Preparation of Silica Nanoparticles for Deposition
2:23
Preparation of the Vacuum System
2:47
Plasma Deposition Process
4:27
Preparation of Hollow Particles by Dissolution of Core Material
5:36
Characterization of Permeability (Rate of Core Release)
6:56
Results: Plasma Polymerized Hollow Particles
8:40
Conclusion
We have used plasma enhanced chemical vapor deposition to deposit thin films ranging from a few nm to several 100 nm on nano-sized particles of various materials. We subsequently etch the core material to produce hollow nanoshells whose permeability is controlled by the thickness of the shell. We characterize the permeability of these coatings to small solutes and demonstrate that these barriers can provide sustained release of the core material over several days.