fabrication-magnetic-nanostructures-on-silicon-nitride-membranes-for

Fabrication of Magnetic Nanostructures on Silicon Nitride Membranes for Magnetic Vortex Studies Using Transmission Microscopy Techniques

Electron and x-ray magnetic microscopies allow for high-resolution magnetic imaging down to tens of nanometers. However, the samples need to be prepared ...

Brno University of Technology

An innovative method of in situ real-time optical monitoring of thin film deposition and etching is presented. In this technique, intensity maps of a thin film corresponding to a series of wavelengths selected by a monochromator (300-800 nm) are recorded by a CCD camera. From the maps the reflectance spectra at individual points of the sample surface can be extracted. By fitting the reflectance spectra to the theoretical ones, the maps of a thin film morphology (including optical parameters) and their temporal development during technological processes can be obtained. The method was tested by in situ observation of the growth of silicon nitride and silicon oxide thin films prepared by ion beam sputtering and by the monitoring of etching of thermally grown SiO(2) thin films.

Imaging reflectometry in situ.

We report on the development of a high-resolution scanning magnetometer, which fully exploits the vectorial nature of the magneto-optical Kerr effect. The three-dimensional nature of magnetization is at the basis of many micromagnetic phenomena and from these data, we can fully characterize magnetization processes of nanostructures in static and dynamic regimes. Our scanning Kerr magnetometer uses a high numerical aperture microscope objective where the incident light beam can be deterministically deviated from the objective symmetry axis, therefore, both in-plane (via the longitudinal Kerr effect) and out-of-plane (via the polar Kerr effect) components of the magnetization vector may be detected. These components are then separated by exploiting the symmetries of the polar and longitudinal Kerr effects. From four consecutive measurements, we are able to directly obtain the three orthogonal components of the magnetization vector with a resolution of 600 nm. Performance of the apparatus is demonstrated by a measurement of 3D magnetization vector maps showing out-of-plane domains and in-plane domain walls in an yttrium-iron-garnet film and on a study of magnetization reversal in a 4-μm-wide magnetic disk.

Michal Urbanek

CEITEC BUT

Brno University of Technology

Fabrication of Magnetic Nanostructures on Silicon Nitride Membranes for Magnetic Vortex Studies Using Transmission Microscopy Techniques

Michal Urbanek

.css-o250i3{font-size:18px;font-family:Open Sans,sans-serif;line-height:21.6px;}CEITEC BUT

Brno University of Technology

Fabrication of Magnetic Nanostructures on Silicon Nitride Membranes for Magnetic Vortex Studies Using Transmission Microscopy Techniques

CEITEC BUT