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Electrospray Deposition of Uniform Thickness Ge₂₃Sb₇S₇₀ and As₄₀S₆₀ Chalcogenide Glass Films

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08:38 min

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August 19th, 2016

DOI :

10.3791/54379-v

August 19th, 2016

•

8,415 Views

Spencer Novak¹, Pao-Tai Lin²^,³, Cheng Li⁴, Nikolay Borodinov¹, Zhaohong Han⁵, Corentin Monmeyran⁵, Neil Patel⁵, Qingyang Du⁵, Marcin Malinowski⁴, Sasan Fathpour⁴, Chatdanai Lumdee⁴, Chi Xu⁴, Pieter G. Kik⁴, Weiwei Deng⁶, Juejun Hu⁷, Anuradha Agarwal⁷, Igor Luzinov¹, Kathleen Richardson⁴

¹Department of Materials Science and Engineering, Clemson University, ²Department of Materials Science and Engineering, Texas A&M University, ³Department of Electrical and Computer Engineering, Texas A&M University, ⁴College of Optics and Photonics, Center for Research and Education in Optics and Lasers (CREOL), University of Central Florida, ⁵Department of Materials Science and Engineering, Massachusetts Institute of Technology, ⁶Department of Mechanical Engineering, Virginia Polytechnic Institute, ⁷Microphotonics Center, Massachusetts Institute of Technology

章

文字起こし

要約

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Electrospray Deposition

Chalcogenide Glass Films

Mid infrared Photonic Applications

Film Thickness Profile

Compositional Gradient

Chip based Mid infrared Chemical Sensing

Taylor Cone

Serpentine Path

Linear Thickness Profile

Annealing

FTIR Spectrum

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