U₂O₅ Film Preparation via UO₂ Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

1:06

The Labstation Modular Machine

2:11

Introduction of the Sample and Sample Holder into the Labstation

3:10

Transfer the Sample Holder to the Preparation Chamber

4:03

In situ Cleaning of the Sample Holder and Sample Holder Characterization

5:39

Deposition of a UO₂ Thin Film

6:50

UO₂ Sample Characterization

7:38

Oxidation of UO₂ with Atomic Oxygen and Analysis of the UO₃ Obtained

8:52

Reduction of UO₃ by Atomic Hydrogen and Analysis of the U₂O₅ Obtained

9:45

Results: Identification of Uranium(V) in Thin Films

10:51

Conclusion