Ricerca
Didattica
Soluzioni
Accedi
IT
EN - English
CN - 中文
DE - Deutsch
ES - Español
KR - 한국어
IT - Italiano
FR - Français
PT - Português
TR - Turkish
JA - Japanese
School of Advanced Materials Science and Engineering
Seok Hwan Jeong has not added Biography.
If you are Seok Hwan Jeong and would like to personalize this page please email our Author Liaison for assistance.
All-optical wavelength conversion in a GaInAsP/InP optical gate loaded with a Bragg reflector.
Applied optics Nov, 2003 | Pubmed ID: 14658471
Analysis and demonstration of single-passband response and tuning characteristics in a chirped ladder interferometric filter for a widely tunable laser diode.
Applied optics Oct, 2005 | Pubmed ID: 16231808
Optical 90 degree hybrid with broad operating bandwidth of 94 nm.
Optics letters Nov, 2009 | Pubmed ID: 19927192
Compact optical 90 degrees hybrid employing a tapered 2x4 MMI coupler serially connected by a 2x2 MMI coupler.
Optics express Mar, 2010 | Pubmed ID: 20389439
Optical 45 degrees hybrid for demodulating 8-ary DPSK signal.
Optics express Apr, 2010 | Pubmed ID: 20588694
Optical 60° hybrid for demodulating six-level DPSK signal.
Optics letters Feb, 2011 | Pubmed ID: 21283177
Renal venous doppler ultrasonography in normal subjects and patients with diabetic nephropathy: value of venous impedance index measurements.
Journal of clinical ultrasound : JCU Nov-Dec, 2011 | Pubmed ID: 21544829
Flat-topped and low loss silicon-nanowire-type optical MUX/DeMUX employing multi-stage microring resonator assisted delayed Mach-Zehnder interferometers.
Optics express Nov, 2012 | Pubmed ID: 23187415
High-output-power, single-wavelength silicon hybrid laser using precise flip-chip bonding technology.
Optics express Dec, 2012 | Pubmed ID: 23263042
Low-loss, flat-topped and spectrally uniform silicon-nanowire-based 5th-order CROW fabricated by ArF-immersion lithography process on a 300-mm SOI wafer.
Optics express Dec, 2013 | Pubmed ID: 24514595
Si-nanowire-based multistage delayed Mach-Zehnder interferometer optical MUX/DeMUX fabricated by an ArF-immersion lithography process on a 300 mm SOI wafer.
Optics letters Jul, 2014 | Pubmed ID: 24978715
SungKyunKwan University
Healin Im*,1,
Seok Hwan Jeong*,1,
Dong Hyuk Park2,
Sunkook Kim1,
Young Ki Hong1
1School of Advanced Materials Science and Engineering, Sungkyunkwan University,
2Department of Applied Organic Materials Engineering, Inha University
Riservatezza
Condizioni di utilizzo
Politiche
Contattaci
SUGGERISCI JOVE ALLA BIBLIOTECA
Newsletter di JoVE
JoVE Journal
Raccolta di metodi
JoVE Encyclopedia of Experiments
Archivio
JoVE Core
JoVE Business
JoVE Science Education
JoVE Lab Manual
Sportello unico per docenti
Autori
Personale delle biblioteche
Accesso
CHI SIAMO
Copyright © 2024 MyJoVE Corporation. Tutti i diritti riservati