlactone 기능성된 블록 공동 고분자의 가교 된 영화

산화 티타늄을 사용하여 수성 환경에서 단백질과 세포를 포토 패터닝

렌더링 SiO₂/Si 표면 재진입 및 이중 재진입 구멍 또는 기둥을 포함하는 가스 를 포함하는 미세 질감을 조각하여 전지성

액체 환경에서의 펄스 자외선 레이저 조사에 의한 실리콘 표면의 젖음성의 선택 영역 수정

요약

더 많은 비디오 탐색

이 비디오의 챕터

유리 표면 기능화를 통해 표적 세포 격리 방법

의 제작 펄스 레이저 증착에 의해 투명 실시 산화물 나노 설계

소프트 리소그래피 작용화 및 Patterning 산화물없는 실리콘과 게르마늄

광학 가포 전환을 통해 패터닝 - 제조 및 특성

향상된 광 불산 패시베이션 : 벌크 실리콘 결함을 검출하기위한 민감한 기술

희생 나노 입자의 사용은 E-빔 리소그래피에 의해 제조 연락 홀에서 샷 노이즈의 영향을 제거하는 방법

마이크로 실리콘 캔틸레버의 이용은 세포 수축 기능을 평가하기 위해

브러쉬 모양의 반응 표면 날조 및 Azlactone 기능성된 블록 공동 고분자의 가교 된 영화

산화 티타늄을 사용하여 수성 환경에서 단백질과 세포를 포토 패터닝

렌더링 SiO2/Si 표면 재진입 및 이중 재진입 구멍 또는 기둥을 포함하는 가스 를 포함하는 미세 질감을 조각하여 전지성

렌더링 SiO₂/Si 표면 재진입 및 이중 재진입 구멍 또는 기둥을 포함하는 가스 를 포함하는 미세 질감을 조각하여 전지성