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Department of Materials Science and Engineering,
Department of Electrical and Computer Engineering
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Low coverage spontaneous etching and hyperthermal desorption of aluminum chlorides from Cl2/Al(111).
The Journal of chemical physics Nov, 2004 | Pubmed ID: 15527367
Direct and indirect causes of Fermi level pinning at the SiO/GaAs interface.
The Journal of chemical physics Feb, 2007 | Pubmed ID: 17343465
Electronic properties of adsorbates on GaAs(001)-c(2x8)/(2x4).
The Journal of chemical physics Oct, 2007 | Pubmed ID: 17919041
The Ohio State University
Julia I. Deitz1,
Santino D. Carnevale2,
Steven A. Ringel3,
David W. McComb3,
Tyler J. Grassman1,2
1Department of Materials Science and Engineering, The Ohio State University,
2Department of Electrical and Computer Engineering, The Ohio State University,
3Institute of Materials Research, The Ohio State University
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