DNA Origami-Mediated Substrate Nanopatterning of Inorganic Structures for Sensing Applications

10.6K Views

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08:59 min

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September 27th, 2019

DOI :

10.3791/60313-v

September 27th, 2019

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Petteri Piskunen¹, Boxuan Shen¹, Sofia Julin¹, Heini Ijäs¹^,², J. Jussi Toppari³, Mauri A. Kostiainen¹^,⁴, Veikko Linko¹^,⁴

¹Biohybrid Materials, Department of Bioproducts and Biosystems, Aalto University, ²University of Jyväskylä, Nanoscience Center, Department of Biological and Environmental Science, University of Jyväskylä, ³University of Jyväskylä, Nanoscience Center, Department of Physics, University of Jyväskylä, ⁴HYBER Center of Excellence, Department of Applied Physics, Aalto University

Summary

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DNA Origami

Substrate Nanopatterning

Inorganic Structures

Sensing Applications

Surface Enhanced Raman Spectroscopy

Optical Metasurfaces

Nanofabrication Methods

Plasma enhanced Chemical Vapor Deposition

Amorphous Silicon

Reactive Ion Etching

Chapters in this video

0:04

Title

1:02

DNA Origami Assembly

1:34

Substrate Preparation

2:09

Amorphous Silicon (a-Si) Layer Plasma-Enhanced Chemical Vapor Deposition (PECVD) and Oxygen Plasma Treatment

2:49

DNA Origami Deposition

3:44

Silicon Dioxide (SiO₂) Mask Growth

4:38

Reactive Ion Etching (RIE)

5:25

Physical Vapor Deposition (PVD)

6:35

Hydrofluoric Acid (HF) Liftoff

7:05

Remaining a-Si RIE

7:38

Results: Representative Bowtie DNA Origami Imaging and Functional Analyses

8:15

Conclusion

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