Ivo W. Rangelow

Adaptive AFM scan speed control for high aspect ratio fast structure tracking.

Multi-eigenmode control for high material contrast in bimodal and higher harmonic atomic force microscopy.

Low temperature dry etching of chromium towards control at sub-5 nm dimensions.

Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features.

Charged particle single nanometre manufacturing.

Sensitivity Improvement to Active Piezoresistive AFM Probes Using Focused Ion Beam Processing.

Fabrication Process for an Optomechanical Transducer Platform with Integrated Actuation.